Abstract: A system and method for identifying lithology based on images and XRF mineral inversion solving the problem that conventional lithology identification relies on manual work, which is time-consuming, subjective and can cause misjudgment. The identification system includes an autonomous vehicle; an X ray fluorescence spectrometer probe, and tests surrounding rock element information; image collection device; and vehicle-mounted processor. The processor inverts the received surrounding rock element information into mineral information based on a Barthes-Niggli standard mineral calculation method; and receive surrounding rock images and a corresponding inclination angle thereof, convert the surrounding rock images into image information in a one-dimensional vector format, splice the image and mineral information which is in a one-dimensional format, and distinguish the spliced information based on a preset neural network to identify rock lithology.

Abstract: A system and method for identifying lithology based on images and XRF mineral inversion solving the problem that conventional lithology identification relies on manual work, which is time-consuming, subjective and can cause misjudgment. The identification system includes an autonomous vehicle; an X ray fluorescence spectrometer probe, and tests surrounding rock element information; image collection device; and vehicle-mounted processor. The processor inverts the received surrounding rock element information into mineral information based on a Barthes-Niggli standard mineral calculation method; and receive surrounding rock images and a corresponding inclination angle thereof, convert the surrounding rock images into image information in a one-dimensional vector format, splice the image and mineral information which is in a one-dimensional format, and distinguish the spliced information based on a preset neural network to identify rock lithology.

Abstract: The present disclosure relates to the field of micro-nano fabrication, and provides a projection-type photolithography system using a composite photon sieve. The system comprises: a lighting system, a mask plate, a composite photon sieve and a substrate, which are arranged in order. The lighting system is adapted to generate incident light and irradiate the mask plate with the incident light. The mask plate is adapted to provide an object to be imaged by the composite photon sieve, and the incident light reaches the composite photon sieve after passing through the mask plate. The composite photon sieve is adapted to perform imaging, by which a pattern on the mask plate is imaged on the substrate. The substrate is adapted to receive an image of the pattern on the mask plate imaged by the composite photon sieve.

Abstract: The present disclosure relates to the field of micro-nano fabrication, and provides a projection-type photolithography system using a composite photon sieve. The system comprises: a lighting system, a mask plate, a composite photon sieve and a substrate, which are arranged in order. The lighting system is adapted to generate incident light and irradiate the mask plate with the incident light. The mask plate is adapted to provide an object to be imaged by the composite photon sieve, and the incident light reaches the composite photon sieve after passing through the mask plate. The composite photon sieve is adapted to perform imaging, by which a pattern on the mask plate is imaged on the substrate. The substrate is adapted to receive an image of the pattern on the mask plate imaged by the composite photon sieve.