Patents by Inventor Yi-Yi Wang

Yi-Yi Wang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Semiconductor structure having contact structure
    Patent number: 11942425
    Abstract: The present disclosure provides a semiconductor structure. The semiconductor structure includes a semiconductor substrate, a contact structure, a first conductive element, and a first dielectric spacer structure. The semiconductor substrate includes an active region and an isolation structure. The contact structure is on the active region of the semiconductor substrate. The first conductive element is on the isolation structure of the semiconductor substrate. The first dielectric spacer structure is between the contact structure and the first to conductive element. The first dielectric spacer structure has a first concave surface facing the first conductive element.
    Type: Grant
    Filed: April 19, 2022
    Date of Patent: March 26, 2024
    Assignee: NANYA TECHNOLOGY CORPORATION
    Inventors: Chih-Ying Tsai, Jui-Seng Wang, Yi-Yi Chen
  • Rules-based grammar for slots and statistical model for preterminals in natural language understanding system
    Patent number: 7603267
    Abstract: A NLU system includes a rules-based grammar for slots in a schema and a statistical model for preterminals. A training system is also provided.
    Type: Grant
    Filed: May 1, 2003
    Date of Patent: October 13, 2009
    Assignee: Microsoft Corporation
    Inventors: Yi-Yi Wang, Alejandro Acero