Abstract: Methods of manufacturing and processing semiconductor devices (i.e., electronic devices) are described. The methods include treating a surface of a metal gate stack with a radical treatment. The radical treatment may be used to treat one or more layers or surfaces of layers in the metal gate stack. The radical treatment may be performed once or multiple times during the methods described herein. The radical treatment comprises flowing one or more of nitrogen radicals (N2*) and hydrogen radicals (H*) over the surface of the metal gate stack.

Abstract: A method comprising providing a carbonaceous material, the substrate having a first thermal conductivity. The method further comprises depositing a first masking layer having a second thermal conductivity on at least a portion of the substrate, a ratio of the second thermal conductivity to the first thermal conductivity being less than or equal to 1:30. The method further comprises depositing a second masking layer on the first masking layer to form an etch mask, and etching an exposed portion of the substrate.

Abstract: An integrated circuit (IC) includes a transistor, and a first layer including electrically conductive material. In an example, the first layer is conductively coupled to the transistor. The IC further includes a second layer including electrically conductive material above the first layer. The IC further includes one or more intervening layers between the first and second layers. In an example, the one or more intervening layers include at least a third layer, wherein the third layer includes (i) a first metal, (ii) oxygen, and (iii) one or both of a second metal or an oxide thereof within the third layer. In an example, the first layer, the second layer, and the one or more intervening layers form a metal-insulator-metal (MIM) capacitor. In an example, the MIM capacitor and the transistor, in combination, form a memory cell of a dynamic random access memory (DRAM) array.

Abstract: A method comprising providing a carbonaceous material, the substrate having a first thermal conductivity. The method further comprises depositing a first masking layer having a second thermal conductivity on at least a portion of the substrate, a ratio of the second thermal conductivity to the first thermal conductivity being less than or equal to 1:30. The method further comprises depositing a second masking layer on the first masking layer to form an etch mask, and etching an exposed portion of the substrate.

Abstract: A method of acquiring data and performing calculations on the data using a provider service. A provider ticket service (PTS) receives tickets from one or more clients. Each ticket includes a calculation identifier and a payload. The calculation identifier identifies a calculation to be performed using information in the payload. The PTS associates a unique ticket identifier with each ticket. A ticket manager submits a selected ticket from the PTS to a provider host service (PHS), which determines which provider is to perform the calculation identified by the selected ticket by inspecting provider identification information in the selected ticket. The PHS launches a provider host thread (PHT) that invokes the provider determined to perform the calculation identified by the calculation identifier of the selected ticket. The provider performs the calculation and returns its result to the PHS, which passes the result back to the PTS, which returns the result to the requesting client.

Abstract: A method of acquiring data and performing calculations on the data using a provider service. A provider ticket service (PTS) receives tickets from one or more clients. Each ticket includes a calculation identifier and a payload. The calculation identifier identifies a calculation to be performed using information in the payload. The PTS associates a unique ticket identifier with each ticket. A ticket manager submits a selected ticket from the PTS to a provider host service (PHS), which determines which provider is to perform the calculation identified by the selected ticket by inspecting provider identification information in the selected ticket. The PHS launches a provider host thread (PHT) that invokes the provider determined to perform the calculation identified by the calculation identifier of the selected ticket. The provider performs the calculation and returns its result to the PHS, which passes the result back to the PTS, which returns the result to the requesting client.