Abstract: The present disclosure provides a DC motor driving system including a DC motor, a power supply device, a switch circuit, and a microprocessor. The power supply device provides an input electrical energy. The switch circuit receives the input electrical energy and outputs a motor electrical energy, which includes a motor power and a motor voltage, to the DC motor. The DC motor driving system switchably works in a constant-voltage mode, a first variable-voltage mode, or a second variable-voltage mode. In the constant-voltage mode, the input electrical energy remains unchanged. In the first variable-voltage mode, the microprocessor controls the power supply device to adjust the input electrical energy for increasing the motor voltage and the motor power. In the second variable-voltage mode, the microprocessor controls the power supply device to adjust the input electrical energy for decreasing the motor voltage and keeping the motor power unchanged.

Abstract: The present disclosure provides a DC motor driving system including a DC motor, a power supply device, a switch circuit, and a microprocessor. The power supply device provides an input electrical energy. The switch circuit receives the input electrical energy and outputs a motor electrical energy, which includes a motor power and a motor voltage, to the DC motor. The DC motor driving system switchably works in a constant-voltage mode, a first variable-voltage mode, or a second variable-voltage mode. In the constant-voltage mode, the input electrical energy remains unchanged. In the first variable-voltage mode, the microprocessor controls the power supply device to adjust the input electrical energy for increasing the motor voltage and the motor power. In the second variable-voltage mode, the microprocessor controls the power supply device to adjust the input electrical energy for decreasing the motor voltage and keeping the motor power unchanged.

Abstract: Techniques involve: receiving an input/output request for data stored in a second storage means of a storage system; determining a use frequency of the data; moving the data from the second storage means into a first storage means in the storage system if it is determined that the use frequency is higher than a threshold frequency and the input/output request is a read request, an input/output speed of the first storage means being higher than that of the second storage means; and writing, if it is determined that the use frequency is higher than the threshold frequency and the input/output request is a write request that includes update data, the update data as the data into the first storage means. Accordingly, the storage performance can be improved without affecting the input/output traffic, which not only can reduce the operating cost, but also can improve user experience.

Abstract: Techniques involve: receiving an input/output request for data stored in a second storage means of a storage system; determining a use frequency of the data; moving the data from the second storage means into a first storage means in the storage system if it is determined that the use frequency is higher than a threshold frequency and the input/output request is a read request, an input/output speed of the first storage means being higher than that of the second storage means; and writing, if it is determined that the use frequency is higher than the threshold frequency and the input/output request is a write request that includes update data, the update data as the data into the first storage means. Accordingly, the storage performance can be improved without affecting the input/output traffic, which not only can reduce the operating cost, but also can improve user experience.

Abstract: A chemical mechanical polishing slurry for polishing a stainless steel substrate is provided, which comprises a content 10˜50 wt % of abrasive particles, a content 0.001˜2.0 wt % of a coolant, a content 0.001˜1.0 wt % of an oxidant, a content 10˜5000 ppm of a lubricity improver, and a content 10˜5000 ppm of a foam inhibitor. A particle size of the abrasive particles is in a range of 20˜500 nm. The alkaline polishing slurry according to the present invention is capable of increasing the polishing performance, surface quality, and surface passivation effect after the chemical-mechanical polishing process.

Abstract: A chemical mechanical polishing slurry for polishing a stainless steel substrate is provided, which comprises a content 10˜50 wt % of abrasive particles, a content 0.001˜2.0 wt % of a coolant, a content 0.001˜1.0 wt % of an oxidant, a content 10˜5000 ppm of a lubricity improver, and a content 10˜5000 ppm of a foam inhibitor. A particle size of the abrasive particles is in a range of 20˜500 nm. The alkaline polishing slurry according to the present invention is capable of increasing the polishing performance, surface quality, and surface passivation effect after the chemical-mechanical polishing process.