Patents by Inventor Yinlei WEI

Yinlei WEI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Photolithography tool and method for compensating for surface deformation in carrier of photolithography tool
    Patent number: 10345720
    Abstract: A photolithography tool and a method for compensating for surface deformation in a carrier of the photolithography tool are disclosed. In the photolithography tool, carrier surface deformation compensation elements are provided at the bottom of the carrier, which are capable of compensating for the surface deformation in the carrier. In the method, the surface deformation is detected by carrier surface deformation detection modules, and an automated closed-loop controller controls compensating forces exerted by the carrier surface deformation compensation elements based on the detected deformation. This allows more accurate compensation for the carrier surface deformation.
    Type: Grant
    Filed: February 28, 2018
    Date of Patent: July 9, 2019
    Assignee: SHANGHAI MICRO ELECTRONICS EQUIPMENT (GROUP) CO., LTD.
    Inventors: Yinlei Wei, Feihong Liao, Fuqiang Yang
  • PHOTOLITHOGRAPHY TOOL AND METHOD FOR COMPENSATING FOR SURFACE DEFORMATION IN CARRIER OF PHOTOLITHOGRAPHY TOOL
    Publication number: 20180246412
    Abstract: A photolithography tool and a method for compensating for surface deformation in a carrier of the photolithography tool are disclosed. In the photolithography tool, carrier surface deformation compensation elements are provided at the bottom of the carrier, which are capable of compensating for the surface deformation in the carrier. In the method, the surface deformation is detected by carrier surface deformation detection modules, and an automated closed-loop controller controls compensating forces exerted by the carrier surface deformation compensation elements based on the detected deformation. This allows more accurate compensation for the carrier surface deformation.
    Type: Application
    Filed: February 28, 2018
    Publication date: August 30, 2018
    Inventors: Yinlei WEI, Feihong LIAO, Fuqiang YANG