Abstract: Provided is a barrier seal for an electrostatic chuck in the plasma etching process. The barrier seal comprises multiple sealing portions to block the connecting layer of the electrostatic chuck and the plasma gas. The groove of the electrostatic chuck may be completely filled by the barrier seal. Even one of the multiple sealing portions is destroyed in the plasma etching process by the plasma gas, the barrier seal still prevents leaking of the electrostatic chuck effectively. The barrier seal provides a buffer period for engineers to replace the damaged barrier seal before the leaking occurs. Danger of leaking caused by abrupt breaking of the barrier seal is reduced. Furthermore, the barrier seal facilitates stability and safety of the plasma etching process. The yield of products manufactured by the electrostatic chuck may be improved.

Abstract: Provided are a method, a guiding sheet, a partial filling jig, and a full filling jig for installing an elastomer ring in the semiconductor processing equipment. The guiding sheet, the partial filling jig, and the full filling jig dispose the elastomer ring in the groove of the semiconductor processing equipment smoothly and evenly. Furthermore, the surface of the elastomer ring may be divided to multiple arcs portions. Each one of the arc portions may be pressed by the partial filling jig or the full filling jig in a particular sequence. When the groove is filled by the elastomer ring accurately and completely, the elastomer ring may block the fluid and the etching gas effectively. The elastomer ring may help the semiconductor processing equipment to work continuously and maintain qualities of the etching wafers.

Abstract: Provided is a barrier seal for an electrostatic chuck in the plasma etching process. The barrier seal comprises multiple sealing portions to block the connecting layer of the electrostatic chuck and the plasma gas. The groove of the electrostatic chuck may be completely filled by the barrier seal. Even one of the multiple sealing portions is destroyed in the plasma etching process by the plasma gas, the barrier seal still prevents leaking of the electrostatic chuck effectively. The barrier seal provides a buffer period for engineers to replace the damaged barrier seal before the leaking occurs. Danger of leaking caused by abrupt breaking of the barrier seal is reduced. Furthermore, the barrier seal facilitates stability and safety of the plasma etching process. The yield of products manufactured by the electrostatic chuck may be improved.

Abstract: Provided are a method, a guiding sheet, a partial filling jig, and a full filling jig for installing an elastomer ring in the semiconductor processing equipment. The guiding sheet, the partial filling jig, and the full filling jig dispose the elastomer ring in the groove of the semiconductor processing equipment smoothly and evenly. Furthermore, the surface of the elastomer ring may be divided to multiple arcs portions. Each one of the arc portions may be pressed by the partial filling jig or the full filling jig in a particular sequence. When the groove is filled by the elastomer ring accurately and completely, the elastomer ring may block the fluid and the etching gas effectively. The elastomer ring may help the semiconductor processing equipment to work continuously and maintain qualities of the etching wafers.