Patents by Inventor Ying Mei

Ying Mei has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20150035490
    Abstract: A battery system has a battery module including a number M of series-connected batteries. The battery system is further provided with a number N (1<N?M) of charge equalizers, each of which once connected to a battery, causes the battery to be charged and/or discharged to achieve charge equalization. A control device is configured to determine for each battery if it requires charge equalization based on a state of charge (SOC) of the battery, compare a number L of the batteries that require charge equalization and the number M, and based on the comparison result, cause the battery system to be shut down, or the one or more batteries that require charge equalization to be connected to corresponding charge equalizers. A selective switch module is used for connecting the one or more batteries that require charge equalization to corresponding charge equalizers, respectively.
    Type: Application
    Filed: July 2, 2014
    Publication date: February 5, 2015
    Inventors: Saijun MAO, Huiqing WU, Herman Lucas Norbert WIEGMAN, Qunjian HUANG, Ying MEI
  • Publication number: 20120164918
    Abstract: A method of performing chemical mechanical polish (CMP) processes on a wafer includes providing the wafer; determining a thickness profile of a feature on a surface of the wafer; and, after the step of determining the thickness profile, performing a high-rate CMP process on the feature using a polish recipe to substantially achieve a within-wafer thickness uniformity of the feature. The polish recipe is determined based on the thickness profile.
    Type: Application
    Filed: March 5, 2012
    Publication date: June 28, 2012
    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Shen-Nan Lee, Ying-Mei Lin, Yu-Jen Cheng, Keung Hui, Huan-Just Lin
  • Patent number: 8129279
    Abstract: A method of performing chemical mechanical polish (CMP) processes on a wafer includes providing the wafer; determining a thickness profile of a feature on a surface of the wafer; and, after the step of determining the thickness profile, performing a high-rate CMP process on the feature using a polish recipe to substantially achieve a within-wafer thickness uniformity of the feature. The polish recipe is determined based on the thickness profile.
    Type: Grant
    Filed: October 13, 2008
    Date of Patent: March 6, 2012
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Shen-Nan Lee, Ying-Mei Lin, Yu-Jen Cheng, Keung Hui, Huan-Just Lin
  • Publication number: 20100304485
    Abstract: The present invention provides systems for cell separation based on cell rolling on surfaces along edges of regions coated with cell adhesion molecules. A variety of designs of coated regions and edges are disclosed.
    Type: Application
    Filed: September 29, 2008
    Publication date: December 2, 2010
    Applicant: MASSACHUSETTS INSTITUTE OF TECHNOLOGY
    Inventors: Rohit Nandkumar KARNIK, Seungpyo HONG, Ying MEI, Daniel Griffith ANDERSON, Jeffrey Michael KARP, Robert S. LANGER, Suman BOSE
  • Publication number: 20100273259
    Abstract: The present disclosure provides a device and a cell culture system comprising a substrate that generates significant chemical ion signatures adapted for culturing stem cells. This disclosure further provides unique surface properties, such as surface wettability, along with defined polymer microspot environments in an array, for effectively supporting the propagation and differentiation of human pluripotent stem cells in vitro. Methods of culturing, maintenance, differentiating stem cells as well as reprogramming somatic cells into stem cells using the device and the cell culture system with the suitable substrates, along with suitable culture media, are also provided.
    Type: Application
    Filed: April 22, 2010
    Publication date: October 28, 2010
    Applicant: MASSACHUSETTS INSTITUTE OF TECHNOLOGY
    Inventors: Krishanu Saha, Ying Mei, Said R. Bogatyrev, Daniel G. Anderson, Rudolf Jaenisch, Robert S. Langer, Morgan Alexander, Martyn Davies, Jing Yang, Christian J. Kastrup, Andrew Urquhart
  • Publication number: 20100093259
    Abstract: A method of performing chemical mechanical polish (CMP) processes on a wafer includes providing the wafer; determining a thickness profile of a feature on a surface of the wafer; and, after the step of determining the thickness profile, performing a high-rate CMP process on the feature using a polish recipe to substantially achieve a within-wafer thickness uniformity of the feature. The polish recipe is determined based on the thickness profile.
    Type: Application
    Filed: October 13, 2008
    Publication date: April 15, 2010
    Inventors: Shen-Nan Lee, Ying-Mei Lin, Yu-Jen Cheng, Keung Hui, Huan-Just Lin
  • Publication number: 20050269385
    Abstract: This invention forms an indium or indium alloy layer on top of a Sn based lead-free solder. The indium or indium alloy layer can be formed by various methods, such as plating, deposition, printing, dipping, etc. The indium-containing layer melts during the soldering process, wets the substrate, and forms a sound solder joint. Since the melting point of indium is 156.6° C., even lower than that of the eutectic Sn—Pb which is at 183° C., so the soldering process can be carried out at a temperature lower than the conventional soldering process. During the soldering process, the indium reacts with the Sn based Pb-free solder alloy. Since the eutectic temperature of Sn—In is at 120° C., during the short time of the soldering process, the surface of the In deposited Pb-free solder remains as the liquid phase and have a good wetting with the substrate, while a In gradient is formed in the In deposited Pb-free solder.
    Type: Application
    Filed: June 3, 2004
    Publication date: December 8, 2005
    Applicant: National Tsing Hua University
    Inventors: Sinn-Wen Chen, Shih-Kang Lin, Ching-Feng Yang, Yu-Chih Huang, Ting-Ying Chung, Ying-Mei Tsai, An-Ren Zi
  • Patent number: 5946463
    Abstract: A method and system for automatically performing one or more operations on multiple computer systems within a cluster are disclosed. In accordance with the present invention, a begin operations command construct is defined within an input file. In addition, an input command indicating one or more operations to be performed on at least two computer systems within the cluster and an end operations command construct are defined. In response to a selected input, one or more operations indicated by the input command are automatically performed on at least two computer systems. In accordance with one embodiment, the begin operations command construct indicates selected computer systems within the cluster on which the one or more operations are to be performed and whether the operations are to be performed on the selected computer systems serially or in parallel.
    Type: Grant
    Filed: July 22, 1996
    Date of Patent: August 31, 1999
    Assignee: International Business Machines Corporation
    Inventors: Alexander Duncan Carr, Jeffrey Michael Dangel, Michael Nelson Galassi, Kevin Forress Rodgers, Emy Ying-Mei Tseng, Thomas Van Weaver
  • Patent number: D644414
    Type: Grant
    Filed: May 25, 2010
    Date of Patent: September 6, 2011
    Inventors: Philip Kurpakus, Jr., Ying Mei Kurpakus