Abstract: The present disclosure discloses a manufacturing method for an array substrate and an array substrate. The method includes: forming a gate electrode, a gate insulating layer, a semiconductor layer, a source drain electrode layer and a photoresist layer on a substrate; patterning the photoresist layer to form a patterned photoresist layer; performing at least one wet etching on the source drain electrode layer and performing at least one dry etching on the semiconductor layer; performing an ashing processing between the steps of the wet etching and the dry etching. A ratio of a lateral etching rate to a longitudinal etching rate in the at least one ashing processing ranges from 1:0.9 to 1:1.5.

Abstract: The present disclosure discloses a manufacturing method for an array substrate and an array substrate. The method includes: forming a gate electrode, a gate insulating layer, a semiconductor layer, a source drain electrode layer and a photoresist layer on a substrate; patterning the photoresist layer to form a patterned photoresist layer; performing at least one wet etching on the source drain electrode layer and performing at least one dry etching on the semiconductor layer; performing an ashing processing between the steps of the wet etching and the dry etching. A ratio of a lateral etching rate to a longitudinal etching rate in the at least one ashing processing ranges from 1:0.9 to 1:1.5.

Abstract: A display panel and a display device are provided. The display panel includes a substrate; a first metal layer disposed on the substrate; an insulating layer disposed on the first metal layer; a semiconductor layer disposed on the insulating layer and including a germanium-doped semiconductor compound; and a second metal layer disposed on the semiconductor layer. A mobility of the semiconductor compound is greater than a mobility of amorphous silicon.

Abstract: A display panel and a display device are provided. The display panel includes a substrate; a first metal layer disposed on the substrate; an insulating layer disposed on the first metal layer; a semiconductor layer disposed on the insulating layer and including a germanium-doped semiconductor compound; and a second metal layer disposed on the semiconductor layer. A mobility of the semiconductor compound is greater than a mobility of amorphous silicon.

Abstract: A display panel and a manufacturing method of a display panel are provided. The manufacturing method of a display panel includes: forming the nanoporous silicon oxide material on a substrate to form a nanoporous silicon oxide layer; forming the amorphous silicon material on the nanoporous silicon oxide layer to form an amorphous silicon layer; irradiating the amorphous silicon layer by a laser to crystallize the amorphous silicon layer to form a polycrystalline silicon layer; forming the gate oxide material on the polycrystalline silicon layer to form a gate oxide layer.

Abstract: A display panel and a display apparatus are provided. The display panel includes: a substrate; multiple first-layer wires disposed on the substrate; and an insulating dielectric layer disposed on the first-layer wires. A dielectric constant of the insulating dielectric layer is higher than dielectric constants of silicon oxide layer and silicon nitride layer. The insulating dielectric layer includes a composition. The composition includes a first component and a second component. A dielectric constant of the first component is lower than the dielectric constants of silicon oxide layer and silicon nitride layer. A dielectric constant of the second component is higher than the dielectric constants of silicon oxide layer and silicon nitride layer.

Abstract: A display panel and a manufacturing method are provided. The display panel includes a substrate, multiple active switches disposed on the substrate and a low dielectric constant protective layer. The low dielectric constant protective layer is formed on the numerous active switches. A relative dielectric constant of the low dielectric constant protective layer is smaller than a relative dielectric constant of silicon nitride.

Abstract: A display panel, a method of manufacturing a display panel, and a display device are provided. The display panel includes an array substrate and a color filter layer on the array substrate. The array substrate includes a display region and a non-display region. The display region includes a photo-sensor.

Abstract: A display panel comprises a substrate, a plurality of thin film transistors arranged on the substrate, a passivation layer disposed on the substrate and covering the plurality of thin film transistors, a pixel definition layer disposed on the passivation layer and configured to enable a plurality of light emitting elements to be disposed therein, a planarization layer disposed between the passivation layer and the pixel definition layer and having a groove structure, a color filter layer disposed between the passivation layer and the planarization layer and corresponding to the location of the groove structure, and a transparent electrode layer disposed on the planarization layer and covering the groove structure. Wherein the plurality of light emitting elements are disposed in the groove structure of the planarization layer and is aligned to the location of the color filter layer.

Abstract: A display panel and a manufacturing method of a display panel are provided. The manufacturing method of a display panel includes: forming the nanoporous silicon oxide material on a substrate to form a nanoporous silicon oxide layer; forming the amorphous silicon material on the nanoporous silicon oxide layer to form an amorphous silicon layer; irradiating the amorphous silicon layer by a laser to crystallize the amorphous silicon layer to form a polycrystalline silicon layer; forming the gate oxide material on the polycrystalline silicon layer to form a gate oxide layer.

Abstract: A display panel, a method of manufacturing a display panel, and a display device are provided. The display panel includes an array substrate and a color filter layer on the array substrate. The array substrate includes a display region and a non-display region. The display region includes a photo-sensor.

Abstract: A display panel and a display apparatus are provided. The display panel includes: a substrate; multiple first-layer wires disposed on the substrate; and an insulating dielectric layer disposed on the first-layer wires. A dielectric constant of the insulating dielectric layer is higher than dielectric constants of silicon oxide layer and silicon nitride layer. The insulating dielectric layer includes a composition. The composition includes a first component and a second component. A dielectric constant of the first component is lower than the dielectric constants of silicon oxide layer and silicon nitride layer. A dielectric constant of the second component is higher than the dielectric constants of silicon oxide layer and silicon nitride layer.

Abstract: A display panel and a manufacturing method are provided. The display panel includes a substrate, multiple active switches disposed on the substrate and a low dielectric constant protective layer. The low dielectric constant protective layer is formed on the numerous active switches. A relative dielectric constant of the low dielectric constant protective layer is smaller than a relative dielectric constant of silicon nitride.