Patents by Inventor Yinjie CEN

Yinjie CEN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240027904
    Abstract: A photoactive compound including an organic cation; and an anion represented by Formula (1): wherein X is an organic group; Y1 and Y2 are each independently a non-hydrogen substituent; Y1 and Y2 together optionally form a ring; Z2 is hydrogen, halogen, substituted or unsubstituted C1-30 alkyl, substituted or unsubstituted C3-30 cycloalkyl, substituted or unsubstituted C3-30 heterocycloalkyl, substituted or unsubstituted C6-50 aryl, substituted or unsubstituted C7-50 arylalkyl, substituted or unsubstituted C7-50 alkylaryl, substituted or unsubstituted C6-50 aryloxy, substituted or unsubstituted C3-30 heteroaryl, substituted or unsubstituted C4-30 alkylheteroaryl, substituted or unsubstituted C4-30 heteroarylalkyl, or substituted or unsubstituted C3-30 heteroaryloxy; Z2 optionally further comprises one or more divalent linking groups as part of its structure; Z2 and one of Y1 or Y2 together optionally form a ring; X and Z2 together optionally form a ring; and X and one of Y1 or Y2 together optionally form a
    Type: Application
    Filed: July 14, 2023
    Publication date: January 25, 2024
    Inventors: Emad Aqad, Tomas Marangoni, Yinjie Cen, Paul J. LaBeaume, Mingqi Li, James F. Cameron
  • Publication number: 20240019779
    Abstract: A compound represented by Formula (1): wherein X is a group having a valency of r; each R1 is independently an organic group comprising an acid-labile group; m is an integer greater than or equal to 1; k is an integer from 1 to 5; and r is an integer from 2 to 10, wherein the compound is non-polymeric, and wherein Ar1, L1, L2, R2, and R3 are as defined herein.
    Type: Application
    Filed: May 20, 2022
    Publication date: January 18, 2024
    Inventors: Li Cui, Emad Aqad, Yinjie Cen, Conner A. Hoelzel, James F. Cameron, Jong Keun Park, Suzanne M. Coley, Choong-Bong Lee
  • Publication number: 20230314934
    Abstract: A photoactive compound of formula (1a) or (1b): wherein R1 is substituted or unsubstituted C1-30 alkyl, substituted or unsubstituted C3-30 cycloalkyl, substituted or unsubstituted C3-30 heterocycloalkyl, substituted or unsubstituted C6-30 aryl, or substituted or unsubstituted C3-30 heteroaryl comprising an aromatic ring heteroatom chosen from nitrogen, oxygen, or a combination thereof; R2 and R3 are as provided herein; R4 is substituted or unsubstituted C1-30 alkyl, substituted or unsubstituted C3-30 cycloalkyl, substituted or unsubstituted C3-30 heterocycloalkyl, substituted or unsubstituted C6-30 aryl, or substituted or unsubstituted C3-30 heteroaryl; and M+ is an organic cation.
    Type: Application
    Filed: March 31, 2022
    Publication date: October 5, 2023
    Inventors: Emad Aqad, Jong Keun Park, Yinjie Cen, Choong-Bong Lee
  • Publication number: 20230213862
    Abstract: A photoresist composition, comprising: a first polymer comprising: a first repeating unit comprising a hydroxyaryl group; a second repeating unit comprising a first acid-labile group; and a third repeating unit comprising a first base-soluble group having a pKa of 12 or less, and not comprising a hydroxyaryl group; wherein the first, second, and third repeating units of the first polymer are different from each other, and the first polymer is free of lactone groups; a second polymer comprising: a first repeating unit comprising a second acid-labile group, a second repeating unit comprising a lactone group, and a third repeating unit comprising a second base-soluble group having a pKa of 12 or less; wherein the first, second, and third repeating units of the second polymer are structurally different from each other; and a solvent, wherein the first polymer and the second polymer are different from each other.
    Type: Application
    Filed: December 20, 2022
    Publication date: July 6, 2023
    Inventors: Li Cui, Suzanne M. Coley, Emad Aqad, Yinjie Cen, Jong Keun Park, Choong-Bong Lee, James F. Cameron
  • Publication number: 20230124713
    Abstract: Disclosed is an actinic radiation curable (meth)acrylic composition for use in hardcoats for optical displays containing one or more multifunctional (meth)acrylate monomers, one or more Si-containing (meth)acrylate monomers, one or more UV radical initiators, one or more monomers to improve surface cure, nanoparticles, and one or more organic solvents. Coated hardcoat articles made from this composition exhibit improved properties for use in display applications.
    Type: Application
    Filed: October 18, 2021
    Publication date: April 20, 2023
    Inventors: Michael MULZER, Kenneth HERNANDEZ, Andrew STELLA, Lujia BU, Jieqian ZHANG, Deyan WANG, Yinjie CEN
  • Publication number: 20230103685
    Abstract: A compound comprising an aromatic group or a heteroaromatic group, wherein the aromatic group or the heteroaromatic group comprises a first substituent group comprising an ethylenically unsaturated double bond, a second substituent group that is an iodine atom, and a third substituent group comprising an acid-labile group, wherein the first substituent group, the second substituent group, and the third substituent group are each bonded to a different carbon atom of the aromatic group or the heteroaromatic group.
    Type: Application
    Filed: September 30, 2021
    Publication date: April 6, 2023
    Inventors: Emad Aqad, Jong Keun Park, Bhooshan C. Popere, Li Cui, Yinjie Cen, Choong-Bong Lee
  • Publication number: 20210115289
    Abstract: The present invention provides a thermoformable and optically clear hard coat comprising a polyacrylate resin and 5 wt. % or less of inorganic nanoparticles with an average particle size of 100 nm or less in diameter based on total weight of resin solid. The polyacrylate resin is derived from polymerizing and curing ultraviolet (UV) curing acrylic compositions for use in making thermoformable hard coats for curved optical displays comprising (a) from 9 to 70 wt. %, based on the total weight of monomer solids, of an aliphatic tetrafunctional (meth)acrylate monomer or an aliphatic pentafunctional (meth)acrylate monomer; (b) from 3 to 30 wt. %, based on the total weight of monomer solids, of one or more one (meth)acrylate monomer containing an isocyanurate group; (c) from 5 to 55 wt. %, based on the total weight of monomer solids, of one or more aliphatic urethane (meth)acrylate functional oligomer having from 6 to 24 (meth)acrylate groups; (d) from 2 to 10 wt.
    Type: Application
    Filed: December 28, 2020
    Publication date: April 22, 2021
    Inventors: Lujia Bu, Yusuke Matsuda, Michael Mulzer, Yinjie Cen
  • Publication number: 20200123408
    Abstract: The present invention provides ultraviolet (UV) curing acrylic compositions for use in making thermoformable hard coats for curved optical displays comprising: (a) one or more multifunctional (meth)acrylate diluents chosen from (a1) an aliphatic trifunctional (meth)acrylate monomer; (a2) an aliphatic tetrafunctional (meth)acrylate monomer; or (a3) an aliphatic pentafunctional (meth)acrylate monomer; (b) from 3 to 30 wt %, based on the total weight of monomer solids, of one or more one (meth)acrylate monomer containing an isocyanurate group; (c) from 5 to 40 wt %, based on the total weight of monomer solids, of one or more aliphatic urethane (meth)acrylate functional oligomer having from 6 to 12 (meth)acrylate groups; (d) from 2 to 10 wt %, based on total monomer solids, of one or more UV radical initiators; (e) from 10 to 30 wt %, based on the total weight of (a), (b), (c), and (d), of one or more sulfur-containing polyol (meth)acrylates; and (f) one or more organic solvents for the monomer composition.
    Type: Application
    Filed: November 30, 2018
    Publication date: April 23, 2020
    Inventors: Lujia BU, Yusuke MATSUDA, Michael MULZER, Yinjie CEN