Patents by Inventor Ying Y. Cheng

Ying Y. Cheng has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 4398001
    Abstract: A resist sensitive to electron beam (and X-ray) radiation but resistant to reactive ion etching is formulated from a novolac resin and a sensitizer which is a terpolymer of sulfur dioxide, an olefin is hydrocarbon and an unsaturated ether.
    Type: Grant
    Filed: March 22, 1982
    Date of Patent: August 9, 1983
    Assignee: International Business Machines Corporation
    Inventors: Ying Y. Cheng, Barbara D. Grant, Lester A. Pederson, Carlton G. Willson
  • Patent number: RE34524
    Abstract: A composition for the application of a planar polymide coating having a glass transition temperature above 300.degree. C. comprises a solution in an anhydrous, aprotic solvent of .Iadd.the reaction product .Iaddend.of an aromatic diamine and a .[.dialkyldihydrogen.]. .Iadd.dialkyl .Iaddend.pyromellitate .Iadd.diacyl chloride .Iaddend.which .[.is more than.]. .Iadd.comprises about .Iaddend.90% .Iadd.or more .Iaddend.meta isomer.
    Type: Grant
    Filed: July 18, 1991
    Date of Patent: January 25, 1994
    Assignee: International Business Machines Corporation
    Inventors: Richard D. Diller, deceased, Anthony F. Arnold, Ying Y. Cheng, Patricia M. Cotts, Donald C. Hofer, Mahmoud M. Khojasteh, Elwood H. Macy, Prabodh R. Shah, Willi Volksen