Patents by Inventor Yintao Guo

Yintao Guo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240327980
    Abstract: The present application provides a method for a manufacturing semiconductor structure and a semiconductor growth device.
    Type: Application
    Filed: July 20, 2022
    Publication date: October 3, 2024
    Inventors: Yang CHENG, Jun WANG, Xiao XIAO, Yintao GUO
  • Publication number: 20240332910
    Abstract: A high-efficiency active layer includes a strained quantum well layer and, at one side thereof, a first strained barrier layer configured to transport electrons. The first strained barrier layer and the strained quantum well layers are configured to form strain compensation. A second barrier layer is positioned on the other side of the strained quantum well layer and is configured to transport holes. A band offset between conduction bands of the first strained barrier layer and of the strained quantum well layer is less than a band offset between valence bands of the strained quantum well layer and of the first strained barrier layer. A band offset between valence bands of the strained quantum well layer and of the second barrier layer is less than a band offset between conduction bands of the second barrier layer and of the strained quantum well layer. Light-emitting efficiency and reliability are improved.
    Type: Application
    Filed: May 29, 2023
    Publication date: October 3, 2024
    Applicants: SUZHOU EVERBRIGHT PHOTONICS CO., LTD., EVERBRIGHT INSTITUTE OF SEMICONDUCTOR PHOTONICS CO., LTD.
    Inventors: Jun WANG, Shaoyang TAN, Li ZHOU, Yang CHENG, Xiao XIAO, Yintao GUO, Hao YU, Quanling LI, Xinsheng LIAO, Dayong MIN
  • Publication number: 20240218559
    Abstract: The present application provides a semiconductor growth device and an operation method thereof.
    Type: Application
    Filed: July 20, 2022
    Publication date: July 4, 2024
    Inventors: Jun WANG, Yang Cheng, Xiao Xiao, Yintao Guo, Yudan Cuo
  • Publication number: 20240222939
    Abstract: A semiconductor structure and a method for manufacturing a semiconductor structure are provided. The semiconductor structure includes: a semiconductor substrate layer; an N-type waveguide structure arranged on the semiconductor substrate layer; and an active layer arranged on a surface of the N-type waveguide structure on a side away from the semiconductor substrate layer. The N-type waveguide structure includes a first N-type waveguide layer and a second N-type waveguide layer that are stacked. The second N-type waveguide layer is arranged between the first N-type waveguide layer and the active layer. A conduction band level of the first N-type waveguide layer is the same as a conduction band level of the second N-type waveguide layer. A valence band level of the first N-type waveguide layer is lower than a valence band level of the second N-type waveguide layer. The semiconductor structure increases light emitting efficiency.
    Type: Application
    Filed: July 20, 2022
    Publication date: July 4, 2024
    Inventors: Jun WANG, Shaoyang TAN, Li ZHOU, Bangguo WANG, Yintao GUO, Xinsheng LIAO, Quanling LI