Patents by Inventor Yin-Jie Wang

Yin-Jie Wang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Overlay mark and method of fabricating the same
    Patent number: 10705436
    Abstract: An apparatus includes an overlay mark. The overlay mark includes a first portion including a first pattern and a second portion including a second pattern. The first pattern includes a plurality of first features and a first center feature each separated by a gap along a first direction. At least two gaps are the same but are different from the other gaps, and the first centers are symmetric with respect to the first center feature. The second pattern includes a plurality of second features and a second center feature each separated by a gap along the first direction. At least two gaps are the same but are different from the other gaps, and the second features are symmetric with respect to the second center feature. The first center feature of the first pattern is aligned with the second center feature of the second pattern along a second direction.
    Type: Grant
    Filed: September 27, 2018
    Date of Patent: July 7, 2020
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Cheng-Yu Wen, Yin-Jie Wang, Hsiao-Chun Kuo, Ming-Shane Lu
  • OVERLAY MARK AND METHOD OF FABRICATING THE SAME
    Publication number: 20200103763
    Abstract: An apparatus includes an overlay mark. The overlay mark includes a first portion including a first pattern and a second portion including a second pattern. The first pattern includes a plurality of first features and a first center feature each separated by a gap along a first direction. At least two gaps are the same but are different from the other gaps, and the first centers are symmetric with respect to the first center feature. The second pattern includes a plurality of second features and a second center feature each separated by a gap along the first direction. At least two gaps are the same but are different from the other gaps, and the second features are symmetric with respect to the second center feature. The first center feature of the first pattern is aligned with the second center feature of the second pattern along a second direction.
    Type: Application
    Filed: September 27, 2018
    Publication date: April 2, 2020
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Cheng-Yu WEN, Yin-Jie WANG, Hsiao-Chun KUO, Ming-Shane LU
  • Method, device and computer program product for controlling lights
    Patent number: 10271410
    Abstract: A light controlling method, a light controlling device, and a computer program product are provided. The light controlling method includes: displaying a user controlling interface which includes a plurality of first input parameter fields; receiving a first input parameter input through the first input parameter fields; obtaining a light parameter set corresponding to the first input parameters from a human factor light parameter table; transmitting a wireless signal to control a light according to the light parameter set.
    Type: Grant
    Filed: May 8, 2018
    Date of Patent: April 23, 2019
    Assignee: Industrial Technology Research Institute
    Inventors: Yin-Jie Wang, Tzung-Te Chen, Han-Kuei Fu