Patents by Inventor Yim Bun P. Kwan

Yim Bun P. Kwan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7202937
    Abstract: A balanced positioning apparatus comprises a balance mass which is supported so as to be moveable in the three degrees of freedom, such as X and Y translation and rotation about the Z-axis. Drive forces in these degrees of freedom act directly between the positioning body and the balance mass. Reaction forces arising from positioning movements result in corresponding movement of the balance mass and all reaction force are kept within the balanced positioning system. The balance mass may be a rectangular balance frame having the stators of two linear motors forming the uprights of an H-drive mounted on opposite sides. The cross-piece of the H-drive spans the frame and the positioned object is positioned within the central opening of the frame.
    Type: Grant
    Filed: February 28, 2006
    Date of Patent: April 10, 2007
    Assignee: ASML Netherlands B.V.
    Inventors: Yim Bun P. Kwan, Wilhelmus J. T. P. van de Wiel
  • Patent number: 7057313
    Abstract: A voice coil motor used, for example, in a positioning device associated with either a first object table or a second object table in which the coil is cooled with a cooling jacket in thermal contact with the coil, the cooling jacket comprising at least one channel for circulation of a cooling fluid, the or each channel being arranged such as to be substantially located in a portion of the cooling jacket adjacent to the coil, for use, for example, in a lithographic projection apparatus including a radiation system for supplying a projection beam of radiation, a first object table for holding a mask, a second object table for holding a substrate, a projection system for imaging irradiated portions of the mask onto target portions of the substrate. The cooling jacket may be formed of a ceramic material and may be of a monolithic construction.
    Type: Grant
    Filed: October 6, 2004
    Date of Patent: June 6, 2006
    Assignee: ASML Netherlands B.V.
    Inventors: Edwin J. Buis, Noud J. Gilissen, Yim Bun P. Kwan, Paulus H. C. M. Schapendonk
  • Patent number: 7034920
    Abstract: A balanced positioning apparatus comprises a balance mass which is supported so as to be moveable in the three degrees of freedom, such as X and Y translation and rotation about the Z-axis. Drive forces in these degrees of freedom act directly between the positioning body and the balance mass. Reaction forces arising from positioning movements result in corresponding movement of the balance mass and all reaction force are kept within the balanced positioning system. The balance mass may be a rectangular balance frame having the stators of two linear motors forming the uprights of an H-drive mounted on opposite sides. The cross-piece of the H-drive spans the frame and the positioned object is positioned within the central opening of the frame.
    Type: Grant
    Filed: December 19, 2002
    Date of Patent: April 25, 2006
    Assignee: ASML Netherlands B.V.
    Inventors: Yim Bun P. Kwan, Wilhelmus J. T. P. van de Wiel
  • Patent number: 6924882
    Abstract: A balanced positioning system for use in lithographic apparatus having a pair of balance masses which are supported so as to be moveable in at least one degree of freedom, such as Y translation. Oppositely directed drive forces in this degree of freedom act directly between the driven body and the balance masses to rotate the driven body about an axis perpendicular to the one direction. Reaction forces arising from positioning movements result in linear movements of the balance masses and all reaction forces are kept within the balanced positioning system.
    Type: Grant
    Filed: August 28, 2003
    Date of Patent: August 2, 2005
    Assignee: ASML Netherlands B.V.
    Inventor: Yim Bun P. Kwan
  • Patent number: 6852989
    Abstract: A positioning system, such as may be used to position a moveable object table in three degrees of freedom. More particularly, the invention relates to the use of the positioning system in a lithographic projection apparatus including an illumination system for supplying a projection beam of radiation, a first object table for holding a mask, a second, movable object table for holding a substrate, and a projection system for imaging an irradiated portion of the mask onto a target portion of the substrate.
    Type: Grant
    Filed: August 27, 2003
    Date of Patent: February 8, 2005
    Assignee: ASML Netherlands B.V.
    Inventors: Yim Bun P. Kwan, Serge F. C. L. Wetzels, Gerjan P. Veldhuis
  • Publication number: 20040211921
    Abstract: A position measuring device includes a radiation source mounted on an isolated reference frame and a two-dimensional radiation detector mounted adjacent the radiation source. The object whose position is to be detected has a mirroring device, e.g. a retro-reflector, mounted on it so as to reflect light emitted from the radiation source along a return path that is parallel to but displaced from the incident light path. The amount of displacement is dependent on the position of the object and is measured by the two-dimensional detector. Three such devices can be combined in a system to measure the position of the object in all six degrees of freedom.
    Type: Application
    Filed: May 14, 2004
    Publication date: October 28, 2004
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Thomas J.M. Castenmiller, Andreas B.G. Ariens, Martinus H.H. Hoeks, Patrick D. Vogelsang, Erik R. Loopstra, Yim Bun P. Kwan
  • Publication number: 20040079898
    Abstract: A voice coil motor used in a positioning means associated with either a first object table or a second object table in which the coil is cooled with a cooling jacket in thermal contact with the coil, the cooling jacket comprising at least one channel for circulation of a cooling fluid, the or each channel being arranged such as to be substantially located in a portion of the cooling jacket adjacent to the coil, for use in a lithographic projection apparatus comprising:
    Type: Application
    Filed: October 15, 2003
    Publication date: April 29, 2004
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Edwin J. Buis, Noud J. Gilissen, Yim Bun P. Kwan, Paulus H.C.M. Schapendonk
  • Publication number: 20040041994
    Abstract: A balanced positioning system for use in lithographic apparatus having a pair of balance masses which are supported so as to be moveable in at least one degree of freedom, such as Y translation. Oppositely directed drive forces in this degree of freedom act directly between the driven body and the balance masses to rotate the driven body about an axis perpendicular to the one direction. Reaction forces arising from positioning movements result in linear movements of the balance masses and all reaction forces are kept within the balanced positioning system.
    Type: Application
    Filed: August 28, 2003
    Publication date: March 4, 2004
    Applicant: ASML NETHERLANDS B.V.
    Inventor: Yim Bun P. Kwan
  • Patent number: 6671036
    Abstract: A balanced positioning system for use in lithographic apparatus having a pair of balance masses which are supported so as to be moveable in at least one degree of freedom, such as Y translation. Oppositely directed drive forces in this degree of freedom act directly between the driven body and the balance masses to rotate the driven body about an axis perpendicular to the one direction. Reaction forces arising from positioning movements result in linear movements of the balance masses and all reaction forces are kept within the balanced positioning system.
    Type: Grant
    Filed: August 2, 2002
    Date of Patent: December 30, 2003
    Assignee: ASML Netherlands B.V.
    Inventor: Yim Bun P. Kwan
  • Patent number: 6657204
    Abstract: A voice coil motor used in a positioning means associated with either a first object table or a second object table in which the coil is cooled with a cooling jacket in thermal contact with the coil, the cooling jacket comprising at least one channel for circulation of a cooling fluid, the or each channel being arranged such as to be substantially located in a portion of the cooling jacket adjacent to the coil, for use in a lithographic projection apparatus comprising: a radiation system for supplying a projection beam of radiation; a first object table for holding a mask; a second object table for holding a substrate; a projection system for imaging irradiated portions of the mask onto target portions of the substrate. The cooling jacket may be formed of a ceramic material and preferably is of a monolithic construction.
    Type: Grant
    Filed: February 7, 2001
    Date of Patent: December 2, 2003
    Assignee: ASML Netherlands B.V.
    Inventors: Edwin J. Buis, Noud J. Gilissen, Yim Bun P. Kwan, Paulus H.C.M. Schapendonk
  • Patent number: 6635887
    Abstract: A positioning system, such as may be used to position a moveable object table in three degrees of freedom. More particularly, the invention relates to the use of the positioning system in a lithographic projection apparatus including an illumination system for supplying a projection beam of radiation, a first object table for holding a mask, a second, movable object table for holding a substrate, and a projection system for imaging an irradiated portion of the mask onto a target portion of the substrate.
    Type: Grant
    Filed: November 29, 2000
    Date of Patent: October 21, 2003
    Assignee: ASML Netherlands B.V.
    Inventors: Yim Bun P. Kwan, Serge F. C. L. Wetzels, Gerjan P. Veldhuis
  • Patent number: 6542220
    Abstract: A lithographic apparatus has at least one compartment closely surrounding at least one of the mask and substrate holders but not either of the illumination or projection systems so as to reduce the volume that must be purged with gas transparent to the projection radiation. In a scanner, the compartment surrounding the mask holder preferably moves with the mask table and may be formed by a combination of a frame-shaped mask table driven in the scanning operation and stationary plates fixed relative to the projection and illumination systems.
    Type: Grant
    Filed: November 3, 2000
    Date of Patent: April 1, 2003
    Assignee: ASML Netherlands, B.V.
    Inventors: Raymond L. J. Schrijver, Tjarko A. R. van Empel, Marcel K. M. Baggen, Bernardus A. J. Luttikhuis, Yim Bun P. Kwan, Erik R. Loopstra
  • Patent number: 6525803
    Abstract: A balanced positioning apparatus comprises a balance mass which is supported so as to be moveable in the three degrees of freedom, such as X and Y translations and rotation about the Z-axis. Drive forces in these degrees of freedom act directly between the positioning body and the balance mass. Reaction forces arising from positioning movements result in corresponding movement of the balance mass and all reaction forces are kept within the balanced positioning system. The balance mass may be a rectangular balance frame having the stators of two linear motors forming the uprights of an H-drive mounted on opposite sides. The cross-piece of the H-drive spans the frame and the positioned object is positioned within the central opening of the frame.
    Type: Grant
    Filed: December 19, 2000
    Date of Patent: February 25, 2003
    Assignee: ASML Netherlands B.V.
    Inventors: Yim Bun P. Kwan, Wilhelmus J. T. P. van de Wiel
  • Patent number: 6509951
    Abstract: In a lithographic projection apparatus a first part is shielded from a second part by a heat shield. The first part is required to have a temperature of a predetermined value and the second part has a characteristic that may influence the temperature of the first part. The characteristic may be a temperature deviating from the predetermined value, or a supply of radiation that may deviate the temperature of the first part from the predetermined value when incident on the first part. Heat shield temperature controlling means are provided to control a temperature of the heat shield to the predetermined value.
    Type: Grant
    Filed: February 7, 2001
    Date of Patent: January 21, 2003
    Assignee: ASML Netherlands B.V.
    Inventors: Erik R. Loopstra, Yim Bun P. Kwan, Marcel J. E. H. Muitjens, Sonja T. De Vrieze-Voorn
  • Patent number: 6498350
    Abstract: In a multi-table lithographic apparatus in which substrate tables may be exchanged between a first working zone where substrates are loaded onto and removed from the table and a second working zones where wafers are exposed, collision prevention means are provided to prevent collisions between tables in the exchange process. The collision prevention means may be formed of a labyrinth or a revolving door. The exchange process may be controlled by shuttles, optionally including drive means, that are interlinked so that the tables can only be exchanged between zones together.
    Type: Grant
    Filed: December 19, 2000
    Date of Patent: December 24, 2002
    Assignee: ASML Netherlands B.V.
    Inventors: Yim Bun P. Kwan, Engelbertus A. F. van de Pasch, Andreas B. G. Ariens, Edwin J. Buis, Jan F. Hoogkamp, Robert-Han Munnig Schmidt
  • Publication number: 20020191173
    Abstract: A balanced positioning system for use in lithographic apparatus having a pair of balance masses which are supported so as to be moveable in at least one degree of freedom, such as Y translation. Oppositely directed drive forces in this degree of freedom act directly between the driven body and the balance masses to rotate the driven body about an axis perpendicular to the one direction. Reaction forces arising from positioning movements result in linear movements of the balance masses and all reaction forces are kept within the balanced positioning system.
    Type: Application
    Filed: August 2, 2002
    Publication date: December 19, 2002
    Applicant: ASML NETHERLANDS B.V.
    Inventor: Yim Bun P. Kwan
  • Patent number: 6449030
    Abstract: A balanced positioning system for use in lithographic apparatus having a pair of balance masses which are supported so as to be moveable in at least one degree of freedom, such as Y translation. Oppositely directed drive forces in this degree of freedom act directly between the driven body and the balance masses to rotate the driven body about an axis perpendicular to the one direction. Reaction forces arising from positioning movements result in linear movements of the balance masses and all reaction forces are kept within the balanced positioning system.
    Type: Grant
    Filed: December 19, 2000
    Date of Patent: September 10, 2002
    Assignee: ASML Netherlands B.V.
    Inventor: Yim Bun P. Kwan
  • Publication number: 20020048009
    Abstract: A balanced positioning system for use in lithographic apparatus comprises a pair of balance masses which are supported so as to be moveable in at least one degree of freedom, such as Y translation. Oppositely directed drive forces in this degree of freedom act directly between the driven body and the balance masses to rotate the driven body about an axis perpendicular to the one direction. Reaction forces arising from positioning movements result in linear movements of the balance masses and all reaction forces are kept within the balanced positioning system.
    Type: Application
    Filed: December 19, 2000
    Publication date: April 25, 2002
    Inventor: Yim Bun P. Kwan
  • Publication number: 20010050341
    Abstract: An H-drive arrangement for the substrate or mask stages of a lithographic apparatus has an X-beam 11 rigidly mounted to Y-sliders 121a, 121b against X and Y translation and rotation about a Z axis (yaw) so as to form a rigid body in the XY plane. Rotation about X and Y axes is permitted in the joint between at least one Y-slider 121a, 121b and X-beam 11. Crash protection may be provided by a yaw rate sensor and/or resilient buffers which contact Y-beams 12a, 12b in the event of out-of-range yaw motions.
    Type: Application
    Filed: November 29, 2000
    Publication date: December 13, 2001
    Inventors: Yim Bun P. Kwan, Serge F.C.L. Wetzels, Gerjan P. Veldhuis
  • Publication number: 20010013580
    Abstract: A voice coil motor used in a positioning means associated with either a first object table or a second object table in which the coil is cooled with a cooling jacket in thermal contact with the coil, the cooling jacket comprising at least one channel for circulation of a cooling fluid, the or each channel being arranged such as to be substantially located in a portion of the cooling jacket adjacent to the coil.
    Type: Application
    Filed: February 7, 2001
    Publication date: August 16, 2001
    Inventors: Edwin J. Buis, Noud J. Gilissen, Yim Bun P. Kwan, Paulus H.C.M. Schapendonk