Abstract: This invention provides a process or fabrication method of forming broadband anti-reflective (AR) coating over the mid-IR fluoride fiber for high power laser applications in mid-IR wavelength range. The AR coating consists of multiple-pair Lithium fluoride (LiF) and Al2O3, and was deposited by electron beam physical vapor deposition with an iron assistant source at low temperature (<60° C.). A thin encapsulation layer of Al2O3 was applied over the AR coating by atomic layer deposition technology. The measurements show the coating has a reflectivity of <1-1.5% in the range of 1.5-5.5 ?m. The laser induced damage threshold (LIDT) test shows the damage threshold is greater than 8.9 MW/cm2 with no sign of any damage on the coating exposed to atmosphere. The durability and environmental tests of the AR coating with PVD coated encapsulation layer show good humidity resistance in open air and no degradation of film quality and optical performance are observed.

Abstract: The present invention relates to a method for preparing high-purity vanadium pentoxide from vanadium-bearing shale by all-wet process. The technical solution is: the “Gradient continuous leaching system of vanadium-bearing shale” is used to wet activate and compound leach vanadium-bearing shale to obtain vanadium-containing acid leachate. The “pH adjusting device of the vanadium-containing acid leachate” is used to adjust the pH of vanadium-containing acid leaching leachate. The post-treatment solution is subjected to hydroxime countercurrent extraction after oxidation, and the raffinate returns to the water using in the wet activation and electrodialysis after neutralization, and the loaded organic phase is regenerated by countercurrent reduction stripping. The regenerated organic phase directly returns to hydroxime countercurrent extraction.

Abstract: An example apparatus for generating synthesized images includes a receiver to receive a frame, a mask and external images. The apparatus also includes a foreground augmenter to generate augmented foregrounds in the frame based on the mask. The apparatus includes a background augmenter to generate augmented backgrounds based on the frame, the mask, and the external images. The apparatus also further includes an image synthesizer to generate a synthesized image based on the generated augmented foregrounds and the augmented backgrounds.

Abstract: This invention provides a process or fabrication method of forming broadband anti-reflective (AR) coating over the mid-IR fluoride fiber for high power laser applications in mid-IR wavelength range. The AR coating consists of multiple-pair Lithium fluoride (LiF) and Al2O3, and was deposited by electron beam physical vapor deposition with an iron assistant source at low temperature (<60° C.). A thin encapsulation layer of Al2O3 was applied over the AR coating by atomic layer deposition technology. The measurements show the coating has a reflectivity of <1-1.5% in the range of 1.5-5.5 ?m. The laser induced damage threshold (LIDT) test shows the damage threshold is greater than 8.9 MW/cm2 with no sign of any damage on the coating exposed to atmosphere. The durability and environmental tests of the AR coating with PVD coated encapsulation layer show good humidity resistance in open air and no degradation of film quality and optical performance are observed.

Abstract: The present invention relates to novel compounds of formula (I), wherein R1, R2, R3, R4, R5 and R6 are as described herein, and their pharmaceutically acceptable salt, enantiomer or diastereomer thereof, and compositions including the compounds and methods of using the compounds.

Abstract: The present invention relates to novel compounds of formula (I), wherein R1 to R7 are as described herein, and their pharmaceutically acceptable salt, enantiomer or diastereomer thereof, and compositions including the compounds and methods of using the compounds.

Abstract: The present invention relates to novel compounds of formula (I), wherein R1, R2, R3, R4, R5 and R6 are as described herein, and their pharmaceutically acceptable salt, enantiomer or diastereomer thereof, and compositions including the compounds and methods of using the compounds.

Abstract: The present invention relates to novel compounds of formula (I), wherein R1, R2, R3, R4, R5 and R6 are as described herein, and their prodrugs or pharmaceutically acceptable salt, enantiomer or diastereomer thereof, and compositions including the compounds and methods of using the compounds.

Abstract: The present invention relates to novel compounds of formula (I), wherein R1, R2, R3, R4, R5, R6 and R7 are as described herein, and their pharmaceutically acceptable salt, enantiomer or diastereomer thereof, and compositions including the compounds and methods of using the compounds.

Abstract: Provided is a method for preparing an alkynyl pyridine prolyl hydroxylase inhibitor. In particular, the method involved uses 3-substituted-5-bromopyridine-2-carboxylic acid protected by different protection groups as raw materials, and by means of condensation, Sonogashira coupling and deprotection, the target compound is obtained. The process reaction conditions are simple, and have no harsh reaction conditions, strong operability, and stable amplification.

Abstract: The present invention relates to novel compounds of formula (I), wherein R1, R2, R3, R4, R5 and R6 are as described herein, and their pharmaceutically acceptable salt, enantiomer or diastereomer thereof, and compositions including the compounds and methods of using the compounds.

Abstract: The present invention relates to novel compounds of formula (I), wherein R1, R2, R3, R4, R5 and R6 are as described herein, and their pharmaceutically acceptable salt, enantiomer or diastereomer thereof, and compositions including the compounds and methods of using the compounds.

Abstract: The present invention relates to novel compounds of formula (I), wherein R1, R2, R3, R4, R5 and R6 are as described herein, and their pharmaceutically acceptable salt, enantiomer or diastereomer thereof, and compositions including the compounds and methods of using the compounds.

Abstract: The present invention relates to compounds of formula of formula I wherein X, R, L, Ar, R1 and n are as described herein, compositions containing compounds of formula I, methods of manufacture of compounds of formula I and methods of treating psychiatric disorders with compounds of formula I.

Abstract: The present invention relates to compounds of formula of formula I wherein X, L and R1 are as described herein, compositions containing compounds of formula I, methods of manufacture of compounds of formula I and methods of treating psychiatric, metabolic, cardiovascular or sleep disorders with compounds of formula I.

Abstract: The invention provides novel compounds having the general formula: wherein R1, R2, R3 and R4 are as defined in the description and in the claims, as well as or pharmaceutically acceptable salts, or tautomerism isomers, or enantiomers, or diastereomers thereof. The invention also contains compositions including the compounds and methods of using the compounds.

Abstract: The present invention relates to compounds of formula of formula I wherein X, Ar, R1, m and n are as described herein, compositions containing compounds of formula I, methods of manufacture of compounds of formula I and methods of treating psychiatric disorders with compounds of formula I.

Abstract: The present invention relates to compounds of formula of formula I wherein X, L and R1 are as described herein, compositions containing compounds of formula I, methods of manufacture of compounds of formula I and methods of treating psychiatric, metabolic, cardiovascular or sleep disorders with compounds of formula I.

Abstract: The present invention relates to compounds of formula of formula I wherein X, Ar, R1, m and n are as described herein, compositions containing compounds of formula I, methods of manufacture of compounds of formula I and methods of treating psychiatric disorders with compounds of formula I.

Abstract: The present invention relates to compounds of formula of formula I wherein X, R, L, Ar, R1 and n are as described herein, compositions containing compounds of formula I, methods of manufacture of compounds of formula I and methods of treating psychiatric disorders with compounds of formula I.