Patents by Inventor Yih-Ren Shao

Yih-Ren Shao has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6403483
    Abstract: A shallow trench isolation having an etching stop layer and its method of fabrication. The method utilizes a shield layer such as a silicon nitride layer to serve as an etching stop layer. The etching stop layer is formed in the top position of the shallow trench isolation.
    Type: Grant
    Filed: October 25, 2000
    Date of Patent: June 11, 2002
    Assignee: Nanya Technology Corp.
    Inventors: Chung-Peng Hao, Chung-Lin Huang, Chung-Yuan Lee, Yih-Ren Shao, Pei-Ing Lee
  • Publication number: 20020005560
    Abstract: A shallow trench isolation having an etching stop layer and its method of fabrication. The method utilizes a shield layer such as a silicon nitride layer to serve as an etching stop layer. The etching stop layer is formed in the top position of the shallow trench isolation.
    Type: Application
    Filed: June 2, 1998
    Publication date: January 17, 2002
    Inventors: CHUNG YUAN LEE, YIH-REN SHAO, PEI-ING LEE