Patents by Inventor Ying Hung So

Ying Hung So has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8143324
    Abstract: The use of hindered phenol containing anti-oxidants enable arylcyclobutene-based formulations to be cured in oxygen containing environments such as air without unacceptable degradation in key properties of dielectric constant, water uptake, or transmittance.
    Type: Grant
    Filed: October 12, 2005
    Date of Patent: March 27, 2012
    Assignee: Dow Global Technologies LLC
    Inventors: Ying Hung So, Edmund J. Stark, Jack E. Hetzner, Shellene K. Thurston
  • Patent number: 8143360
    Abstract: The invention is a composition comprising a curable arylcyclobutene based oligomer or polymer and a dissolution inhibitor which comprises a compound comprising at least two diazonaphthoquinone (DNQ) moieties each of which is pendant from different phenyl groups.
    Type: Grant
    Filed: October 12, 2005
    Date of Patent: March 27, 2012
    Assignee: Dow Global Technologies LLC
    Inventors: Ying Hung So, Edmund J. Stark, Shellene K. Thurston, Kayla J. Gallant (nee Baranck), Yongfu Li
  • Publication number: 20090275673
    Abstract: The use of hindered phenol containing anti-oxidants enable arylcyclobutene-based formulations to be cured in oxygen containing environments such as air without unacceptable degradation in key properties of dielectric constant, water uptake, or transmittance.
    Type: Application
    Filed: October 12, 2005
    Publication date: November 5, 2009
    Inventors: Ying Hung So, Edmund J. Stark, Jack E. Hetzner, Shellene K. Thurston
  • Publication number: 20090075205
    Abstract: The invention is a composition comprising a curable arylcyclobutene based oligomer or polymer and a dissolution inhibitor which comprises a compound comprising at least two diazonaphthoquinone (DNQ) moieties each of which is pendant from different phenyl groups.
    Type: Application
    Filed: October 12, 2005
    Publication date: March 19, 2009
    Inventors: Ying Hung So, Edmund J. Stark, Shellene K. Thurston, Kayla J. Gallant (nee Baranck), Yongfu Li
  • Patent number: 7198878
    Abstract: The invention is a photoswitchable benzocyclobutene-based polymer that while remaining aqueous developable, avoids the problem of significant moisture uptake. The oligomer or polymer comprises a polymeric backbone, benzocyclobutene reactive groups, and photoswitchable pendant groups. The pendant groups are bonded to the polymeric backbone and are characterized by the presence of a moiety that converts to carboxylic acid upon exposure to activating wavelengths of radiation a carboxylic acid. When the oligomer or polymer is subsequently heated to cause cure of the oligomer or polymer, carbon dioxide is emitted and the group forms a substantially non-polar moiety. The invention is also a method of making such a polymer and a method of forming a patterned film using such a polymer.
    Type: Grant
    Filed: June 7, 2005
    Date of Patent: April 3, 2007
    Assignee: The Dow Chemical Company
    Inventors: Ying Hung So, Scott J. Bis, Keith J. Watson
  • Patent number: 7019093
    Abstract: The invention is a photoswitchable benzocyclobutene-based polymer that while remaining aqueous developable, avoids the problem of significant moisture uptake. The oligomer or polymer comprises a polymeric backbone, benzocyclobutene reactive groups, and photoswitchable pendant groups. The pendant groups are bonded to the polymeric backbone and are characterized by the presence of a moiety that converts to carboxylic acid upon exposure to activating wavelengths of radiation a carboxylic acid. When the oligomer or polymer is subsequently heated to cause cure of the oligomer or polymer, carbon dioxide is emitted and the group forms a substantially non-polar moiety. The invention is also a method of making such a polymer and a method of forming a patterned film using such a polymer.
    Type: Grant
    Filed: October 18, 2002
    Date of Patent: March 28, 2006
    Assignee: Dow Global Technologies Inc.
    Inventors: Ying Hung So, Keith J. Watson, Scott J. Bis
  • Patent number: 6727038
    Abstract: A photodefineable mixture comprising oligomeric divinyltetramethyldisiloxane bisbenzocyclobutene as its major resin component dissolved in mesitylene and at least 2,6-bis(4-azidobenzylidene)-4-ethylcyclohexanone as a photosensitive agent in an amount sufficient to convert the mixture to an organic-insoluble solid upon exposing the mixture to photon radiation is disclosed. These polymer compositions are useful as thin film dielectrics in electronic applications such as multichip modules, integrated circuits and printed circuit boards.
    Type: Grant
    Filed: July 20, 2001
    Date of Patent: April 27, 2004
    Assignee: Dow Global Technologies Inc.
    Inventors: Ying Hung So, Cheryl L. Murlick, Daniel M. Scheck, Gregory S. Becker, Eric S. Moyer
  • Publication number: 20040076911
    Abstract: The invention is a photoswitchable benzocyclobutene-based polymer that while remaining aqueous developable, avoids the problem of significant moisture uptake. The oligomer or polymer comprises a polymeric backbone, benzocyclobutene reactive groups, and photoswitchable pendant groups. The pendant groups are bonded to the polymeric backbone and are characterized by the presence of a moiety that converts to carboxylic acid upon exposure to activating wavelengths of radiation a carboxylic acid. When the oligomer or polymer is subsequently heated to cause cure of the oligomer or polymer, carbon dioxide is emitted and the group forms a substantially non-polar moiety. The invention is also a method of making such a polymer and a method of forming a patterned film using such a polymer.
    Type: Application
    Filed: October 18, 2002
    Publication date: April 22, 2004
    Inventors: Ying Hung So, Keith J. Watson, Scott J. Bis
  • Patent number: 6670101
    Abstract: The invention is a process for building-up printed wiring boards using metal foil coated with toughened benzocyclobutene-based dielectric polymers. The invention is also a toughened dielectric polymer comprising benzocyclobutene-based monomers or oligomers, ethylenically unsaturated polymer additive, and, optionally, a photoactive compound.
    Type: Grant
    Filed: January 10, 2002
    Date of Patent: December 30, 2003
    Assignee: Dow Global Technologies Inc.
    Inventors: Kaoru Ohba, Hideki Akimoto, Philip E. Garrou, Ying-Hung So, Britton Lee Kaliszewski
  • Publication number: 20030165625
    Abstract: Applicants found that selection of reactive nanoparticles as poragens when combined with monomeric precusors to organic, particularly polyarylene or polyarylene ether, matrix materials are effective in obtaining very small pore sizes.
    Type: Application
    Filed: February 15, 2002
    Publication date: September 4, 2003
    Inventors: Ying Hung So, Q. Jason Niu, Paul H. Townsend, Steve J. Martin, Thomas H. Kalantar, James Peter Godschalx, Kennethus J. Bruza, Kevin J. Bouck
  • Publication number: 20020102495
    Abstract: The invention is a process for building-up printed wiring boards using metal foil coated with toughened benzocyclobutene-based dielectric polymers. The invention is also a toughened dielectric polymer comprising benzocyclobutene-based monomers or oligomers, ethylenically unsaturated polymer additive, and, optionally, a photoactive compound.
    Type: Application
    Filed: January 10, 2002
    Publication date: August 1, 2002
    Inventors: Kaoru Ohba, Hideki Akimoto, Brian Martin, Albert Charles Marie Achen, Philip E. Garrou, Ying-Hung So, Britton Lee Kaliszewski
  • Publication number: 20020102494
    Abstract: The invention is a process for building-up printed wiring boards using metal foil coated with toughened benzocyclobutene-based dielectric polymers. The invention is also a toughened dielectric polymer comprising benzocyclobutene-based monomers or oligomers, ethylenically unsaturated polymer additive, and, optionally, a photoactive compound.
    Type: Application
    Filed: January 10, 2002
    Publication date: August 1, 2002
    Inventors: Kaoru Ohba, Hideki Akimoto, Brian Martin, Albert Charles Marie Achen, Philip E. Garrou, Ying-Hung So, Britton Lee Kaliszewski
  • Patent number: 6420093
    Abstract: The invention is a process for building-up printed wiring boards using metal foil coated with toughened benzocyclobutene-based dielectric polymers. The invention is also a toughened dielectric polymer comprising benzocyclobutene-based monomers or oligomers, ethylenically unsaturated polymer additive, and, optionally, a photoactive compound.
    Type: Grant
    Filed: February 2, 2000
    Date of Patent: July 16, 2002
    Assignee: The Dow Chemical Company
    Inventors: Kaoru Ohba, Brian Martin, Hideki Akimoto, Albert Charles Marie Achen, Philip E. Garrou, Britton Lee Kaliszewski, Ying-Hung So
  • Patent number: 5965679
    Abstract: An oligomer, uncured polymer or cured polymer comprising the reaction product of one or more polyfunctional compounds containing two or more cyclopentadienone groups and at least one polyfunctional compound containing two or more aromatic acetylene groups wherein at least some of the polyfunctional compounds contain three or more reactive groups. Such oligomers and uncured polymers may be cured to form cured polymers which are useful as dielectrics in the microelectronics industry, especially for dielectrics in integrated circuits.
    Type: Grant
    Filed: April 1, 1997
    Date of Patent: October 12, 1999
    Assignee: The Dow Chemical Company
    Inventors: James P. Godschalx, Duane R. Romer, Ying Hung So, Zenon Lysenko, Michael E. Mills, Gary R. Buske, Paul H. Townsend, III, Dennis W. Smith, Jr., Steven J. Martin, Robert A. DeVries
  • Patent number: 4570011
    Abstract: The invention is a process for the preparation of an aromatic hydrocarbon with a cyclobutene ring fused to the aromatic hydrocarbon which comprises, dissolving an ortho alkyl halomethyl aromatic hydrocarbon in an inert solvent and pyrolyzing the solution of ortho alkyl halomethyl aromatic hydrocarbon in the inert solvent under conditions such that the ortho alkyl and halomethyl substituents form a cyclobutene ring thereby forming an aromatic hydrocarbon having a fused cyclobutene ring.
    Type: Grant
    Filed: May 21, 1984
    Date of Patent: February 11, 1986
    Assignee: The Dow Chemical Company
    Inventor: Ying-Hung So
  • Patent number: 4495036
    Abstract: Electrolytically prepare para-chloroalkyl aromatic compounds, such as para-chlorotoluene, using a potential of less than 1.5 volts, as measured against a Ag/Ag.sup.+ reference electrode, and an anode which is free of cyclodextrin.
    Type: Grant
    Filed: July 11, 1983
    Date of Patent: January 22, 1985
    Assignee: The Dow Chemical Company
    Inventor: Ying-Hung So