Abstract: A method of manufacturing an OLED back plate and an OLED back plate are provided. The method includes: providing a TFT substrate and forming an electrode layer on the TFT substrate; forming a pixel defining layer on the electrode layer by using a first mask, and forming a plurality of pixel units, each of the pixel units includes a light emitting area, and an inter-pixel area is formed between adjacent two of the pixel units; etching the electrode layer corresponding to the inter-pixel area; removing the pixel defining layer corresponding to the light emitting area to form a pixel opening; and forming a barrier block on adjacent two of the pixel defining layers of adjacent two of the pixel units by a second mask, and the barrier block does not completely cover the pixel defining layer.

Abstract: The present disclosure provides a method of fabricating an organic light-emitting diode (OLED) display panel and an organic light-emitting diode (OLED) display panel. The OLED display panel includes a substrate; a driving circuit layer formed on the substrate; a pixel defining layer; and a light emitting functional layer, which are stacked. Protrusions are provided on a surface of the pixel defining layer away from the driving circuit layer in at least one of a plurality of pixel defining regions, and the light emitting functional layer is formed on the pixel defining layer and covers the sub-pixel regions. By forming the protrusions, a lateral transmission path of charges between adjacent sub-pixels is increased, resulting in a reduction in light leakage.

Abstract: The present disclosure provides a method of fabricating an organic light-emitting diode (OLED) display panel and an organic light-emitting diode (OLED) display panel. The OLED display panel includes a substrate; a driving circuit layer formed on the substrate; a pixel defining layer; and a light emitting functional layer, which are stacked. Protrusions are provided on a surface of the pixel defining layer away from the driving circuit layer in at least one of a plurality of pixel defining regions, and the light emitting functional layer is formed on the pixel defining layer and covers the sub-pixel regions. By forming the protrusions, a lateral transmission path of charges between adjacent sub-pixels is increased, resulting in a reduction in light leakage.

Abstract: A method of manufacturing an OLED back plate and an OLED back plate are provided. The method includes: providing a TFT substrate and forming an electrode layer on the TFT substrate; forming a pixel defining layer on the electrode layer by using a first mask, and forming a plurality of pixel units, wherein each of the pixel units includes a light emitting area, and an inter-pixel area is formed between adjacent two of the pixel units; etching the electrode layer corresponding to the inter-pixel area; removing the pixel defining layer corresponding to the light emitting area to form a pixel opening; and forming a barrier block on adjacent two of the pixel defining layers of adjacent two of the pixel units by a second mask. The effect of uniformity of ink thickness in a pixel unit and preventing color mixing are realized.

Abstract: A thin film transistor array substrate and a display panel are provided. The thin film transistor array substrate includes a substrate, a thin film transistor, a scan line, a data line and a pixel electrode. The thin film transistor includes a semiconductor member, a gate electrode, a source electrode and a drain electrode. The source electrode and the drain electrode include a first extension portion and a second extension portion, respectively. The first extension portion and the second extension portion are configured to block light that is emitted toward an electron migration channel of the thin film transistor. Thus, external light emitting toward the electron migration channel can be prevented.

Abstract: A thin film transistor array substrate and a display panel are provided. The thin film transistor array substrate includes a substrate, a thin film transistor, a scan line, a data line and a pixel electrode. The thin film transistor includes a semiconductor member, a gate electrode, a source electrode and a drain electrode. The source electrode and the drain electrode include a first extension portion and a second extension portion, respectively. The first extension portion and the second extension portion are configured to block light that is emitted toward an electron migration channel of the thin film transistor. Thus, external light emitting toward the electron migration channel can be prevented.

Abstract: The present disclosure provides an OLED component, a method for manufacturing the same and an OLED display. The OLED component includes a baseplate; a pixel define layer, an insulation layer and an organic light-emitting unit successively disposed on the baseplate; wherein the pixel define layer defines a light-emitting area, the organic light-emitting unit is located in the light-emitting area, and the insulation layer is arranged between the pixel define layer and the organic light-emitting unit. Therefore, the implementation of the present disclosure may prevent impurities in the pixel define layer from entering into the organic light-emitting unit.

Abstract: An OLED display and manufacture method thereof are provided. The OLED display includes a TFT substrate, the TFT substrate having a plurality of light-blocked pixel isolation layers and a plurality of OLED emissive layers on a surface thereof, and each OLED emissive layer having cathode on a surface thereof. The light-blocked pixel isolation layer includes a wall portion, and the wall portion having a light-blocked portion on a surface thereof. The TFT substrate has a plurality of pixel regions surrounded by the wall portions of the light-blocked pixel isolation layers on the surface thereof. Each pixel region respectively has the OLED emissive layer therein. The OLED display and method avoid light leakage caused by the oblique light of each pixel region emitted into adjacent pixel regions while the OLED emissive layer lighting.

Abstract: An OLED display and manufacture method thereof are provided. The OLED display includes a TFT substrate, the TFT substrate having a plurality of light-blocked pixel isolation layers and a plurality of OLED emissive layers on a surface thereof, and each OLED emissive layer having cathode on a surface thereof. The light-blocked pixel isolation layer includes a wall portion, and the wall portion having a light-blocked portion on a surface thereof. The TFT substrate has a plurality of pixel regions surrounded by the wall portions of the light-blocked pixel isolation layers on the surface thereof. Each pixel region respectively has the OLED emissive layer therein. The OLED display and method avoid light leakage caused by the oblique light of each pixel region emitted into adjacent pixel regions while the OLED emissive layer lighting.