Patents by Inventor Yinqiao WENG

Yinqiao WENG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220121119
    Abstract: Disclosed is a infrared radiation sensitive positive-working imageable element. The imageable element comprises: (a) a substrate, (b) an inner coating covering the substrate, and (c) an outer coating covering the inner coating. The inner coating comprises a repeating unit derived from a maleimide monomer and a (meth)acrylamide monomer, and a polymer hinder P that is soluble in an alkaline developing solution; and the outer coating comprises an infrared radiation absorbing compound and a polymer binder Q which is different from that in the inner coating. The imageable element is designed such that same is not only sensitive to radiation with a maximum wavelength of 700-1200 nm, but also has a good resistance to chemical solvents when used as a lithographic printing plate precursor, and same is not easily corroded and dissolved by printing chemicals during use, thus facilitating the prolonging of the service life of a lithographic printing plate.
    Type: Application
    Filed: January 22, 2021
    Publication date: April 21, 2022
    Applicant: ZHEJIANG KONITA NEW MATERIALS CO., LTD.
    Inventors: Yinqiao WENG, Ting TAO, Miao GAO, Nengping XU, Zuoting YING, Xianyao MA, Leze JIAO