Patents by Inventor Ying Ying Luo

Ying Ying Luo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Determining transmittance of a photomask using optical metrology
    Patent number: 7639375
    Abstract: Transmittance of a photomask is determined using optical metrology. In particular, reflectance of a portion of the photomask is determined by directing an incident beam of light at the portion of the photomask. The reflectance is determined by measuring light diffracted from the portion of the photomask. One or more geometric features of the portion of the photomask are determined using the measured light diffracted from the portion of the photomask. A wave coupling is determined using the determined one or more geometric features of the portion of the photomask. The transmittance of the photomask is determined using the determined wave coupling and the determined reflectance of the portion of the photomask.
    Type: Grant
    Filed: December 14, 2006
    Date of Patent: December 29, 2009
    Assignee: Tokyo Electron Limited
    Inventors: Sanjay Yedur, Shifang Li, Youxian Wen, Wei Liu, Hanyou Chu, Ying Ying Luo
  • Determining transmittance of a photomask using optical metrology
    Publication number: 20080144919
    Abstract: Transmittance of a photomask is determined using optical metrology. In particular, reflectance of a portion of the photomask is determined by directing an incident beam of light at the portion of the photomask. The reflectance is determined by measuring light diffracted from the portion of the photomask. One or more geometric features of the portion of the photomask are determined using the measured light diffracted from the portion of the photomask. A wave coupling is determined using the determined one or more geometric features of the portion of the photomask. The transmittance of the photomask is determined using the determined wave coupling and the determined reflectance of the portion of the photomask.
    Type: Application
    Filed: December 14, 2006
    Publication date: June 19, 2008
    Applicant: Tokyo Electron Limited
    Inventors: Sanjay Yedur, Shifang Li, Youxian Wen, Wei Liu, Hanyou Chu, Ying Ying Luo