Patents by Inventor Ying MIN
Ying MIN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20250228994Abstract: A fragrance lanyard includes a string, a pair of length adjusters, a clasp, a fragrance container, and an aromatic element. The string has an overlapping part, and a hanging ring is formed in a non-overlapping area, each end of the string is wrapped with a string cap, each length adjuster is provided with two lanyard holes such that the cross-section of the length adjuster is designed in an 8-shape for the string to sequentially pass through the pair of length adjusters to adjust the length of the string, the clasp is arranged at the position of the hanging ring, the fragrance container is fixed to any one of the string cap, the length adjuster, or the clasp, and the fragrance container has a containing space provided for installing the aromatic element.Type: ApplicationFiled: August 30, 2024Publication date: July 17, 2025Inventors: CHUNG-YING CHANG, HUNG-YI LIN, YING-MIN WANG
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Publication number: 20250217675Abstract: A processor-implemented method including, based on a first shape of a first tensor and a second shape of a second tensor used in an operation with the first tensor, determining a broadcasting type related to an extension of the first shape and the second shape, determining respective first shape offsets for each dimension of the first shape and respective second shape offsets for each dimension of the second shape based on the broadcasting type, determining respective first tensor offsets for each dimension of the first tensor and respective second tensor offsets for each dimension of the second tensor based on the broadcasting type, the respective first shape offsets for each dimension of the first shape, and the respective second shape offsets for each dimension of the second shape, determining a first offset of a first element included in the first tensor and a second offset of a second element included in the second tensor based on the respective first tensor offsets and the respective second tensor offseType: ApplicationFiled: December 16, 2024Publication date: July 3, 2025Applicant: SAMSUNG ELECTRONICS CO., LTD.Inventors: Zhenxin YANG, Fei CHEN, Sung-Jae CHO, Yanpeng WANG, Byung In YOO, Changyong SON, Jonghoon YOON, Yunhao ZHANG, Ying MIN
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Patent number: 12333850Abstract: The present disclosure relates to a fingerprint identification method, device, an electronic apparatus and a storage medium. The fingerprint identification method includes: capturing a fingerprint by a fingerprint sensor, identifying matching pairs of minutiae between the captured fingerprint and a reference fingerprint; calculating a first matching result based on the minutia matching pairs; identifying minutia surrounding features for each minutia of the captured fingerprint in the minutia matching pairs; determining, for each minutia in the minutia matching pairs, whether the minutia surrounding features of the captured fingerprint match with minutia surrounding features of the reference fingerprint; calculating a second matching result based on the determination; and generating an identification result based on the first matching result and the second matching result.Type: GrantFiled: June 20, 2022Date of Patent: June 17, 2025Assignee: SAMSUNG ELECTRONICS CO., LTD.Inventors: Ying Min, Feng Zhu, Hanhui Li, Huaiwen Bai, Yunhao Zhang, Xiaochun Yan, Chunmiao Jiang, Wenyan Zheng, Yanjun Chen, Jiangbo Chen, Zhijie Lv
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Publication number: 20250078286Abstract: An apparatus and method for quantizing a transformer-based target tracking model are provided. The method includes obtaining a transformer-based target tracking model including a template branch, a search branch, a stitching module, and a first transformer module, generating an optimized target tracking model by removing the stitching module from the transformer-based target tracking model and dividing the first transformer module into a second transformer module and a third transformer module, and generating a quantization model corresponding to the optimized target tracking model by quantizing the divided second transformer module independently of quantizing the divided third transformer module.Type: ApplicationFiled: August 13, 2024Publication date: March 6, 2025Applicant: SAMSUNG ELECTRONICS CO., LTD.Inventors: Zao YAO, Ju Hwan SONG, Ying MIN, Byung In YOO, Changbeom PARK, YunHao ZHANG, Junchen REN, Yuanzhang YAO, Sanqi LI
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Patent number: 12169542Abstract: Various example embodiments are directed to a fingerprint authentication method and a fingerprint authentication device. The fingerprint authentication method includes acquiring target fingerprint data of a user using at least one fingerprint sensor, determining a preliminary authentication result of the target fingerprint data based on at least one historical fingerprint data stored in memory, performing a matching check on the preliminary authentication result, and determining a final authentication result of the target fingerprint data based on results of the matching check.Type: GrantFiled: February 2, 2022Date of Patent: December 17, 2024Assignee: Samsung Electronics Co., Ltd.Inventors: Ying Min, Huaiwen Bai, Yanjun Chen, Xiaochun Yan, Wenyan Zheng
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Publication number: 20240320454Abstract: A processor-implemented method with visual code processing includes generating a first image by capturing a first visual code, using an always on (AO) sensor module of an electronic device, detecting a first code image included in the first image and corresponding to the first visual code, using the AO sensor module, performing a first type decoding on the first code image, using the AO sensor module, waking up an application processor (AP) of the electronic device from a low-power state, based on a first decoding result of the first type decoding, and executing a first application of the electronic device corresponding to the first visual code, using the AP.Type: ApplicationFiled: March 22, 2024Publication date: September 26, 2024Applicant: Samsung Electronics Co., Ltd.Inventors: YunHao ZHANG, Ronghua KANG, Seungin PARK, Byung In YOO, Ying MIN, Zhijie LV
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Publication number: 20230360429Abstract: The present disclosure relates to a fingerprint identification method, device, an electronic apparatus and a storage medium. The fingerprint identification method includes: capturing a fingerprint by a fingerprint sensor, identifying matching pairs of minutiae between the captured fingerprint and a reference fingerprint; calculating a first matching result based on the minutia matching pairs; identifying minutia surrounding features for each minutia of the captured fingerprint in the minutia matching pairs; determining, for each minutia in the minutia matching pairs, whether the minutia surrounding features of the captured fingerprint match with minutia surrounding features of the reference fingerprint; calculating a second matching result based on the determination; and generating an identification result based on the first matching result and the second matching result.Type: ApplicationFiled: June 20, 2022Publication date: November 9, 2023Inventors: Ying MIN, Feng ZHU, Hanhui LI, Huaiwen BAI, Yunhao ZHANG, Xiaochun YAN, Chunmiao JIANG, Wenyan ZHENG, Yanjun CHEN, Jiangbo CHEN, Zhijie LV
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Patent number: 11513438Abstract: A process for plasmonic-based high resolution color printing is provided. The process includes a) providing a nanostructured substrate surface having a reverse structure geometry comprised of nanopits and nanoposts on a support, and b) forming a conformal continuous metal coating over the nanostructured substrate surface to generate a continuous metal film, the continuous metal film defining nanostructures for the plasmonic-based high resolution color printing, wherein a periodicity of the nanostructures is equal to or less than a diffraction limit of visible light. A nanostructured metal film or metal-film coated support obtained by the process and a method for generating a color image are also provided.Type: GrantFiled: October 1, 2020Date of Patent: November 29, 2022Assignee: AGENCY FOR SCIENCE, TECHNOLOGY AND RESEARCHInventors: Joel Kwang Wei Yang, Xiao Ming Goh, Di Zhu, Shawn Tan, Ying Min Wang, Zhaogang Dong
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Publication number: 20220253515Abstract: Various example embodiments are directed to a fingerprint authentication method and a fingerprint authentication device. The fingerprint authentication method includes acquiring target fingerprint data of a user using at least one fingerprint sensor, determining a preliminary authentication result of the target fingerprint data based on at least one historical fingerprint data stored in memory, performing a matching check on the preliminary authentication result, and determining a final authentication result of the target fingerprint data based on results of the matching check.Type: ApplicationFiled: February 2, 2022Publication date: August 11, 2022Applicant: Samsung Electronics Co., Ltd.Inventors: Ying MIN, Huaiwen BAI, Yanjun CHEN, Xiaochun YAN, Wenyan ZHENG
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Publication number: 20210315796Abstract: The biphasic topical compositions of various embodiments comprise a Phase A including castor oil and one or more additional non-polar solvents, and a Phase B including ethanol and one or more additional polar solvents, wherein the ratio of castor oil to ethanol is about 1:1 to about 3:1; and wherein the biphasic topical composition is free of surfactants and emulsifiers. The methods include treating uneven skin tone, treating acne, lightening or brightening the skin, protecting a subject's skin from sun damage, protecting a subject's skin and scalp from the effects of aging, improving the look of the skin, improving the appearance of the skin, treating fibrotic skin conditions, treating the hair, and improving the appearance of the hair.Type: ApplicationFiled: April 6, 2021Publication date: October 14, 2021Inventors: Christine Marie CRANE, Olga DUEVA-KOGANOV, Taylor OSWALD, Ying Min WU
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Publication number: 20210018834Abstract: A process for plasmonic-based high resolution color printing is provided. The process includes a) providing a nanostructured substrate surface having a reverse structure geometry comprised of nanopits and nanoposts on a support, and b) forming a conformal continuous metal coating over the nanostructured substrate surface to generate a continuous metal film, the continuous metal film defining nanostructures for the plasmonic-based high resolution color printing, wherein a periodicity of the nanostructures is equal to or less than a diffraction limit of visible light. A nanostructured metal film or metal-film coated support obtained by the process and a method for generating a color image are also provided.Type: ApplicationFiled: October 1, 2020Publication date: January 21, 2021Inventors: Joel Kwang Wei YANG, Xiao Ming GOH, Di ZHU, Shawn TAN, Ying Min WANG, Zhaogang DONG
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Patent number: 10831097Abstract: A process for plasmonic-based high resolution color printing is provided. The process includes a) providing a nanostructured substrate surface having a reverse structure geometry comprised of nanopits and nanoposts on a support, and b) forming a conformal continuous metal coating over the nanostructured substrate surface to generate a continuous metal film, the continuous metal film defining nanostructures for the plasmonic-based high resolution color printing, wherein a periodicity of the nanostructures is equal to or less than a diffraction limit of visible light. A nanostructured metal film or metal-film coated support obtained by the process and a method for generating a color image are also provided.Type: GrantFiled: April 14, 2015Date of Patent: November 10, 2020Assignee: AGENCY FOR SCIENCE, TECHNOLOGY AND RESEARCHInventors: Joel Kwang Wei Yang, Xiao Ming Goh, Di Zhu, Shawn Tan, Ying Min Wang, Zhaogang Dong
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Patent number: 10292589Abstract: A method, apparatus, and article of manufacture for irradiating one or more targets within a sample with electromagnetic (EM) radiation. One or more targets within the sample are controllably defined with an acoustic field. The sample is irradiated with input EM radiation having an input wavefront. An amount of frequency shifted EM radiation is detected, wherein at least some of the input EM radiation that passes through the acoustic field at the targets is shifted in frequency to form the frequency shifted EM radiation. The input wavefront is modified, using feedback comprising the amount of the frequency shifted EM radiation that is detected, into a modified wavefront. The sample is irradiated using the input EM radiation comprising the modified wavefront, and the process is repeated as desired.Type: GrantFiled: September 20, 2011Date of Patent: May 21, 2019Assignee: CALIFORNIA INSTITUTE OF TECHNOLOGYInventors: Ying Min Wang, Changhuei Yang
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Patent number: 10134896Abstract: A semiconductor substructure with an improved source/drain structure is described. The semiconductor substructure can include an upper surface; a gate structure formed over the substrate; a spacer formed along a sidewall of the gate structure; and a source/drain structure disposed adjacent the gate structure. The source/drain structure is disposed over or on a recess surface of a recess that extends below said upper surface. The source/drain structure includes a first epitaxial layer, having a first composition, over or on the interface surface, and a subsequent epitaxial layer, having a subsequent composition, over or on the first epitaxial layer. A dopant concentration of the subsequent composition is greater than a dopant concentration of the first composition, and a carbon concentration of the first composition ranges from 0 to 1.4 at.-%. Methods of making semiconductor substructures including improved source/drain structures are also described.Type: GrantFiled: March 1, 2013Date of Patent: November 20, 2018Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Chun Hsiung Tsai, Sheng-Wen Yu, Ying-Min Chou, Yi-Fang Pai
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Patent number: 9909203Abstract: A method for fabrication of metal film with nanoapertures is provided. The method includes the steps of providing a nanopatterned template including a plurality of nanostructures, depositing of the metal film onto the nanopatterned template, and thermally induced dewetting of the metal film to define the nanoapertures in the metal film by diffusion and reflow of the metal film.Type: GrantFiled: October 2, 2015Date of Patent: March 6, 2018Assignee: Agency for Science, Technology and ResearchInventors: Joel Kwang Wei Yang, Ying Min Wang, Mohamed Asbahi, Yong-Wei Zhang, Liangxing Lu, Bharathi Madurai Srinivasan
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Patent number: 9735271Abstract: A semiconductor device includes an isolation feature in a substrate. The semiconductor device further includes a first source/drain feature in the substrate, wherein a first side of the first source/drain feature contacts the isolation feature, and the first source/drain feature exposes a portion of the isolation feature below a top surface of the substrate. The semiconductor device further includes a silicide layer over the first source/drain feature. The semiconductor device further includes a dielectric layer along the exposed portion of the isolation feature below the top surface of the substrate, wherein the dielectric layer contacts the silicide layer. The semiconductor device further includes a second source/drain feature in the substrate on an opposite side of a gate stack from the first source/drain feature, wherein the second source/drain feature has a substantially uniform thickness.Type: GrantFiled: March 2, 2016Date of Patent: August 15, 2017Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Wen Chu Hsiao, Lai Wan Chong, Chun-Chieh Wang, Ying Min Chou, Hsiang Hsiang Ko, Ying-Lang Wang
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Publication number: 20170192351Abstract: A process for plasmonic-based high resolution color printing is provided. The process includes a) providing a nanostructured substrate surface having a reverse structure geometry comprised of nanopits and nanoposts on a support, and b) forming a conformal continuous metal coating over the nanostructured substrate surface to generate a continuous metal film, the continuous metal film defining nanostructures for the plasmonic-based high resolution color printing, wherein a periodicity of the nanostructures is equal to or less than a diffraction limit of visible light. A nanostructured metal film or metal-film coated support obtained by the process and a method for generating a color image are also provided.Type: ApplicationFiled: April 14, 2015Publication date: July 6, 2017Inventors: Joel Kwang Wei YANG, Xiao Ming GOH, Di ZHU, Shawn TAN, Ying Min WANG, Zhaogang DONG
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Surface tension modification using silane with hydrophobic functional group for thin film deposition
Patent number: 9698263Abstract: A semiconductor structure that includes crystalline surfaces and amorphous hydrophilic surfaces is provided. The hydrophilic surfaces are treated with silane that includes a hydrophobic functional group, converting the hydrophilic surfaces to hydrophobic surfaces. Chemical vapor deposition or other suitable deposition methods are used to simultaneously deposit a material on both surfaces and due to the surface treatment, the deposited material exhibits superior adherence qualities on both surfaces. In one embodiment, the structure is an opening formed in a semiconductor substrate and bounded by at least one portion of a crystalline silicon surface and at least one portion of an amorphous silicon oxide structure.Type: GrantFiled: November 19, 2015Date of Patent: July 4, 2017Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Lai-Wan Chong, Wen-Chu Hsiao, Ying-Min Chou, Hsiang-Hsiang Ko -
Patent number: 9634119Abstract: A method includes providing a gate structure over a semiconductor substrate and forming a source/drain region associated with the gate structure by etching an opening in the semiconductor substrate, performing a first epitaxial growth process while an entirety of a sidewall of the opening is exposed to grow a first epitaxy material in the opening. The first epitaxial growth process is free of a first dopant impurity. A second epitaxial growth process is performed after first epitaxial growth process to grow a second epitaxy material on the first epitaxy material. The second epitaxy material has the first dopant impurity at a first concentration. Further, a third epitaxial growth process is performed after the second epitaxial growth process that includes introducing the first dopant impurity at a second concentration, the second concentration greater than the first concentration.Type: GrantFiled: June 19, 2015Date of Patent: April 25, 2017Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Wen Chu Hsiao, Ju Wen Hsiao, Ying Min Chou, Hsiang Hsiang Ko, Ying-Lang Wang
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Patent number: 9569664Abstract: Methods of rapid distinction between growing cells and debris, which determine a time-lapse movie of specimen images, track features of each entity, and categorize each entity as growing cells or debris.Type: GrantFiled: November 5, 2013Date of Patent: February 14, 2017Assignee: California Institute of TechnologyInventors: Benjamin Judkewitz, Guoan Zheng, Samuel Yang, Seung Ah Lee, Shuo Pang, Changhuei Yang, Ying Min Wang