Patents by Inventor Yingxia Wang

Yingxia Wang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Microporous tectosilicate and method for the production thereof
    Patent number: 8124560
    Abstract: The present invention relates to a tectosilicate having an X-ray diffraction pattern in which at least the following reflections occur: Intensity (%) Diffraction angle 2?/° [Cu K(alpha 1)] 100 ?9.8-10.2 24-34 11.0-11.4 ?9-19 15.5-15.9 12-22 19.4-19.6 19-29 19.6-19.8 100% relating to the intensity of the maximum peak in the X-ray diffraction pattern.
    Type: Grant
    Filed: October 7, 2010
    Date of Patent: February 28, 2012
    Assignees: BASF Aktiengesellschaft, rubitec GmbH
    Inventors: Ulrich Mueller, Gerald Lippert, James Reuben Brown, Hermann Gies, Bernd Marler, Nadine Stroeter, Yingxia Wang
  • MICROPOROUS TECTOSILICATE AND METHOD FOR THE PRODUCTION THEREOF
    Publication number: 20110135567
    Abstract: The present invention relates to a tectosilicate having an X-ray diffraction pattern in which at least the following reflections occur: Intensity (%) Diffraction angle 2?/° [Cu K(alpha 1)] 100 ?9.8-10.2 24-34 11.0-11.4 ?9-19 15.5-15.9 12-22 19.4-19.6 19-29 19.6-19.8 100% relating to the intensity of the maximum peak in the X-ray diffraction pattern.
    Type: Application
    Filed: October 7, 2010
    Publication date: June 9, 2011
    Applicants: BASF SE, rubitec GmbH
    Inventors: Ulrich MÜLLER, Gerald Lippert, James Reuben Brown, Hermann Gies, Bernd Marler, Nadine Ströter, Yingxia Wang
  • Microporous Tectosilicate and Method for the Production Thereof
    Publication number: 20080000354
    Abstract: The present invention relates to a tectosilicate having an X-ray diffraction pattern in which at least the following reflections occur: Intensity (%) Diffraction angle 2?/° [Cu K(alpha 1)] 100 ?9.8-10.2 24-34 11.0-11.4 ?9-19 15.5-15.9 12-22 19.4-19.6 19-29 19.6-19.8 100% relating to the intensity of the maximum peak in the X-ray diffraction pattern.
    Type: Application
    Filed: April 13, 2005
    Publication date: January 3, 2008
    Applicants: BASF Aktiengesellschaft, Rubitec GmbH
    Inventors: Ulrich Muller, Gerald Lippert, James Brown, Hermann Gies, Bernd Marler, Nadine Stroter, Yingxia Wang