Abstract: A solar cell structure includes a semiconductor substrate having a front side and a back side. A pyramid structure is disposed on the front side of the semiconductor substrate. The pyramid structure has an aspect ratio between 0.5-1.2. A front passivation layer is disposed on the pyramid structure. A first anti-reflection layer is disposed on the pyramid structure. The first anti-reflection layer is a multi-layered, graded anti-reflection layer having at least three coating layers. The at least three coating layers comprise a silicon oxynitride layer having a thickness of 15-30 nm and a refractive index between 1.65 and 1.75. The silicon oxynitride layer is an outermost layer of the multi-layered, graded anti-reflection layer.

Abstract: A solar cell structure includes a semiconductor substrate having a front side and a back side; a pyramid structure disposed on the front side of the semiconductor substrate; a front passivation layer disposed on the pyramid structure; and a first anti-reflection layer disposed on the pyramid structure. The first reflective layer is a multi-layered anti-reflection layer having at least three coating layers. A front electrode is provided on the first anti-reflection layer. A rear passivation layer is provided on the back side of the semiconductor substrate. A second anti-reflection layer is disposed on the rear passivation layer. A back electrode is disposed on the second anti-reflection layer.

Abstract: A solar cell structure includes a semiconductor substrate having a front side and a back side; a pyramid structure disposed on the front side of the semiconductor substrate; a anti-reflection layer disposed on the pyramid structure; a front electrode provided on the anti-reflection layer; a passivation layer provided on the back side of the semiconductor substrate; a dielectric layer disposed on the passivation layer; and a back electrode disposed on the dielectric layer. The reflective layer is a multi-layer anti-reflection layer having at least three coating layers.

Abstract: A surface processing method for a high hardness and abrasion resistant zinc alloy surface of imitation plating hexavalent chromium, includes following steps. Perform polishing for surface of zinc alloy workpiece, and leave it to dry; place the dried up workpiece into Hydrofluoric Acid solution to raise adhesion; wash the activated workpiece clean with pure water, and then place it in a silane oxide solution, to process it into silane conversion film; place the workpiece into an electrophoresis solution to perform electrophoresis, to achieve an electrophoresis application layer; use an UF solution to wash the workpiece; perform pre-drying for the workpiece; perform UV curing for the workpiece; hang the workpiece in a PVD furnace, perform sputtering of chromium, to form a metal-ceramic composite film; and perform PVD on surface of the workpiece, to deposit a layer of transparent DLC film on the workpiece.

Abstract: Disclosed is a spray layer capable of germ eradication, finger prints prevention, and good touch feeling, comprising ingredients of following weight percentage (wt %): polyurethanes resin 20 wt %˜40 wt %, isocyanate curing agent 3 wt %˜10 wt %, touch feeling agent 6 wt %˜15 wt %, dissipation agent 1 wt %˜2 wt %, drier activation agent 0.1 wt %˜1 wt %, leveling agent 0.5 wt %˜2 wt %, diluting agent 10 wt %˜40 wt %, graffiti barrier agent 5 wt %˜15 wt %, germicide A 0.5 wt %˜1.5 wt %,germicide B 0.2 wt %˜1 wt %. Also disclosed are a method of spraying the spray layer, and an application of the spray layer.

Abstract: A surface processing method for a high hardness and abrasion resistant zinc alloy surface of imitation plating hexavalent chromium, includes following steps. Perform polishing for surface of zinc alloy workpiece, and leave it to dry; place the dried up workpiece into Hydrofluoric Acid solution to raise adhesion; wash the activated workpiece clean with pure water, and then place it in a silane oxide solution, to process it into silane conversion film; place the workpiece into an electrophoresis solution to perform electrophoresis, to achieve an electrophoresis application layer; use an UF solution to wash the workpiece; perform pre-drying for the workpiece; perform UV curing for the workpiece ; hang the workpiece in a PVD furnace, perform sputtering of chromium, to form a metal-ceramic composite film; and perform PVD on surface of the workpiece, to deposit a layer of transparent DLC film on the workpiece.