Abstract: This invention provides a light-concentrating structure with photosensitivity enhancing effect, including the substrate, buried layer, first electrode layer, second electrode layer, dielectric layer and interconnection structure. The substrate is equipped with a housing space; the buried layer is arranged above the substrate with the housing space; the first electrode layer is arranged above the buried layer; the second electrode layer is arranged in the middle of the first electrode layer; the dielectric layer is arranged above the second electrode layer; the interconnection structure is arranged above the substrate and the first electrode layer surrounding the dielectric layer, which forms an opening and a light-concentrating recess groove.

Abstract: This invention provides a light-concentrating structure with photosensitivity enhancing effect, including the substrate, buried layer, first electrode layer, second electrode layer, dielectric layer and interconnection structure. The substrate is equipped with a housing space; the buried layer is arranged above the substrate with the housing space; the first electrode layer is arranged above the buried layer; the second electrode layer is arranged in the middle of the first electrode layer; the dielectric layer is arranged above the second electrode layer; the interconnection structure is arranged above the substrate and the first electrode layer surrounding the dielectric layer, which forms an opening and a light-concentrating recess groove.

Abstract: A signal error calibrating method is disclosed herein and includes following steps: filtering an error voltage in a sensor by a low pass filter in a calibration mode; converting the offset voltage to be a digital offset signal by an analog digital signal converter; converting the digital offset signal to be an offset calibrating signal by a digital analog signal converter; transmitting the offset calibrating signal to an input end of the sensor so as to offset an error voltage at the input end of the sensor. After calibrating the error voltage, the analog digital converter in the error calibrating circuit can be used for the need of signal output and the low pass filter is turned off at the same time.

Abstract: A signal process circuit includes a signal modulation unit, a first resistor, a second resistor, a first discharge unit, a second discharge unit and a discharge detection unit. The signal modulation unit is used to modulate an input signal for generating a modulated signal. The first resistor is coupled between the signal modulation unit and an operation node. The second resistor is coupled between the operation node and the signal modulation unit. The first discharge unit is coupled to the signal modulation unit. The discharge unit is coupled to the signal modulation unit. The discharge detection unit is coupled to the first discharge unit, the operation node and the second discharge unit for detecting an output common voltage and control a discharge path accordingly.

Abstract: A signal error calibrating method is disclosed herein and includes following steps: filtering an error voltage in a sensor by a low pass filter in a calibration mode; converting the offset voltage to be a digital offset signal by an analog digital signal converter; converting the digital offset signal to be an offset calibrating signal by a digital analog signal converter; transmitting the offset calibrating signal to an input end of the sensor so as to offset an error voltage at the input end of the sensor. After calibrating the error voltage, the analog digital converter in the error calibrating circuit can be used for the need of signal output and the low pass filter is turned off at the same time.

Abstract: The present invention discloses a monolithic z-axis torsional CMOS MEMS accelerometer, it includes a matching frame, two anchors, a first comb structure, a second comb structure and a proof mass. With the implementation of the present invention, the capacitance sensitivity of Z+ direction and Z? direction sensing signals by the accelerometer can be improved. On the other hand, due to the feasibility of applying micromachining etch processes from the top side, the ease and the yield of production are both promoted.

Abstract: The invention provides an RF power amplifier with post-distortion linearizer. The power amplifier includes a main amplifier, an auxiliary amplifier and a phase compensator. The first amplifier has a first input end and a first output end and operates in class A or AB. The auxiliary amplifier has a second input end and a second output end and operates in class B or C. The second output end connects the first output end to form a signal output end. The phase compensator has a third input end and a third output end and compensates a phase difference between the main and auxiliary amplifiers to make outputs of the two amplifiers opposite in phase. The third output end connects the second input end. The third input end connects the first input end to form a signal input end.

Abstract: The invention includes two parallel paths. A first path is composed of two contact ends of a first electronic switch and a first, third and fifth diodes, which connect in series. One contact end connects a first end of an AC source, and a control end connects a second end of the AC source. A second path is composed of two contact ends of a second electronic switch and a second, fourth and sixth diodes, which connect in series. One contact end connects the second end of the AC source, and a control end connects the first end of the AC source. The AC source is connected between the positive ends of the first and second diodes. The second end of the AC source separately connects negative ends of the first and third diodes through two capacitors. The first end of the AC source separately connects negative ends of the second and fourth diodes through another two capacitors. Negative ends of the fifth and sixth diodes connect together to form a voltage output end.

Abstract: The present invention discloses a monolithic z-axis torsional CMOS MEMS accelerometer, it includes a curl matching frame, two anchors, a first comb structure, a second comb structure and a proof mass. With the implementation of the present invention, the capacitance sensitivity of Z+ direction and Z? direction sensing signals by the accelerometer can be improved. On the other hand, due to the feasibility of applying micromachining etch processes from the top side, the ease and the yield of production are both promoted.

Abstract: A current-steering offset compensation circuit is configured for compensating an offset caused by process variation or environment variation of a signal processor. The signal processor includes a pair of differential input terminals and a pair of differential output terminals. The current-steering offset compensation circuit comprises a current-steering circuit connected with the signal processor, a digital control unit which generates a digital control signal according to the outputs from the pair of differential output terminals of the signal processor, and a digital-to-analog converter which receives the digital control signal and outputs a control voltage, wherein the current-steering circuit receives the control voltage, so as to steer the current of the pair of differential input terminals, to reduce the offset in the signal processor.

Abstract: A microfluidic channel detection system for environmental or biomedical detection includes a chip having a first surface where a sensing region is located, a substrate having a recess for containing the chip, in which the first surface is exposed, a first inactive layer filling gaps between the chip and the substrate in the recess, so as to form a plane with the first surface of the chip, an electrical connection member electrically connected to the chip, a cover having a microfluidic channel and disposed on the plane. The flow path in the microfluidic channel is smooth, and further the measurement accuracy is improved via the plane formed by the first inactive layer and the first surface.

Abstract: A current-steering offset compensation circuit is configured for compensating an offset caused by process variation or environment variation of a signal processor. The signal processor includes a pair of differential input terminals and a pair of differential output terminals. The current-steering offset compensation circuit comprises a current-steering circuit connected with the signal processor, a digital control unit which generates a digital control signal according to the outputs from the pair of differential output terminals of the signal processor, and a digital-to-analog converter which receives the digital control signal and outputs a control voltage, wherein the current-steering circuit receives the control voltage, so as to steer the current of the pair of differential input terminals, to reduce the offset in the signal processor.

Abstract: A pizeoresistive type Z-axis accelerometer is provided, including a substrate; a plurality of anchors formed over the substrate; a plurality of cantilever beams, wherein the cantilever beams include a piezoresistive material; and a proof mass, wherein the proof mass is suspended over the substrate by respectively connecting the proof mass with the anchors, and the accelerometer senses a movement of the proof mass by the piezoresistive material.

Abstract: A sensing apparatus includes an acceleration sensing unit, for measuring an acceleration applied to a proof mass, further including: a proof mass; a carrier signal source, for providing a carrier signal; a capacitive half-bridge, including a first and a second capacitor, wherein each capacitor is coupled to the proof mass and the carrier signal source, one with a positive electrode and the other one with a negative electrode, and the acceleration applied to the proof mass makes the carrier signal flow through the first and the second capacitor so that the first capacitor and the second capacitor respectively generates a first voltage and a second voltage variation which have opposite phases with each other; and an instrumentation amplifier, for receiving and amplifying the first voltage and the second voltage variation, whereby the magnitude and the direction of the acceleration applied to the proof mass is determined.

Abstract: A structure for a metal-oxide-semiconductor field-effect transistor (MOSFET) sensor is provided. The structure includes a MOSFET, a sensing membrane, and a reference electrode. The reference electrode and the sensing membrane are formed on the first surface of the MOSFET and are arranged in such a way that the reference electrode and the sensing membrane are uniformly and electrically coupled to each other. Thus, the electric field between the sensing membrane and the reference electrode is uniformly distributed therebetween to stabilize the working signal of the MOSFET sensor.

Abstract: A structure for a metal-oxide-semiconductor field-effect transistor (MOSFET) sensor is provided. The structure includes a MOSFET, a sensing membrane, and a reference electrode. The reference electrode and the sensing membrane are formed on the first surface of the MOSFET and are arranged in such a way that the reference electrode and the sensing membrane are uniformly and electrically coupled to each other. Thus, the electric field between the sensing membrane and the reference electrode is uniformly distributed therebetween to stabilize the working signal of the MOSFET sensor.

Abstract: A hydrogen ion-sensitive field effect transistor and a manufacturing method thereof are provided. The hydrogen ion-sensitive field effect transistor includes a semiconductor substrate, an insulating layer, a transistor gate, and a sensing film. A gate area is defined on the semiconductor substrate having a source area and a drain area. The insulating layer is formed within the gate area on the semiconductor substrate. The transistor gate is deposited within the gate area and includes a first gate layer. Further, the first gate layer is an aluminum layer, and a sensing window is defined thereon. The sensing film is an alumina film formed within the sensing window by oxidizing the first gate layer. Thus, the sensing film is formed without any film deposition process, and consequently the manufacturing method is simplified.

Abstract: A complementary metal-oxide semiconductor (CMOS) sensor with an image sensing unit integrated therein is provided. The CMOS sensor includes a first substrate, a CMOS circuit, and a sensing device. The first substrate has the image sensing unit formed thereon. The CMOS circuit is disposed on the first substrate and has a receiving space. The sensing device is disposed in the receiving space. The image sensing unit is located at a position from which the image sensing unit can monitor the sensing device. Accordingly, the image sensing unit monitors the sensing device by sensing its image.

Abstract: A CMOS-MEMS switch structure is disclosed. The CMOS-MEMS switch structure includes a first substrate, a second substrate, a first cantilever beam, and a second cantilever beam. The first and second substrates are positioned opposite each other. The first cantilever beam is provided on the first substrate, extends from the first substrate toward the second substrate, and bends downward. Likewise, the second cantilever beam is provided on the second substrate, extends from the second substrate toward the first substrate, and bends downward. The first and second substrates are movable toward each other to connect a first top surface of the first cantilever beam and a second top surface of the second cantilever beam, and away from each other so that the first top surface of the first cantilever beam and the second top surface of the second cantilever beam are disconnected, thereby closing or opening the CMOS-MEMS switch structure.

Abstract: A pizeoresistive type Z-axis accelerometer is provided, including a substrate; a plurality of anchors formed over the substrate; a plurality of cantilever beams, wherein the cantilever beams include a piezoresistive material; and a proof mass, wherein the proof mass is suspended over the substrate by respectively connecting the proof mass with the anchors, and the accelerometer senses a movement of the proof mass by the piezoresistive material.