Abstract: A multi-fuse memory cell is disclosed. The circuit includes: a first fuse element electrically coupled to a first transistor, a gate of the first transistor is electrically coupled to a first selection signal; a second fuse element electrically coupled to a second transistor, a gate of the second transistor is electrically coupled to a second selection signal, both the first transistor and the second transistor are grounded; and a programming transistor electrically coupled to the first fuse element and the second fuse element, wherein a gate of the programming transistor is electrically coupled to a programming signal.

Abstract: The present disclosure, in some embodiments, relates to a method of developing a photosensitive material. The method includes forming a photosensitive material over a substrate. The photosensitive material is exposed to electromagnetic radiation focused at a plurality of different heights over the substrate. The plurality of different heights are vertically separated from one another and are disposed within the photosensitive material along a vertical path that extends in a direction perpendicular to an upper surface of the photosensitive material. The photosensitive material is developed to remove a soluble region.

Abstract: The present disclosure, in some embodiments, relates to a method of developing a photosensitive material. The method includes forming a photosensitive material over a substrate. The photosensitive material is exposed to electromagnetic radiation focused at a plurality of different heights over the substrate. The plurality of different heights are vertically separated from one another and are disposed within the photosensitive material along a vertical path that extends in a direction perpendicular to an upper surface of the photosensitive material. The photosensitive material is developed to remove a soluble region.

Abstract: The present disclosure, in some embodiments, relates to a photolithography tool. The photolithography tool includes a source configured to generate electromagnetic radiation. A dynamic focal system is configured to provide the electromagnetic radiation to a plurality of different vertical positions over a substrate stage. The plurality of different vertical positions include a first position having a first depth of focus and a second position having a second depth of focus that is below the first depth of focus and that vertically overlaps the first depth of focus.

Abstract: The present disclosure, in some embodiments, relates to a photolithography tool. The photolithography tool includes a source configured to generate electromagnetic radiation. A dynamic focal system is configured to provide the electromagnetic radiation to a plurality of different vertical positions over a substrate stage. The plurality of different vertical positions include a first position having a first depth of focus and a second position having a second depth of focus that is below the first depth of focus and that vertically overlaps the first depth of focus.

Abstract: The present disclosure, in some embodiments, relates to a method of performing a photolithography process. The method includes forming a photosensitive material over a substantially flat upper surface of a substrate. The substantially flat upper surface of the substrate extends between opposing sides of the substrate. The photosensitive material is exposed to electromagnetic radiation at a plurality of depths of focus that are centered at different heights over the substrate. The photosensitive material is developed to remove a part of the photosensitive material.

Abstract: The present disclosure, in some embodiments, relates to a method of performing a photolithography process. The method includes forming a photosensitive material over a substantially flat upper surface of a substrate. The substantially flat upper surface of the substrate extends between opposing sides of the substrate. The photosensitive material is exposed to electromagnetic radiation at a plurality of depths of focus that are centered at different heights over the substrate. The photosensitive material is developed to remove a part of the photosensitive material.

Abstract: The present disclosure, in some embodiments, relates to a photolithography tool. The photolithography tool includes an illumination source configured to generate electromagnetic radiation and projection optics configured to focus the electromagnetic radiation onto a photosensitive material overlying a substrate according to a pattern on a photomask. A dynamic focal element is configured to dynamically change positions at which the electromagnetic radiation is focused over the substrate during exposure of the photosensitive material. The positions at which the electromagnetic radiation is focused define a plurality of depths of focus. The plurality of depths of focus respectively span a different spatial region within the photosensitive material that is smaller than a thickness of the photosensitive material.

Abstract: A system for fabricating a semiconductor device includes a first supplier, a second supplier, a mixer, and an applier. The first supplier is configured to supply a developer solution having a first chemical. The second supplier is configured to supply the second chemical to the mixer. The mixer is configured to mix the developer solution with a second chemical, in which the second chemical is configured to form a plurality of bubbles in the developer solution. The applier is configured to apply the developer solution mixed with the bubbles onto a photoresist layer formed on a substrate, in which the photoresist layer has an exposed region, and the first chemical is configured to dissolve the exposed region of the photoresist layer through a chemical reaction.

Abstract: The present disclosure relates to a dynamic lithographic exposure method, and an associated apparatus, which exposes a photosensitive material over a plurality of depths of focus respectively spanning a different region of the photosensitive material. By exposing the photosensitive material over a plurality of depths of focus, the exposure of the photosensitive material is improved resulting in a larger lithographic process window. In some embodiments, the dynamic lithographic exposure method is performed by forming a photosensitive material over a substrate. The photosensitive material is exposed to electromagnetic radiation at a plurality of depths of focus that respectively span a different region within the photosensitive material. Exposing the photosensitive material to the electromagnetic radiation modifies a solubility of an exposed region within the photosensitive material. The photosensitive material is then developed to remove the soluble region.

Abstract: The present disclosure, in some embodiments, relates to a photolithography tool. The photolithography tool includes an illumination source configured to generate electromagnetic radiation and projection optics configured to focus the electromagnetic radiation onto a photosensitive material overlying a substrate according to a pattern on a photomask. A dynamic focal element is configured to dynamically change positions at which the electromagnetic radiation is focused over the substrate during exposure of the photosensitive material. The positions at which the electromagnetic radiation is focused define a plurality of depths of focus.

Abstract: A temperature sensing patch that is easy to use and capable of efficiently monitoring temperature change in human, body for a long time, capable of being used with a reading device, comprising the temperature sensing patch configured to attach to human skin, comprising a housing, a circuit board, a temperature sensing unit electrically connected with the circuit board, a battery, a processor chip, at least a memory unit, and at least a port; wherein the processor chip can automatically turn on the temperature sensing patch and reset the previous data by a predetermined program, rather than through a manual switch, when the temperature sensing patch is removed from the reading device.

Abstract: A reading device, applied with at least one temperature sensing device and at least one external device; the temperature sensing device electrically connected with the reading device, comprising at least one temperature sensing patch which is capable of attaching on human skin, and sensing as well as recording body temperature change; the outer device being connected with, the reading device by a wireless communication; the reading device comprising: a housing, a data transmission port group, a screen, an external device connection port group, a memory unit, a processor unit, a control interface, and a wireless communication unit; the reading device is capable of reading and integrating the body temperature data obtained from the temperature sensing patch, and transmitting rapidly to the external device, whereby the medical personnel could quickly and easily know a patient's body temperature change, and effectively determine the patient's condition

Abstract: A method of obtaining symmetric temperature change, comprising the following steps of preparing a temperature sensing device; measuring and collecting temperature change: placing the temperature sensing device (1) on a predetermined position of a participant to measure and collect the participant's body temperature change data; extracting data; removing the temperature sensing device from the participant's body when running out of the battery and then connecting a reading device to extract the body temperature change data out of the temperature sensing device in order to apply the body temperature change data in precision medicine; the body temperature change data is used as the key marker without affecting the participant's daily activity, preventing the participant from inaccuracy of the body temperature change data caused by psychological and/or physiological factors, so the body temperature change data can be applied in the symmetry precision medicine.

Abstract: An imaging plate for projection, the imaging plate comprising an impermeable plate and a projecting device disposed in said one surface of the plate in a certain distance, wherein the projecting device is capable of projecting light and image; the plate having a plurality of cylinder through holes disposed on both surface thereof; wherein the cylinder through holes are filled with transparent pillars, one end of said pillar defined an input end which receives the light and image from the projecting device and then guides them to an output end thereof; wherein an inner wall of the cylinder through holes comprises a light reflective surface; wherein the both input end and output end of transparent pillar are parallel to the rear and front surface of the plate.

Abstract: The present disclosure relates to a dynamic lithographic exposure method, and an associated apparatus, which exposes a photosensitive material over a plurality of depths of focus respectively spanning a different region of the photosensitive material. By exposing the photosensitive material over a plurality of depths of focus, the exposure of the photosensitive material is improved resulting in a larger lithographic process window. In some embodiments, the dynamic lithographic exposure method is performed by forming a photosensitive material over a substrate. The photosensitive material is exposed to electromagnetic radiation at a plurality of depths of focus that respectively span a different region within the photosensitive material. Exposing the photosensitive material to the electromagnetic radiation modifies a solubility of an exposed region within the photosensitive material. The photosensitive material is then developed to remove the soluble region.

Abstract: An imaging plate for projection, the imaging plate comprising an impermeable plate and a projecting device disposed in said one surface of the plate in a certain distance, wherein the projecting device is capable of projecting light and image; the plate having a plurality of cylinder through holes disposed on both surface thereof; wherein the cylinder through holes are filled with transparent pillars, one end of said pillar defined an input end which receives the light and image from the projecting device and then guides them to an output end thereof; wherein an inner wall of the cylinder through holes comprises a light reflective surface; wherein the both input end and output end of transparent pillar are parallel to the rear and front surface of the plate.

Abstract: A system for fabricating a semiconductor device includes a first supplier, a second supplier, a mixer, and an applier. The first supplier is configured to supply a developer solution having a first chemical. The second supplier is configured to supply the second chemical to the mixer. The mixer is configured to mix the developer solution with a second chemical, in which the second chemical is configured to form a plurality of bubbles in the developer solution. The applier is configured to apply the developer solution mixed with the bubbles onto a photoresist layer formed on a substrate, in which the photoresist layer has an exposed region, and the first chemical is configured to dissolve the exposed region of the photoresist layer through a chemical reaction.

Abstract: An electronic contact thermometer with shorter reactive time, which comprises a case; a circuit board which is installed in said case; a display; a switch; a power supply device; and a sensing part which is installed in one end of said case. Electrically connected with said circuit board; said display and switch are disposed on one side of said case; said sensing part comprises a positioning nugget that is installed in the same end of said case that the sensing part is installed. A temperature sensing chip; and 2 conducting lines which are electrically connected to the temperature sensing chip. Said metallic contact part is a round cap with flat contacting surface, which comprises positioning sticks on the surrounding wall, which connect to said positioning rods for making it protruding from but not contact to said case.

Abstract: A thermometer includes a body member and a tip member with a thermal contact surface secured to the body member. A thermal sensor mounted on the inside of the tip member is adapted for sensing a thermal contact surface and producing a temperature signal. A set of lead wires is coupled to the thermal sensor for transmission of the temperature signal. A display module is disposed in the body member. A processor is electrically connected to the set of lead wires to receive the temperature signal for display of a corresponding temperature reading. An electric generator having a motor with a rotary shaft is disposed in the body member. The motor is driven for generating electric energy when the rotary shaft is rotated. A capacitor is electrically connected to the electric generator for storing the electric energy generated by the electric generator and supplying the electric energy to the processor.