Patents by Inventor Yoav Berlatzky
Yoav Berlatzky has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240361253Abstract: A measurement system for use in measuring parameters of a patterned sample, the system including a broadband light source, an optical system configured as an interferometric system, a detection unit, and a control unit, where the interferometric system defines illumination and detection channels having a sample arm and a reference arm having a reference reflector, and is configured for inducing an optical path difference between the sample and reference arms, the detection unit for detecting a combined light beam formed by a light beam reflected from the reflector and a light beam propagating from a sample's support, and generating measured data indicative of spectral interference pattern formed by spectral interference signatures, and the control unit for receiving the measured data and applying a model-based processing to the spectral interference pattern for determining one or more parameters of the pattern in the sample.Type: ApplicationFiled: March 4, 2024Publication date: October 31, 2024Applicant: NOVA LTD.Inventors: Gilad BARAK, DANNY GROSSMAN, Dror SHAFIR, YOAV BERLATZKY, Yanir HAINICK
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Publication number: 20230177655Abstract: There are provided systems and methods for digital optical aberration correction and spectral imaging. An optical system may comprise an optical imaging unit, to form an optical image near an image plane of the optical system; a wavefront imaging sensor unit located near the image plane, to provide raw digital data on an optical field and image output near the image plane; and a control unit for processing the raw digital data and the image output to provide deblurred image output, wherein the control unit comprises a storage unit that stores instructions and a processing unit to execute the instructions to receive the image input and the raw digital data of the optical field impinging on the wavefront imaging sensor and generate a deblurred image based on an analysis of the optical mutual coherence function at the imaging plane.Type: ApplicationFiled: May 12, 2021Publication date: June 8, 2023Inventors: Yoav Berlatzky, Yanir Hainick
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Publication number: 20230029930Abstract: There are provided systems and methods for imaging, measuring an object, and characterizing a sample. An optical, speckle-based imaging system may comprise an illumination unit comprising at least one coherent light source to illuminate a sample; a collection unit for collecting input light from the sample, the collection unit consisting of an imaging optics and a wavefront imaging sensor; and a control unit coupled to the illumination unit and the collection unit for analyzing the input light and generating a speckle wavefront image, wherein the at least one coherent light source is to generate primary speckles in the sample or thereon, and the imaging optics is to capture a secondary speckle pattern induced by the illumination unit in the sample or thereon.Type: ApplicationFiled: January 13, 2021Publication date: February 2, 2023Inventors: Yoav Berlatzky, Yanir Hainick
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Patent number: 11385188Abstract: A system that may include a radiation source to generate a beam of coherent radiation; traveling lens optics to focus the beam to generate multiple spots on a surface of a sample and to scan the spots together over the surface; collection optics to collect the radiation scattered from the multiple spots and to focus the collected radiation to generate a pattern of interference fringes; and a detection unit to detect changes in the pattern of interference fringes.Type: GrantFiled: August 19, 2019Date of Patent: July 12, 2022Assignee: APPLIED MATERIAL ISRAEL, LTD.Inventors: Amir Shoham, Yoav Berlatzky, Haim Feldman
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Patent number: 11293806Abstract: An optical detection system for detecting data on the optical mutual coherence function of input field. The system comprising an encoder having similar unit cells, and an array of sensor cells located at a distance downstream of said unit cells with respect to a general direction of propagation of input light. The array defines a plurality of sub-array unit cells, each sub-array corresponding to a unit cell of the encoder, and each sub-array comprising a predetermined number M of sensor elements. The encoder applies predetermined modulation to input light collected by the system, such that each unit cell of said encoder directs a portion of the collected input light incident thereon onto sub-array unit cell corresponding therewith and one or more neighboring sub-array unit cells within a predetermined proximity region. The number M is determined in accordance with a predetermined number of sub-arrays unit cells within the proximity region.Type: GrantFiled: February 7, 2018Date of Patent: April 5, 2022Assignee: PXE COMPUTATIONAL IMAGIMG LTDInventor: Yoav Berlatzky
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Publication number: 20210364451Abstract: A measurement system for use in measuring parameters of a patterned sample, the system including a broadband light source, an optical system configured as an interferometric system, a detection unit, and a control unit, where the interferometric system defines illumination and detection channels having a sample arm and a reference arm having a reference reflector, and is configured for inducing an optical path difference between the sample and reference arms, the detection unit for detecting a combined light beam formed by a light beam reflected from the reflector and a light beam propagating from a sample's support, and generating measured data indicative of spectral interference pattern formed by spectral interference signatures, and the control unit for receiving the measured data and applying a model-based processing to the spectral interference pattern for determining one or more parameters of the pattern in the sample.Type: ApplicationFiled: June 6, 2021Publication date: November 25, 2021Applicant: NOVA MEASURING INSTRUMENTS LTD.Inventors: Gilad BARAK, Danny GROSSMAN, Dror SHAFIR, Yoav BERLATZKY, Yanir HAINICK
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Patent number: 11029258Abstract: A measurement system for use in measuring parameters of a patterned sample, the system including a broadband light source, an optical system configured as an interferometric system, a detection unit, and a control unit, where the interferometric system defines illumination and detection channels having a sample arm and a reference arm having a reference reflector, and is configured for inducing an optical path difference between the sample and reference arms, the detection unit for detecting a combined light beam formed by a light beam reflected from the reflector and a light beam propagating from a sample's support, and generating measured data indicative of spectral interference pattern formed by spectral interference signatures, and the control unit for receiving the measured data and applying a model-based processing to the spectral interference pattern for determining one or more parameters of the pattern in the sample.Type: GrantFiled: December 24, 2018Date of Patent: June 8, 2021Assignee: NOVA MEASURING INSTRUMENTS LTD.Inventors: Gilad Barak, Danny Grossman, Dror Shafir, Yoav Berlatzky, Yanir Hainick
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Publication number: 20200278257Abstract: An optical detection system for detecting data on the optical mutual coherence function of input field. The system comprising an encoder having similar unit cells, and an array of sensor cells located at a distance downstream of said unit cells with respect to a general direction of propagation of input light. The array defines a plurality of sub-array unit cells, each sub-array corresponding to a unit cell of the encoder, and each sub-array comprising a predetermined number M of sensor elements. The encoder applies predetermined modulation to input light collected by the system, such that each unit cell of said encoder directs a portion of the collected input light incident thereon onto sub-array unit cell corresponding therewith and one or more neighboring sub-array unit cells within a predetermined proximity region. The number M is determined in accordance with a predetermined number of sub-arrays unit cells within the proximity region.Type: ApplicationFiled: February 7, 2018Publication date: September 3, 2020Inventor: Yoav Berlatzky
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Patent number: 10739277Abstract: A measurement system is presented for use in metrology measurements on patterned samples. The system comprises: at least one light source device configured to generate broadband light, at least one detection device configured to provide spectral information of detected light, and an optical system. The optical system comprises at least an oblique channel system for directing incident light generated by the light source(s) along an oblique illumination channel onto a measurement plane, on which a sample is to be located, and directing broadband light specularly reflected from the sample along a collection channel to the detection device(s). The optical system further comprises an interferometric unit comprising a beam splitting/combining device and a reference reflector device.Type: GrantFiled: April 21, 2016Date of Patent: August 11, 2020Assignee: NOVA MEASURING INSTRUMENTS LTD.Inventors: Yoav Berlatzky, Valery Deich, Dror Shafir, Danny Grossman
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Patent number: 10386311Abstract: A system that may include a radiation source to generate a beam of coherent radiation; traveling lens optics to focus the beam so as to generate multiple spots on a surface of a sample and to scan the spots together over the surface; collection optics to collect the radiation scattered from the multiple spots and to focus the collected radiation so as to generate a pattern of interference fringes; and a detection unit to detect changes in the pattern of interference fringes.Type: GrantFiled: November 5, 2017Date of Patent: August 20, 2019Assignee: APPLIED MATERIALS ISRAEL, LTD.Inventors: Amir Shoham, Yoav Berlatzky, Haim Feldman
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Publication number: 20190154594Abstract: A measurement system for use in measuring parameters of a patterned sample, the system including a broadband light source, an optical system configured as an interferometric system, a detection unit, and a control unit, where the interferometric system defines illumination and detection channels having a sample arm and a reference arm having a reference reflector, and is configured for inducing an optical path difference between the sample and reference arms, the detection unit for detecting a combined light beam formed by a light beam reflected from the reflector and a light beam propagating from a sample's support, and generating measured data indicative of spectral interference pattern formed by spectral interference signatures, and the control unit for receiving the measured data and applying a model-based processing to the spectral interference pattern for determining one or more parameters of the pattern in the sample.Type: ApplicationFiled: December 24, 2018Publication date: May 23, 2019Inventors: GILAD BARAK, DANNY GROSSMAN, DROR SHAFIR, YOAV BERLATZKY, YANIR HAINICK
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Publication number: 20190128823Abstract: A measurement system is presented for use in metrology measurements on patterned samples. The system comprises: at least one light source device configured to generate broadband light, at least one detection device configured to provide spectral information of detected light, and an optical system. The optical system comprises at least an oblique channel system for directing incident light generated by the light source(s) along an oblique illumination channel onto a measurement plane, on which a sample is to be located, and directing broadband light specularly reflected from the sample along a collection channel to the detection device(s). The optical system further comprises an interferometric unit comprising a beam splitting/combining device and a reference reflector device.Type: ApplicationFiled: April 21, 2016Publication date: May 2, 2019Inventors: Yoav BERLATZKY, Valery DEICH, Dror SHAFIR, Danny GROSSMAN
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Patent number: 10161885Abstract: A measurement system for use in measuring parameters of a patterned sample is presented. The system comprises: a broadband light source; an optical system configured as an interferometric system; a detection unit; and a control unit. The interferometric system defines illumination and detection channels having a sample arm and a reference arm comprising a reference reflector, and is configured for inducing an optical path difference between the sample and reference arms; the detection unit comprises a configured and operable for detecting a combined light beam formed by a light beam reflected from said reflector and a light beam propagating from a sample's support, and generating measured data indicative of spectral interference pattern formed by at least two spectral interference signatures. The control unit is configured and operable for receiving the measured data and applying a model-based processing to the spectral interference pattern for determining one or more parameters of the pattern in the sample.Type: GrantFiled: April 12, 2015Date of Patent: December 25, 2018Assignee: NOVA MEASURING INSTRUMENTS LTD.Inventors: Gilad Barak, Danny Grossman, Dror Shafir, Yoav Berlatzky, Yanir Hainick
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Patent number: 9810643Abstract: A system that may include a radiation source to generate a beam of coherent radiation; traveling lens optics to focus the beam so as to generate multiple spots on a surface of a sample and to scan the spots together over the surface; collection optics to collect the radiation scattered from the multiple spots and to focus the collected radiation so as to generate a pattern of interference fringes; and a detection unit to detect changes in the pattern of interference fringes.Type: GrantFiled: September 25, 2013Date of Patent: November 7, 2017Assignee: APPLIED MATERIALS ISRAEL LTD.Inventors: Amir Shoham, Yoav Berlatzky, Haim Feldman
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Patent number: 9664907Abstract: A spatial beam shaper structure and a corresponding optical system are provided. The spatial beam shaper structure comprises a light collecting surface configured for affecting light impinging thereon to provide a substantially smooth light profile of at least one optical property, the light collecting surface having a pattern in the form of multiple surface regions comprising regions of at least two different optical properties arranged in an alternating fashion, wherein an interface region between each two locally adjacent regions of the different optical properties has the at least two different optical properties, to provide substantially smooth transition of said different optical properties within the interface region.Type: GrantFiled: July 21, 2014Date of Patent: May 30, 2017Assignee: Applied Materials Israel Ltd.Inventors: Yoav Berlatzky, Seffi Sadeh, Ido Kofler, Haim Eder, Michael Rudman, Hagay Famini
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Publication number: 20170016835Abstract: A measurement system for use in measuring parameters of a patterned sample is presented. The system comprises: a broadband light source; an optical system configured as an interferometric system; a detection unit; and a control unit. The interferometric system defines illumination and detection channels having a sample arm and a reference arm comprising a reference reflector, and is configured for inducing an optical path difference between the sample and reference arms; the detection unit comprises a configured and operable for detecting a combined light beam formed by a light beam reflected from said reflector and a light beam propagating from a sample's support, and generating measured data indicative of spectral interference pattern formed by at least two spectral interference signatures. The control unit is configured and operable for receiving the measured data and applying a model-based processing to the spectral interference pattern for determining one or more parameters of the pattern in the sample.Type: ApplicationFiled: April 12, 2015Publication date: January 19, 2017Applicant: Nova Measuring Instruments Ltd.Inventors: Gilad BARAK, Danny GROSSMAN, Dror SHAFIR, Yoav BERLATZKY, Yanir HAINICK
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Patent number: 9354212Abstract: A method and an apparatus that may include optics that is arranged to illuminate a surface of a sample with radiation and to collect reflected radiation from the surface of the sample; wherein the optics includes a pupil that has multiple pupil segments that correspond to different angular regions of collection or illumination; and a detection module arranged to receive the reflected radiation and generate, for each pupil segment, pupil segment detection signals.Type: GrantFiled: January 7, 2014Date of Patent: May 31, 2016Assignee: APPLIED MATERIALS ISRAEL LTD.Inventors: Yoav Berlatzky, Amir Shoham, Ido Dolev
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Publication number: 20160018660Abstract: A spatial beam shaper structure and a corresponding optical system are provided. The spatial beam shaper structure comprises a light collecting surface configured for affecting light impinging thereon to provide a substantially smooth light profile of at least one optical property, the light collecting surface having a pattern in the form of multiple surface regions comprising regions of at least two different optical properties arranged in an alternating fashion, wherein an interface region between each two locally adjacent regions of the different optical properties has the at least two different optical properties, to provide substantially smooth transition of said different optical properties within the interface region.Type: ApplicationFiled: July 21, 2014Publication date: January 21, 2016Inventors: Yoav Berlatzky, Seffi Sadeh, Ido Kofler, Haim Eder, Michael Rudman, Hagay Famini
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Publication number: 20150193926Abstract: A method and an apparatus that may include optics that is arranged to illuminate a surface of a sample with radiation and to collect reflected radiation from the surface of the sample; wherein the optics includes a pupil that has multiple pupil segments that correspond to different angular regions of collection or illumination; and a detection module arranged to receive the reflected radiation and generate, for each pupil segment, pupil segment detection signals.Type: ApplicationFiled: January 7, 2014Publication date: July 9, 2015Applicant: APPLIED MATERIALS ISRAEL, LTD.Inventors: Yoav Berlatzky, Amir Shoham, Ido Dolev
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Patent number: 8614790Abstract: An optical inspection system for inspecting a patterned sample located in an inspection plane includes an illumination unit defining an illumination path, and a light collection unit defining a collection path, each path having a certain angular orientation with respect to the inspection plane. The illumination unit comprises an illumination mask located in a first spectral plane with respect to the inspection plane and the light collection unit comprises a collection mask located in a second spectral plane with respect to the inspection plane being conjugate to the first spectral plane. Arrangements of features of the first and second patterns are selected in accordance with a diffraction response from said patterned sample along a collection channel defined by the angular orientation of the illumination and collection paths.Type: GrantFiled: December 12, 2011Date of Patent: December 24, 2013Assignee: Applied Materials Israel, Ltd.Inventors: Yoav Berlatzky, Ido Kofler, Doron Meshulach, Kobi Barkan