Patents by Inventor Yille A. Saanila

Yille A. Saanila has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7102235
    Abstract: Method and structures are provided for conformal lining of dual damascene structures in integrated circuits. Trenches and contact vias are formed in insulating layers. The trenches and vias are exposed to alternating chemistries to form monolayers of a desired lining material. Exemplary process flows include alternately pulsed metal halide and ammonia gases injected into a constant carrier flow. Self-terminated metal layers are thus reacted with nitrogen. Near perfect step coverage allows minimal thickness for a diffusion barrier function, thereby maximizing the volume of a subsequent filling metal for any given trench and via dimensions.
    Type: Grant
    Filed: December 15, 2003
    Date of Patent: September 5, 2006
    Assignee: ASM International N.V.
    Inventors: Ivo Raaijmakers, Suvi P. Haukka, Yille A. Saanila, Pekka J. Soininen, Kai-Erik Elers, Ernst H. A. Granneman
  • Publication number: 20040130029
    Abstract: Method and structures are provided for conformal lining of dual damascene structures in integrated circuits. Trenches and contact vias are formed in insulating layers. The trenches and vias are exposed to alternating chemistries to form monolayers of a desired lining material. Exemplary process flows include alternately pulsed metal halide and ammonia gases injected into a constant carrier flow. Self-terminated metal layers are thus reacted with nitrogen. Near perfect step coverage allows minimal thickness for a diffusion barrier function, thereby maximizing the volume of a subsequent filling metal for any given trench and via dimensions.
    Type: Application
    Filed: December 15, 2003
    Publication date: July 8, 2004
    Inventors: Ivo Raaijmakers, Suvi P. Haukka, Yille A. Saanila, Pekka J. Soininen, Kai-Erik Elers, Ernst H.A. Granneman