Abstract: A method for operating a chemical deposition chamber is disclosed. First, a digital liquid flow controller is provided to guide a precursor fluid into a chemical deposition chamber. Then, a pre-cleaning step is performed in the chemical deposition chamber. Later, a pre-tuning step is performed on the digital liquid flow controller so that the precursor fluid can be substantially stably guided into the chemical deposition chamber. Afterwards, the chemical deposition chamber is used to carry out the chemical deposition.

Abstract: A pump ring. The pump ring is suitable for a reaction chamber and capable for extracting gas from the reaction chamber in a uniform gas flow rate. The pump ring comprises a ring body and a top ring part located on the ring body. The top ring part is apart from an inner wall of the reaction chamber with a fixed distance. Therefore, a gas-extraction path composed of the reaction chamber, the ring body and the top ring part is unobstructed. Hence, the turbulence flow of the extracted gas can be efficiently suppressed and the problems of the accumulation of the impurities and reaction chamber contamination can be solved.

Abstract: A method for operating a chemical deposition chamber is disclosed. First, a digital liquid flow controller is provided to guide a precursor fluid into a chemical deposition chamber. Then, a pre-cleaning step is performed in the chemical deposition chamber. Later, a pre-tuning step is performed on the digital liquid flow controller so that the precursor fluid can be substantially stably guided into the chemical deposition chamber. Afterwards, the chemical deposition chamber is used to carry out the chemical deposition.

Abstract: A throttle valve connects with a chamber for adjusting air pressure in the chamber. The throttle valve has a housing having a channel in it, a piston ring positioned at an end of the channel, a stopper positioned in the channel, and a driver for rotating the stopper. The piston ring has a plane surface contacting with the housing, a first cambered surface contacting with the housing and vertically connecting with the plane surface, and a second cambered surface connecting with the first cambered surface. The second cambered surface of the piston ring contacts with a third cambered surface of the stopper.

Abstract: A pump ring. The pump ring is suitable for a reaction chamber and capable for extracting gas from the reaction chamber in a uniform gas flow rate. The pump ring comprises a ring body and a top ring part located on the ring body. The top ring part is apart from an inner wall of the reaction chamber with a fixed distance. Therefore, a gas-extraction path composed of the reaction chamber, the ring body and the top ring part is unobstructed. Hence, the turbulence flow of the extracted gas can be efficiently suppressed and the problems of the accumulation of the impurities and reaction chamber contamination can be solved.

Abstract: A lift pin mechanism is applied to a process chamber for carrying a substrate and moving the substrate upward or downward. The mechanism includes a plurality of lift pins positioned in a plurality of through holes of a pedestal and a lift ring positioned below the lift pins. The lift pins are fixed on the lift ring perpendicularly and are smaller than the through holes so that the lift pins can move upward or downward in the through holes.

Abstract: A throttle valve connects with a chamber for adjusting air pressure in the chamber. The throttle valve has a housing having a channel in it, a piston ring positioned at an end of the channel, a stopper positioned in the channel, and a driver for rotating the stopper. The piston ring has a plane surface contacting with the housing, a first cambered surface contacting with the housing and vertically connecting with the plane surface, and a second cambered surface connecting with the first cambered surface. The second cambered surface of the piston ring contacts with a third cambered surface of the stopper.