Patents by Inventor Yiping Xu
Yiping Xu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240132979Abstract: A set of primers and probes for simultaneous detection of Cymbidium mosaic virus (CymMV), Odontoglossum ringspot virus (ORSV), and Cymbidium ringspot virus (CymRSV) and a method for detecting CymMV, ORSV, and CymRSV, along with a method for their detection, are disclosed. The method involves designing multiplex real-time quantitative PCR detection primers and probes for CymMV, ORSV, and CymRSV and applying these primers and probes to the real-time quantitative PCR simultaneous detection of CymMV, ORSV, and CymRSV. It allows for faster detection of CymMV, ORSV, and CymRSV, taking only one-third of the time compared to uniplex real-time quantitative PCR technology, thereby reducing testing costs by approximately ? to ½ for each sample. The primers and probes are highly specific and sensitive, with a sensitivity as low as 1 to 10 copies. It provides an efficient and feasible detection method for early detection and prevention of CymMV, ORSV, and CymRSV.Type: ApplicationFiled: January 1, 2024Publication date: April 25, 2024Applicants: FLOWER RESEARCH INSTITUTE OF YUNNAN ACADEMY OF AGRICULTURAL SCIENCES, YUNNAN UNIVERSITYInventors: Lihua Wang, Aiqing Sun, Xuewei Wu, Suping Qu, Yiping Zhang, Xiumei Yang, Yan Su, Feng Xu, Lifang Zhang
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Publication number: 20240071919Abstract: A microelectronic device includes a stack structure comprising blocks separated from one another by dielectric slot structures and each including a vertically alternating sequence of conductive structures and insulative structures arranged in tiers. At least one of the blocks comprising a stadium structure comprising opposing staircase structures each having steps comprising edges of the tiers; and a filled trench vertically overlying and within horizontal boundaries of the stadium structure of the at least one of the blocks. The filled trench includes a dielectric liner material on the opposing staircase structures of the stadium structure and on inner sidewalls of the two bridge regions and at least one dielectric structure doped with one or more of carbon and boron on the dielectric liner material, the at least one dielectric structure horizontally overlapping the steps of the stadium structure.Type: ApplicationFiled: August 30, 2022Publication date: February 29, 2024Inventors: Mohad Baboli, Yiping Wang, Xiao Li, Lifang Xu, John M. Meldrim, Jivaan Kishore Jhothiraman, Shuangqiang Luo
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Publication number: 20150198434Abstract: A method for measuring critical dimension of semiconductor, includes: acquiring a plurality of measured spectra for signals scattered from a wafer to be measured; determining an average measured spectrum of the plurality of measured spectra; determining a plurality of mean square error (MSE) values each between a corresponding one of the plurality of measured spectra and the average measured spectrum, and defining the one of the plurality of measured spectra corresponding to a maximum one of the plurality of MSE values as a farthest measured spectrum; determining a spectrum matching range including a plurality of library spectra in a spectral library, based on the average measured spectrum and the farthest measured spectrum; and matching the plurality of measured spectra with the library spectra in the spectrum matching range, to determine one or more values of one or more parameters, respectively, for a structure on the wafer.Type: ApplicationFiled: January 12, 2015Publication date: July 16, 2015Inventors: Huiping CHEN, Yaoming SHI, Yiping XU
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Publication number: 20110125458Abstract: Before the diffraction from a diffracting structure on a semiconductor wafer is measured, where necessary, the film thickness and index of refraction of the films underneath the structure are first measured using spectroscopic reflectometry or spectroscopic ellipsometry. A rigorous model is then used to calculate intensity or ellipsometric signatures of the diffracting structure. The diffracting structure is then measured using a spectroscopic scatterometer using polarized and broadband radiation to obtain an intensity or ellipsometric signature of the diffracting structure. Such signature is then matched with the signatures in the database to determine the grating shape parameters of the structure.Type: ApplicationFiled: December 7, 2010Publication date: May 26, 2011Applicant: KLA-Tencor CorporationInventors: YIPING XU, IBRAHIM ABDULHALM
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Patent number: 7898661Abstract: Before the diffraction from a diffracting structure on a semiconductor wafer is measured, where necessary, the film thickness and index of refraction of the films underneath the structure are first measured using spectroscopic reflectometry or spectroscopic ellipsometry. A rigorous model is then used to calculate intensity or ellipsometric signatures of the diffracting structure. The diffracting structure is then measured using a spectroscopic scatterometer using polarized and broadband radiation to obtain an intensity or ellipsometric signature of the diffracting structure. Such signature is then matched with the signatures in the database to determine the grating shape parameters of the structure.Type: GrantFiled: December 18, 2009Date of Patent: March 1, 2011Assignee: KLA-Tencor CorporationInventors: Yiping Xu, Ibrahim Abdulhalm
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Patent number: 7859659Abstract: Before the diffraction from a diffracting structure on a semiconductor wafer is measured, where necessary, the film thickness and index of refraction of the films underneath the structure are first measured using spectroscopic reflectometry or spectroscopic ellipsometry. A rigorous model is then used to calculate intensity or ellipsometric signatures of the diffracting structure. The diffracting structure is then measured using a spectroscopic scatterometer using polarized and broadband radiation to obtain an intensity or ellipsometric signature of the diffracting structure. Such signature is then matched with the signatures in the database to determine the grating shape parameters of the structure.Type: GrantFiled: December 21, 2006Date of Patent: December 28, 2010Assignee: KLA-Tencor CorporationInventors: Yiping Xu, Ibrahim Abdulhalm
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Publication number: 20100165340Abstract: Before the diffraction from a diffracting structure on a semiconductor wafer is measured, where necessary, the film thickness and index of refraction of the films underneath the structure are first measured using spectroscopic reflectometry or spectroscopic ellipsometry. A rigorous model is then used to calculate intensity or ellipsometric signatures of the diffracting structure. The diffracting structure is then measured using a spectroscopic scatterometer using polarized and broadband radiation to obtain an intensity or ellipsometric signature of the diffracting structure. Such signature is then matched with the signatures in the database to determine the grating shape parameters of the structure.Type: ApplicationFiled: December 18, 2009Publication date: July 1, 2010Applicant: KLA-Tencor Technologies CorporationInventors: Yiping Xu, Ibrahim Abdulhalm
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Publication number: 20070091327Abstract: Before the diffraction from a diffracting structure on a semiconductor wafer is measured, where necessary, the film thickness and index of refraction of the films underneath the structure are first measured using spectroscopic reflectometry or spectroscopic ellipsometry. A rigorous model is then used to calculate intensity or ellipsometric signatures of the diffracting structure. The diffracting structure is then measured using a spectroscopic scatterometer using polarized and broadband radiation to obtain an intensity or ellipsometric signature of the diffracting structure. Such signature is then matched with the signatures in the database to determine the grating shape parameters of the structure.Type: ApplicationFiled: December 21, 2006Publication date: April 26, 2007Inventors: Yiping Xu, Ibrahim Abdulhalim
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Patent number: 7173699Abstract: Before the diffraction from a diffracting structure on a semiconductor wafer is measured, where necessary, the film thickness and index of refraction of the films underneath the structure are first measured using spectroscopic reflectometry or spectroscopic ellipsometry. A rigorous model is then used to calculate intensity or ellipsometric signatures of the diffracting structure. The diffracting structure is then measured using a spectroscopic scatterometer using polarized and broadband radiation to obtain an intensity or ellipsometric signature of the diffracting structure. Such signature is then matched with the signatures in the database to determine the grating shape parameters of the structure.Type: GrantFiled: September 20, 2002Date of Patent: February 6, 2007Assignee: KLA-Tencor Technologies CorporationInventors: Yiping Xu, Ibrahim Abdulhalim
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Patent number: 6590656Abstract: Before the diffraction from a diffracting structure on a semiconductor wafer is measured, where necessary, the film thickness and index of refraction of the films underneath the structure are first measured using spectroscopic reflectometry or spectroscopic ellipsometry. A rigorous model is then used to calculate intensity or ellipsometric signatures of the diffracting structure. The diffracting structure is then measured using a spectroscopic scatterometer using polarized and broadband radiation to obtain an intensity or ellipsometric signature of the diffracting structure. Such signature is then matched with the signatures in the database to determine the grating shape parameters of the structure.Type: GrantFiled: September 21, 2001Date of Patent: July 8, 2003Assignee: KLA-Tencor CorporationInventors: Yiping Xu, Ibrahim Abdulhalim
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Publication number: 20030058443Abstract: Before the diffraction from a diffracting structure on a semiconductor wafer is measured, where necessary, the film thickness and index of refraction of the films underneath the structure are first measured using spectroscopic reflectometry or spectroscopic ellipsometry. A rigorous model is then used to calculate intensity or ellipsometric signatures of the diffracting structure. The diffracting structure is then measured using a spectroscopic scatterometer using polarized and broadband radiation to obtain an intensity or ellipsometric signature of the diffracting structure. Such signature is then matched with the signatures in the database to determine the grating shape parameters of the structure.Type: ApplicationFiled: September 20, 2002Publication date: March 27, 2003Inventors: Yiping Xu, Ibrahim Abdulhalim
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Patent number: 6483580Abstract: Before the diffraction from a diffracting structure on a semiconductor wafer is measured, where necessary, the film thickness and index of refraction of the films underneath the structure are first measured using spectroscopic reflectometry or spectroscopic ellipsometry. A rigorous model is then used to calculate intensity or ellipsometric signatures of the diffracting structure. The diffracting structure is then measured using a spectroscopic scatterometer using polarized and broadband radiation to obtain an intensity or ellipsometric signature of the diffracting structure. Such signature is then matched with the signatures in the database to determine the grating shape parameters of the structure.Type: GrantFiled: March 6, 1998Date of Patent: November 19, 2002Assignee: KLA-Tencor Technologies CorporationInventors: Yiping Xu, Ibrahim Abdulhalim
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Publication number: 20020033945Abstract: Before the diffraction from a diffracting structure on a semiconductor wafer is measured, where necessary, the film thickness and index of refraction of the films underneath the structure are first measured using spectroscopic reflectometry or spectroscopic ellipsometry. A rigorous model is then used to calculate intensity or ellipsometric signatures of the diffracting structure. The diffracting structure is then measured using a spectroscopic scatterometer using polarized and broadband radiation to obtain an intensity or ellipsometric signature of the diffracting structure. Such signature is then matched with the signatures in the database to determine the grating shape parameters of the structure.Type: ApplicationFiled: September 21, 2001Publication date: March 21, 2002Inventors: Yiping Xu, Ibrahim Abdulhalim
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Patent number: 6358014Abstract: Increased impact resistance capability is achieved in a cost and weight efficient manner by providing a spinner made of a 3-D orthogonal woven composite material. The spinner defines a generally conical shell having a plurality of axial rib stiffeners and at least one circumferential rib stiffener integrally formed thereon. The combination of the integral rib stiffeners with the 3-D orthogonal woven composite material results in a substantially greater torsional stiffness. The use of the 3-D orthogonal woven composite material also eliminates delamination found in laminated composite spinners.Type: GrantFiled: March 24, 2000Date of Patent: March 19, 2002Assignee: General Electric CompanyInventors: Chen-Yu J. Chou, Gerald A. Pauley, Yiping Xu
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Patent number: 5555471Abstract: The film thickness and surface profile of a test sample consisting of optically dissimilar regions are measured by phase-shifting interferometry. Conventional phase-shifting interferometry at a given wavelength is performed to measure the step height between two regions of the surface. The theoretical measured step height as a function of the film thickness is then calculated. A set of possible solutions corresponding to the experimentally measured-height are found numerically or graphically by searching the theoretically generated function at the measured height. If more than one solution exists, the phase-shifting procedure is repeated at a different wavelength and a new theoretical measured-height as a function of the film thickness is calculated for the optical parameters of the materials at the new wavelength, yielding another set of possible solutions that correspond to the newly measured height. The number of repetitions of the procedure depends on the number of unknowns of the test sample.Type: GrantFiled: May 24, 1995Date of Patent: September 10, 1996Assignee: Wyko CorporationInventors: Yiping Xu, Yuan J. Li
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Patent number: 5321497Abstract: A method and system are described for performing phase unwrapping integrations in a phase-shifting interferometric profiling operation. The disclosed technique uses one characteristic of modulation or slope distributions to segment the modulation or slope histogram into a plurality of sections. The principal phase values are divided into a plurality of groups in accordance with corresponding modulation or slope histogram sections. The phase unwrapping integrations are performed in such an order that the areas with a high probability of containing a 2.pi. discontinuity are contained in the last group integrated. Thus, inaccuracies due to 2.pi. discontinuities do not "propagate" to earlier-computed phase values computed by the phase unwrapping algorithm.Type: GrantFiled: March 9, 1992Date of Patent: June 14, 1994Assignee: Wyko CorporationInventors: Chiayu Ai, Yiping Xu