Patents by Inventor Ying-Hung Chuang

Ying-Hung Chuang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20190067638
    Abstract: The present invention discloses an encapsulation layer structure including a first organic layer, an inorganic thin film, and a second organic layer. The first organic layer has a bottom surface and a first wavy surface opposite to the bottom surface. The first wavy surface has a plurality of peak portions and a plurality of valley portions, and the peak portions and valley portions are alternately arranged with each other. The inorganic thin film is conformally disposed on the first wavy surface of the first organic layer, and the inorganic thin film has a second wavy surface opposite to the first wavy surface. The second organic layer is over the second wavy surface of the inorganic thin film. This encapsulation layer structure may prevent the penetration of oxygen and moisture effectively.
    Type: Application
    Filed: November 1, 2017
    Publication date: February 28, 2019
    Inventors: Ching-Yu HUANG, Ming-Hsiang LAI, Ying-Hung CHUANG, Yi-Fan NIU, Wen-Cheng CHANG
  • Publication number: 20130078556
    Abstract: A method for forming multicolor color filters is disclosed. First, a first patterned color layer is formed on a substrate. Second, a second patterned color layer and a third patterned color layer are respectively formed on the substrate with the first patterned color layer. Then the first patterned color layer, the second patterned color layer and the third patterned color layer are baked together to simultaneously transform the first patterned color layer, the second patterned color layer and the third patterned color layer to respectively become a first pixel color layer, a second pixel color layer and a third pixel color layer of the multicolor color filters, respectively.
    Type: Application
    Filed: February 28, 2012
    Publication date: March 28, 2013
    Inventors: Feng-Chin Tang, Wen-Jen Hsieh, Ying-Hung Chuang
  • Patent number: 8399162
    Abstract: The present invention discloses a method of forming exposure patterns. These steps of the present method comprise: a substrate is provided; a photoresist layer is formed over the substrate; subsequently, a photo mask with a pattern is placed and aligned to a corresponding location over the photoresist layer for at least double exposure processes, and the photo mask with a pattern is moved and aligned to another corresponding location over the photoresist layer during at least one exposure process; successively, at least one filter is provided to perform at least one exposure process, and the filter is placed above or below the photo mask; and the patterns with different dimensions are consequently formed on the substrate after partial photoresist is removed during a later developing process.
    Type: Grant
    Filed: May 7, 2010
    Date of Patent: March 19, 2013
    Assignee: Chunghwa Picture Tubes, Ltd.
    Inventors: Wen-Jen Hsieh, Ying-Hung Chuang, Feng-Chin Tang
  • Patent number: 8383303
    Abstract: A color filter includes a transparent substrate, a transparent conductive layer, a plurality of filter layers, and a plurality of bumps. The filter layers are disposed between the transparent substrate and the transparent conductive layer, and the bumps are disposed on a plane of the transparent conductive layer. A sheet resistance of each of the bumps is above 1014?/?, and an optical density (OD) of each of the bumps is above 1.5.
    Type: Grant
    Filed: February 17, 2011
    Date of Patent: February 26, 2013
    Assignee: Chunghwa Picture Tubes, Ltd.
    Inventors: Yi-Peng Kuo, Wen-Jen Hsieh, Ying-Hung Chuang
  • Publication number: 20120147492
    Abstract: A color filter includes a transparent substrate, a transparent conductive layer, a plurality of filter layers, and a plurality of bumps. The filter layers are disposed between the transparent substrate and the transparent conductive layer, and the bumps are disposed on a plane of the transparent conductive layer. A sheet resistance of each of the bumps is above 1014?/?, and an optical density (OD) of each of the bumps is above 1.5.
    Type: Application
    Filed: February 17, 2011
    Publication date: June 14, 2012
    Inventors: Yi-Peng KUO, Wen-Jen Hsieh, Ying-Hung Chuang
  • Publication number: 20110189597
    Abstract: The present invention discloses a method of forming exposure patterns. These steps of the present method comprise: a substrate is provided; a photoresist layer is formed over the substrate; subsequently, a photo mask with a pattern is placed and aligned to a corresponding location over the photoresist layer for at least double exposure processes, and the photo mask with a pattern is moved and aligned to another corresponding location over the photoresist layer during at least one exposure process; successively, at least one filter is provided to perform at least one exposure process, and the filter is placed above or below the photo mask; and the patterns with different dimensions are consequently formed on the substrate after partial photoresist is removed during a later developing process.
    Type: Application
    Filed: May 7, 2010
    Publication date: August 4, 2011
    Applicant: CHUNGHWA PICTURE TUBES, LTD.
    Inventors: Wen-Jen HSIEH, Ying-Hung Chuang, Feng-Chin Tang
  • Patent number: 5946519
    Abstract: Apparatus for use as a lighthouse in the manufacture of a color cathode ray tube (CRT) includes a housing with a cover lens. Disposed within the housing is a light source assembly including a light source in the form of a cylindrical shaped mercury lamp and an optical aperture closely spaced to the mercury lamp. The mercury lamp directs light through the optical aperture as well as through the cover lens onto the inner surface of the CRT's glass faceplate in a photo-stenciling process for registering, or aligning, phosphor dots on the faceplate's inner surface with electron beam passing apertures in the CRT's color selection electrode, or shadow mask. The optical aperture is elongated, with its longitudinal axis aligned generally transverse to the longitudinal axis of the mercury lamp, and is curvilinear having from two (2) to eight (8) inflection points along its length.
    Type: Grant
    Filed: August 18, 1997
    Date of Patent: August 31, 1999
    Assignee: Chunghwa Picture Tubes, Ltd.
    Inventors: Chih-Chien Chao, Chun-Hsiung Yen, Ying-Hung Chuang, Keh-Chung Su