Patents by Inventor Yixuan WU

Yixuan WU has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220401592
    Abstract: Poly(amidoamine) [PAMAM] dendrimers for use as PSMA-targeted contrast agents for optical and photoacoustic imaging (PA) and theranostic agents for treating prostate cancer are disclosed.
    Type: Application
    Filed: May 13, 2022
    Publication date: December 22, 2022
    Inventors: Martin G. Pomper, Wojciech Lesniak, Emad Boctor, Sangeeta Banerjee Ray, Srikanth Boinapally, Jeeun Kang, Yixuan Wu
  • Patent number: 10685839
    Abstract: There is provided a method for implementing and regulating patterning of a graphene film by ultraviolet photo-oxidation, including: implementing patterning of a graphene film micron structure pattern by using a xenon lamp excimer ultraviolet photo-oxidation vacuum apparatus and a hard mask; 2: controlling oxygen excitons, by applying a non-uniform magnetic field on the surface of the graphene film in a vertical direction, to move toward the graphene film in a direction of a magnetic field, so as to enhance the directivity of etching to the graphene film in the vertical direction, thereby improving patterning quality of the graphene film with micron-structure; and (3) by adjusting the intensity and direction of the magnetic field moving direction of the oxygen excitons is controlled, and the shape of the etched pattern structure of the graphene film is controlled, and thus controlling the patterning of the graphene film may be achieved.
    Type: Grant
    Filed: October 18, 2016
    Date of Patent: June 16, 2020
    Assignee: SHANGHAI JIAO TONG UNIVERSITY
    Inventors: Haihua Tao, Xianfeng Chen, Yixuan Wu, Shubin Su, Huan Yue, Hao Li
  • Publication number: 20190287803
    Abstract: There is provided a method for implementing and regulating patterning of a graphene film by ultraviolet photo-oxidation, including: implementing patterning of a graphene film micron structure pattern by using a xenon lamp excimer ultraviolet photo-oxidation vacuum apparatus and a hard mask; 2: controlling oxygen excitons, by applying a non-uniform magnetic field on the surface of the graphene film in a vertical direction, to move toward the graphene film in a direction of a magnetic field, so as to enhance the directivity of etching to the graphene film in the vertical direction, thereby improving patterning quality of the graphene film with micron-structure; and (3) by adjusting the intensity and direction of the magnetic field moving direction of the oxygen excitons is controlled, and the shape of the etched pattern structure of the graphene film is controlled, and thus controlling the patterning of the graphene film may be achieved.
    Type: Application
    Filed: October 18, 2016
    Publication date: September 19, 2019
    Inventors: Haihua TAO, Xianfeng CHEN, Yixuan WU, Shubin SU, Huan YUE, Hao LI
  • Patent number: 10002711
    Abstract: The present disclosure generally relates to capacitors having a multilayer dielectric material between two electrodes. The multilayer dielectric material can have a small thickness with little to no breakdown strength reduction. By utilizing a multilayer dielectric structure in a capacitor, not only can the breakdown strength remain at an acceptable level, but the collective thickness of the capacitor may be reduced to accommodate the higher density pixels for display devices or any device that utilizes a capacitor.
    Type: Grant
    Filed: December 15, 2015
    Date of Patent: June 19, 2018
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Dapeng Wang, Yixuan Wu, Gaku Furuta, Tae Kyung Won, Beom Soo Park
  • Publication number: 20160240312
    Abstract: The present disclosure generally relates to capacitors having a multilayer dielectric material between two electrodes. The multilayer dielectric material can have a small thickness with little to no breakdown strength reduction. By utilizing a multilayer dielectric structure in a capacitor, not only can the breakdown strength remain at an acceptable level, but the collective thickness of the capacitor may be reduced to accommodate the higher density pixels for display devices or any device that utilizes a capacitor.
    Type: Application
    Filed: December 15, 2015
    Publication date: August 18, 2016
    Inventors: Dapeng WANG, Yixuan WU, Gaku FURUTA, Tae Kyung WON, Beom Soo PARK