Patents by Inventor Ying-Long Wang

Ying-Long Wang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for removing residual fluorine in HDP-CVD chamber
    Patent number: 6602560
    Abstract: A method of removing residual fluorine present in a HDP-CVD chamber which includes a high pressure seasoning process, a dry-cleaning process, and a low-pressure deposition process.
    Type: Grant
    Filed: July 16, 2002
    Date of Patent: August 5, 2003
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd
    Inventors: Yi-Lung Cheng, Wen-Kung Cheng, Ming-Hwa Yoo, Szu-An Wu, Ying-Long Wang, Pei-Fen Chou