Abstract: A hair care composition is disclosed comprising an anti-dandruff agent selected from piroctone olamine, climbazole, ketoconazole, selenium sulfide and mixtures thereof, a copolymer comprising acrylamidopropyltrimonium chloride, and a cationic guar polymer having a molecular weight of from 0.3 to 2.5 million Dalton and a cationic degree of substitution of from 0.05 to 0.4, wherein the weight ratio of the amount of the copolymer to the amount of cationic guar polymer is in the range of from 1:10 to 10:1.

Abstract: A hair care composition is disclosed comprising a cationically modified guar polymer having a cationic degree of substitution of from 0.35 to 0.70, an ethoxylated alkyl sulfate anionic surfactant having a formula RO(CH2CH2O)nSO3M, wherein R is an alkyl or alkenyl group having from 8 to 18 carbon atoms; M is a solubilising cation comprising sodium, potassium, 5 ammonium, substituted ammonium or mixtures thereof; n is the degree of ethoxylation of from 0.5 to 3 and from 0.01 to 10% by weight of an anti-dandruff agent selected from azole based anti-fungal agents, piroctone olamine, metal pyrithione salts, selenium sulfide or mixtures thereof; wherein the degree of substitution is measured using 1H NMR and the spectrum is recorded at 25° C.

Abstract: A hair care composition is disclosed comprising a copolymer, an ethoxylated alkyl sulfate anionic surfactant having a formula RO(CH2CH2O)nSO3M, wherein R is an alkyl or alkenyl having from 8 to 18 carbon atoms; M is a solubilising cation comprising sodium, potassium, ammonium or mixtures thereof; the degree of ethoxylation n is 2, and from 0.

Abstract: A hair care composition is disclosed comprising a polyhydroxy fatty acid amide surfactant of general formula (I) wherein R1 is a C1-C4 alkyl groups or hydroxy-substituted C1-C4 alkyl groups; R2CO is a linear or branched, saturated or unsaturated C12-C18 acyl group, a silicone compound, and from 0.01 to 10% by weight of an anti-dandruff agent selected from piroctone olamine, azole based anti-fungal agents and mixtures thereof.

Abstract: A hair care composition is disclosed comprising a polyhydroxy fatty acid amide surfactant of general formula (I): wherein R1 is a C1-C4alkyl groups or hydroxy-substituted C1-C4 alkyl groups; R2CO is a linear or branched, saturated or unsaturated C3-C10 acyl group, preferably C8-C10 acyl group, an ethoxylated alkyl sulfate anionic surfactant having a formula R3O(CH2CH2O)nSO3M, wherein R3 is an alkyl or alkenyl having from 8 to 18 carbon atoms; M is a solubilising cation comprising sodium, potassium, ammonium, substituted ammonium or mixtures thereof; n is the degree of ethoxylation of from 0.5 to 3, and from 0.01 to 10% by weight of an anti-dandruff agent selected from piroctone olamine, azole based anti-fungal agents and mixtures thereof, wherein the weight ratio of the ethoxylated alkyl sulfate anionic surfactant to the polyhydroxy fatty acid amide surfactant ranges from 1:10 to 10:1.

Abstract: A hair care composition is disclosed comprising a salt of acyl glycinate, an ethoxylated alkyl sulfate anionic surfactant having a formula R2O(CH2CH2O)nSO3M, wherein R2 is an alkyl or alkenyl group having from 8 to 18 carbon atoms; M is a solubilising cation comprising sodium, potassium, ammonium, substituted ammonium or mixtures thereof; n is the degree of ethoxylation of from 0.5 to 3; and an anti-dandruff agent selected from piroctone olamine, azole based anti-fungal agents and mixtures thereof; wherein the composition comprises the salt of acyl glycinate and the ethoxylated alkyl sulfate anionic surfactant in a weight ratio of from 1:10 to 1:1.

Abstract: A hair care composition is disclosed comprising an anti-dandruff agent selected from piroctone olamine, selenium sulfide and mixtures thereof and a copolymer comprising acrylamidopropyltrimonium chloride, wherein the weight ratio of the amount of the copolymer to the amount of the anti-dandruff agent is in the range of from 1:5 to 1:1.

Abstract: A hair care composition is disclosed comprising from 0.5 to 45% by weight of a salt of acyl glutamate and an anti-dandruff agent of piroctone olamine, wherein the salt of acyl glutamate and the anti-dandruff agent are present in a weight ratio of from 5:1 to 50:1, and wherein the composition does not comprise other anionic surfactants in addition to the salt of acyl glutamate.

Abstract: This invention relates to a hair care composition which provides the desired anti-dandruff efficacy with uniform deposition of the active materials on hair/scalp. This is achieved through a judicious combination of a specific cationic deposition polymer and selective anti-dandruff agent of the right particle size.

Abstract: A hair care composition is disclosed comprising a cationically modified guar polymer having a cationic degree of substitution of from 0.35 to 0.70, an ethoxylated alkyl sulfate anionic surfactant having a formula RO(CH2CH2O)nSO3M, wherein R is an alkyl or alkenyl group having from 8 to 18 carbon atoms; M is a solubilising cation comprising sodium, potassium, 5 ammonium, substituted ammonium or mixtures thereof; n is the degree of ethoxylation of from 0.5 to 3 and from 0.01 to 10% by weight of an anti-dandruff agent selected from azole based anti-fungal agents, piroctone olamine, metal pyrithione salts, selenium sulfide or mixtures thereof; wherein the degree of substitution is measured using 1H NMR and the spectrum is recorded at 25° C.

Abstract: A hair care composition is disclosed comprising a copolymer, an ethoxylated alkyl sulfate anionic surfactant having a formula RO(CH2CH2O)nSO3M, wherein R is an alkyl or alkenyl having from 8 to 18 carbon atoms; M is a solubilising cation comprising sodium, potassium, ammonium or mixtures thereof; the degree of ethoxylation n is 2, and from 0.

Abstract: Disclosed is a personal care composition comprising cooling active and copolymer comprising acrylamidopropyltrimonium chloride, wherein the weight ratio of the amount of the cooling active to the amount of the copolymer is in the range from 1:5 to 100:1. The copolymer improves deposition of the cooling active during topical application of the product to skin.

Abstract: The invention provides an antimicrobial personal cleansing composition comprising: (i) an aqueous continuous phase including one or more anionic cleansing surfactants, (ii) a dispersed phase including dispersed particles of zinc pyrithione (ZPT) in combination with one or more additional zinc salts; (iii) a cationic deposition polymer selected from one or more cationic polygalactomannans having an average molecular weight (Mw) of from 1 million to 3 million g/mol and a cationic degree of substitution of from 0.13 to 0.3; (iv) an anionic polymeric rheology modifier selected from one or more carboxylic acid polymers, and (v) a nonionic polymeric rheology modifier selected from one or more nonionic cellulose ethers.

Abstract: This invention relates to a hair care composition which provides the desired anti-dandruff efficacy with uniform deposition of the active materials on hair/scalp. This is achieved through a judicious combination of a specific cationic deposition polymer and selective anti-dandruff agent of the right particle size.

Abstract: A hair care composition is disclosed comprising cationic deposition polymer and discrete dispersed droplets of a water-insoluble conditioning agent, wherein the cationic deposition polymer comprises at least 90% by weight cationically-modified guar by weight of the cationic deposition polymer and wherein the cationically-modified guar comprises first cationically-modified guar polymer having a charge density of greater than 1.2 meq/g and a molecular weight of at least 1 million g/mol, and second cationically-modified guar polymer having a charge density of from 0.8 to 1.2 meq/g and a molecular weight of at least 1 million g/mol.

Abstract: Disclosed is a personal care composition comprising cooling active and copolymer comprising acrylamidopropyltrimonium chloride, wherein the weight ratio of the amount of the cooling active to the amount of the copolymer is in the range from 1:5 to 100:1. The copolymer improves deposition of the cooling active during topical application of the product to skin.