Patents by Inventor Yo Chul Jang

Yo Chul Jang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Binder composition for negative electrode, negative electrode, and secondary battery
    Patent number: 12237512
    Abstract: Disclosed is a binder composition for a negative electrode which includes a binder polymer containing at least one first functional group selected from the group consisting of a hydroxy group and a carboxyl group, and a crosslinked polymer containing at least one second functional group selected from the group consisting of an amino group and an isocyanate group, wherein the crosslinked polymer is present in an amount of 1.5 parts by weight to 8.5 parts by weight based on 100 parts by weight of the binder polymer.
    Type: Grant
    Filed: December 22, 2020
    Date of Patent: February 25, 2025
    Assignee: LG ENERGY SOLUTION, LTD.
    Inventors: Yo Han Kwon, Joonwon Lim, Min Chul Jang, Sun Kyu Kim
  • Plasma stabilization method and deposition method using the same
    Patent number: 9972490
    Abstract: A plasma stabilization method and a deposition method using the same are disclosed. The plasma stabilization method includes (a) supplying a source gas and (b) supplying a purge gas. The method may also include (c) supplying a reactive gas and (d) supplying plasma. The purge gas and the reactive gas are continuously supplied into a reactor during (a) through (d), and the plasma stabilization method is performed in a state where no substrate exists in the reactor.
    Type: Grant
    Filed: March 6, 2017
    Date of Patent: May 15, 2018
    Assignee: ASM IP Holding B.V.
    Inventors: Dong Seok Kang, Yo Chul Jang
  • PLASMA STABILIZATION METHOD AND DEPOSITION METHOD USING THE SAME
    Publication number: 20170263442
    Abstract: A plasma stabilization method and a deposition method using the same are disclosed. The plasma stabilization method includes (a) supplying a source gas and (b) supplying a purge gas. The method may also include (c) supplying a reactive gas and (d) supplying plasma. The purge gas and the reactive gas are continuously supplied into a reactor during (a) through (d), and the plasma stabilization method is performed in a state where no substrate exists in the reactor.
    Type: Application
    Filed: March 6, 2017
    Publication date: September 14, 2017
    Inventors: Dong Seok Kang, Yo Chul Jang