Abstract: A method for atomic layer etching a metal containing layer is provided. At least a region of a surface of the metal containing layer is modified to form a modified metal containing region by exposing a surface of the metal containing layer to a modification gas, wherein adjacent to the modified metal containing region remains an unmodified metal containing region. The modified metal containing region is selectively removed with respect to the unmodified metal containing region by exposing the surface of the metal containing layer to an inert bombardment plasma generated from an inert gas.

Abstract: A method for etching a metal containing material is provided. The metal containing material is exposed to a halogen containing fluid or plasma to convert at least some of the metal containing material into a metal halide material. The metal halide material is exposed to a ligand containing fluid or plasma, wherein at least some of the metal halide material is formed into a metal halide ligand complex. At least some of the metal halide ligand complex is vaporized.

Abstract: A method for cleaning a plasma processing chamber comprising one or more cycles is provided. Each cycle comprises performing an oxygen containing plasma cleaning phase, performing a volatile chemistry type residue cleaning phase, and performing a fluorine containing plasma cleaning phase.

Abstract: The invention discloses a micro hydraulic suspension mechanical pump structure and an assembling method thereof. The hydraulic suspension micro pump includes a volute, an upper end cap, a positioning sheet, an impeller, a hollow cup motor, a waterproof cover, and a rotor. The hollow cup motor includes a motor casing, a motor bottom cap, a magnet rotor, a coil, and an iron core. The waterproof cover is in a separated state from the motor, and a lower part has a positioning boss to implement radial cooperation with a recess at a corresponding position of the motor. At the same time, there is the sheet between the recess and the boss to implement axial positioning of the waterproof cover.

Abstract: The invention discloses a micro hydraulic suspension mechanical pump structure and an assembling method thereof. The hydraulic suspension micro pump includes a volute, an upper end cap, a positioning sheet, an impeller, a hollow cup motor, a waterproof cover, and a rotor. The hollow cup motor includes a motor casing, a motor bottom cap, a magnet rotor, a coil, and an iron core. The waterproof cover is in a separated state from the motor, and a lower part has a positioning boss to implement radial cooperation with a recess at a corresponding position of the motor. At the same time, there is the sheet between the recess and the boss to implement axial positioning of the waterproof cover.

Abstract: A method is provided. A substrate situated in a chamber is exposed to a halogen-containing gas comprising an element selected from the group consisting of silicon, germanium, carbon, titanium, and tin, and igniting a plasma to modify a surface of the substrate and form a modified surface.

Abstract: Development of resists are useful, for example, to form a patterning mask in the context of high-resolution patterning. Development can be accomplished using a halide-containing chemistry such as a hydrogen halide. A metal-containing resist film may be deposited on a semiconductor substrate using a dry or wet deposition technique. The resist film may be an EUV-sensitive organo-metal oxide or organo-metal-containing thin film resist. After exposure, the photopatterned metal-containing resist is developed using wet or dry development.

Abstract: A method for atomic layer etching a metal containing layer is provided. At least a region of a surface of the metal containing layer is modified to form a modified metal containing region by exposing a surface of the metal containing layer to a modification gas, wherein adjacent to the modified metal containing region remains an unmodified metal containing region. The modified metal containing region is selectively removed with respect to the unmodified metal containing region by exposing the surface of the metal containing layer to an inert bombardment plasma generated from an inert gas.