Abstract: This application provides an adhesive composition. The adhesive composition includes an adhesive matrix and a modified polymer. A main chain of the modified polymer includes a boron-oxygen coordinate bond and/or a bridging boron-oxygen coordinate bond. A terminal group or a side chain of the modified polymer or both include at least one of a hydroxyl group, an acrylate group, and a vinyl group. This application further provides a preparation method of the adhesive composition, an optical adhesive film, a foldable screen using the optical adhesive film, and an electronic device using the optical adhesive film or the foldable screen.

Abstract: A radiation system for controlling bursts of pulses of radiation comprises: an optical element; a controller; an actuator; and a sensor. The optical element is configured to interact with the pulses of radiation to control a characteristic of the pulses of radiation, the characteristic of the pulses of radiation being dependent on a configuration of the optical element. The controller is operable to generate a control signal. The actuator is configured to receive the control signal from the controller and to control a configuration of the optical element in dependence on the control signal. The sensor is operable to determine the characteristic of pulses having interacted with the optical element. The control signal for a given pulse in a given burst is dependent on the determined characteristic of a corresponding pulse from a previous burst.

Abstract: The present disclosure relates to display apparatuses and methods for manufacturing the display apparatuses. One example display apparatus includes an array substrate and a laminated structure. The array substrate includes a substrate and an array layer located on a side of the substrate. The laminated structure is located on a side that is of the array layer and that is opposite to the substrate, and includes a first film layer and a second film layer. The first film layer is located on a side that is of the second film layer and that is opposite to the substrate, and is formed by a high modulus material. An elastic modulus of the high modulus material is E1, and 50 Mpa?E1?5 Gpa. The second film layer is formed by a modified energy absorption impact resistance material has viscosity and shear thickening behavior.

Abstract: A system for deep ultraviolet (DUV) optical lithography includes an optical source apparatus including N optical oscillators, N being an integer number greater than or equal to two, and each of the N optical oscillators is configured to produce a pulse of light in response to an excitation signal; and a control system coupled to the optical source apparatus. The control system is configured to determine a corrected excitation signal for a first one of the N optical oscillators based on an input signal, the input signal including an energy property of a pulse of light produced by another one of the N optical oscillators.

Abstract: This application provides a display panel, a fabrication method thereof, and a display apparatus. The display panel includes a display region and a non-display region extending around the display region, and includes: a base; an array structure layer, disposed on the base, where a drive circuit is disposed in the array structure layer, the array structure layer includes a first portion and a second portion, the first portion is a projection portion of the display region on the array structure layer, the second portion is a projection portion of the non-display region on the array structure layer, and the second portion is provided with a groove that is filled with a first organic material; an organic planarization layer, where the organic planarization layer covers the first portion and includes the first organic material; a light-emitting component layer, disposed on the organic planarization layer.

Abstract: The present disclosure is directed to systems and methods for controlling a center wavelength. In one example, a method includes estimating a center wavelength error. The method also includes determining a first actuation amount for a first actuator controlling movement a first prism based on the estimated center wavelength error. The method also includes actuating the first actuator based on the actuation amount. The method also includes determining whether the first prism is off-center. The method also includes, in response to determining that the first prism is off-center, determining a second actuation amount for the first actuator and determining a third actuation amount for a second actuator for controlling movement of a second prism. The method also includes actuating the first actuator and the second actuator based on the second and third actuation amounts, respectively. The method finds application in multi-focal imaging operations.

Abstract: A system for deep ultraviolet (DUV) optical lithography includes an optical source apparatus including N optical oscillators, N being an integer number greater than or equal to two, and each of the N optical oscillators is configured to produce a pulse of light in response to an excitation signal; and a control system coupled to the optical source apparatus. The control system is configured to determine a corrected excitation signal for a first one of the N optical oscillators based on an input signal, the input signal including an energy property of a pulse of light produced by another one of the N optical oscillators.

Abstract: A radiation system for controlling bursts of pulses of radiation comprises: an optical element; a controller; an actuator; and a sensor. The optical element is configured to interact with the pulses of radiation to control a characteristic of the pulses of radiation, the characteristic of the pulses of radiation being dependent on a configuration of the optical element. The controller is operable to generate a control signal. The actuator is configured to receive the control signal from the controller and to control a configuration of the optical element in dependence on the control signal. The sensor is operable to determine the characteristic of pulses having interacted with the optical element. The control signal for a given pulse in a given burst is dependent on the determined characteristic of a corresponding pulse from a previous burst.

Abstract: A system includes: an optical source including a plurality of optical oscillators; a spectral analysis apparatus; and a controller. Each optical oscillator is configured to produce a light beam. The controller is configured to: determine, based on data from the spectral analysis apparatus, whether the spectral property of the light beam of one of the optical oscillators is different than the spectral property of the light beam of at least another of the plurality of optical oscillators. If the spectral property of the light beam of the first one of the optical oscillators is different than the spectral property of the light beam of another of the optical oscillators, the controller is configured to adjust the spectral property of the light beam of the first one of the optical oscillators or of the light beam of at least one other of the optical oscillators.

Abstract: Provided is a gas control system and method for online control of a gas compartment of a radiation source. The method includes measuring a parameter of a radiation source such as an excimer laser, the parameter describing an electrical stimulation applied to the laser and/or a characteristic of radiation generated by the laser and/or an amount of a consumable in the gas compartment. A function of the parameter is compared a to a threshold and if the parameter breaches the threshold, an amount of gas is calculated based on the parameter. An instruction is provided to provide or remove the amount of gas to or from, the gas compartment. Gases may be injected or bled into the compartment during use of the radiation source thereby reducing or negating the need to take the radiation source offline to purge and refill the gas compartment.

Abstract: A deep ultraviolet (DUV) optical system includes: an optical source system including: a plurality of optical oscillators; a beam combiner; and a beam control apparatus between the optical oscillators and the beam combiner. The beam combiner is configured to receive and direct light emitted from any of the optical oscillators toward a scanner apparatus as an exposure light beam, and the beam control apparatus is configured to determine whether the beam combiner receives light from a particular one of the optical oscillators. The DUV optical lithography system also includes a control system coupled to the optical source system, the control system configured to: determine whether a condition exists in the DUV optical system, and based on a determination that the condition exists, perform a calibration action in a subset of the optical oscillators.

Abstract: A laser system's laser light energy control and resulting dose control is improved by creating and using a set of gain estimators, one for each of a set or range of laser light pulse repetition rates. When a new repetition rate is used, its corresponding gain estimator is retrieved, used to compute the voltage to fire the laser source, and updated. The resulting generated laser light thereby avoids the convergence delay inherent in prior laser systems and, further, can repeatedly do so with subsequent specified repetition rates.

Abstract: A laser system's laser light energy control and resulting dose control is improved by creating and using a set of gain estimators, one for each of a set or range of laser light pulse repetition rates. When a new repetition rate is used, its corresponding gain estimator is retrieved, used to compute the voltage to fire the laser source, and updated. The resulting generated laser light thereby avoids the convergence delay inherent in prior laser systems and, further, can repeatedly do so with subsequent specified repetition rates.

Abstract: A laser system's laser light energy control and resulting dose control is improved by creating and using a set of gain estimators, one for each of a set or range of laser light pulse repetition rates. When a new repetition rate is used, its corresponding gain estimator is retrieved, used to compute the voltage to fire the laser source, and updated. The resulting generated laser light thereby avoids the convergence delay inherent in prior laser systems and, further, can repeatedly do so with subsequent specified repetition rates.