Patents by Inventor Yinda Dong

Yinda Dong has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20160163389
    Abstract: A memory stack structure includes a cavity including a back gate electrode, a back gate dielectric, a semiconductor channel, and at least one charge storage element. In one embodiment, a line trench can be filled with a memory film layer, and a plurality of semiconductor channels can straddle the line trench. The back gate electrode can extend along the lengthwise direction of the line trench. In another embodiment, an isolated memory opening overlying a patterned conductive layer can be filled with a memory film, and the back gate electrode can be formed within a semiconductor channel and on the patterned conductive layer. A dielectric cap portion electrically isolates the back gate electrode from a drain region. The back gate electrode can be employed to bias the semiconductor channel, and to enable sensing of multinary bits corresponding to different amounts of electrical charges stored in a memory cell.
    Type: Application
    Filed: December 9, 2014
    Publication date: June 9, 2016
    Inventors: Yanli ZHANG, Johann ALSMEIER, Yinda DONG, Akira MATSUDAIRA
  • Patent number: 9355727
    Abstract: A memory stack structure includes a cavity including a back gate electrode, a back gate dielectric, a semiconductor channel, and at least one charge storage element. In one embodiment, a line trench can be filled with a memory film layer, and a plurality of semiconductor channels can straddle the line trench. The back gate electrode can extend along the lengthwise direction of the line trench. In another embodiment, an isolated memory opening overlying a patterned conductive layer can be filled with a memory film, and the back gate electrode can be formed within a semiconductor channel and on the patterned conductive layer. A dielectric cap portion electrically isolates the back gate electrode from a drain region. The back gate electrode can be employed to bias the semiconductor channel, and to enable sensing of multinary bits corresponding to different amounts of electrical charges stored in a memory cell.
    Type: Grant
    Filed: December 9, 2014
    Date of Patent: May 31, 2016
    Assignee: SANDISK TECHNOLOGIES INC.
    Inventors: Yanli Zhang, Johann Alsmeier, Yinda Dong, Akira Matsudaira
  • Patent number: 9098205
    Abstract: In a nonvolatile memory array, such as a three-dimensional array of charge-storage memory cells, data is randomized so that data of different strings along the same bit line are randomized using different keys and portions of data along neighboring word lines are randomized using different keys. Keys may be rotated so that data of a particular word line is randomized according to different keys in different strings.
    Type: Grant
    Filed: January 30, 2013
    Date of Patent: August 4, 2015
    Assignee: SanDisk Technologies Inc.
    Inventors: Chris Nga Yee Avila, Yinda Dong, Lee M. Gavens
  • Publication number: 20140215126
    Abstract: In a nonvolatile memory array, such as a three-dimensional array of charge-storage memory cells, data is randomized so that data of different strings along the same bit line are randomized using different keys and portions of data along neighboring word lines are randomized using different keys. Keys may be rotated so that data of a particular word line is randomized according to different keys in different strings.
    Type: Application
    Filed: January 30, 2013
    Publication date: July 31, 2014
    Applicant: San Disk Technologies Inc.
    Inventors: Chris Nga Yee Avila, Yinda Dong, Lee M. Gavens