Patents by Inventor Ying D. Yan

Ying D. Yan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5406434
    Abstract: A thin film magnetic read/write head is manufactured using Al.sub.2 O.sub.3 dams. The Al.sub.2 O.sub.3 dams are formed using a sacrificial layer which is deposited upon a bottom pole layer. An Al.sub.2 O.sub.3 layer is deposited over the sacrificial layer. When the sacrificial layer is removed, the Al.sub.2 O.sub.3 layer forms dams between which a top pole piece is deposited. The sacrificial layer is removed using lapping and a selected chemical etch; etch of the sacrificial layer which lifts-off overlying partial lapping or chemical etch followed by chemical Al.sub.2 O.sub.3 ; depositing photoresist dams and chemically, etching the encapsulation layer and the sacrificial layer; or removal through physical or thermal shock of the Al.sub.2 O.sub.3 layer sputtered at zero bias followed by a selective chemical etch of the sacrificial layer.
    Type: Grant
    Filed: June 20, 1994
    Date of Patent: April 11, 1995
    Assignee: Seagate Technology, Inc.
    Inventors: Nurul Amin, John Bortins, Ying D. Yan, Beat G. Keel, Nathan Curland, Tim Madsen
  • Patent number: 5373624
    Abstract: A thin film magnetic read/write head deposited upon a non-magnetic substrate reduces leading edge undershoots in readback pulse signal. A magnetic layer is deposited between the thin film magnetic read/write head and the non-magnetic substrate. Undershoots are reduced by making the leading edge of the thin film head less sensitive to the magnetization transitions in a magnetic storage medium.
    Type: Grant
    Filed: October 14, 1992
    Date of Patent: December 20, 1994
    Assignee: Seagate Technology, Inc.
    Inventors: Ying D. Yan, John Bortins, Beat G. Keel, Nurul Amin
  • Patent number: 5181152
    Abstract: A thin film magnetic read/write head deposited upon a non-magnetic substrate reduces leading edge undershoots in readback pulse signal. A magnetic layer is deposited between the thin film magnetic read/write head and the non-magnetic substrate. Undershoots are reduced by making the leading edge of the thin film head less sensitive to the magnetization transitions in a magnetic storage medium.
    Type: Grant
    Filed: February 22, 1991
    Date of Patent: January 19, 1993
    Assignee: Seagate Technology Inc.
    Inventors: Ying D. Yan, John Bortins, Beat G. Keel, Nurul Amin
  • Patent number: 5137750
    Abstract: A thin film magnetic read/write head is manufactured using Al.sub.2 O.sub.3 dams. The Al.sub.2 O.sub.3 dams are formed using a sacrificial layer which is deposited upon a bottom pole layer. An Al.sub.2 O.sub.3 layer is deposited over the sacrificial layer. When the sacrificial layer is removed, the Al.sub.2 O.sub.3 layer forms dams between which a top pole piece is deposited. The sacrificial layer is removed using lapping and a selected chemical etch; partial lapping or chemical etch followed by chemical etch of the sacrificial layer which lifts-off overlying Al.sub.2 O.sub.3 ; depositing photoresist dams and chemically etching the encapsulation layer and the sacrificial layer; or removal through physical or thermal shock of the Al.sub.2 O.sub.3 layer sputtered at zero bias followed by a selective chemical etch of the sacrificial layer.
    Type: Grant
    Filed: May 20, 1991
    Date of Patent: August 11, 1992
    Assignee: Seagate Technology, Inc.
    Inventors: Nurul Amin, John Bortins, Ying D. Yan, Beat G. Keel, Nathan Curland, Tim Madsen
  • Patent number: 5084957
    Abstract: A thin film magnetic read/write head is manufactured using Al.sub.2 O.sub.3 dams. The Al.sub.2 O.sub.3 dams are formed using a sacrificial layer which is deposited upon a bottom pole layer. An Al.sub.2 O.sub.3 layer is deposited over the sacrificial layer. When the sacrificial layer is removed, the Al.sub.2 O.sub.3 layer forms dams between which a top pole piece is deposited. The sacrificial layer is removed using lapping and a selected chemical etch; partial lapping or chemical etch followed by chemical etch of the sacrificial layer which lifts-off overlying Al.sub.2 O.sub.3 ; depositing photoresist dams and chemically etching the encapsulation layer and the sacrificial layer; or removal through physical or thermal shock of the Al.sub.2 O.sub.3 layer sputtered at zero bias followed by a selective chemical etch of the sacrificial layer.
    Type: Grant
    Filed: November 6, 1990
    Date of Patent: February 4, 1992
    Assignee: Seagate Technology, Inc.
    Inventors: Nurul Amin, John Bortins, Beat G. Keel, Ying D. Yan