Patents by Inventor Yogananada Sarode Vishwanath

Yogananada Sarode Vishwanath has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20150170943
    Abstract: An exemplary semiconductor processing system may include a processing chamber and a first plasma source. The first plasma source may utilize a first electrode positioned externally to the processing chamber, and the first plasma source may be configured to generate a first plasma. The processing system may further comprise a second plasma source separate from the first plasma source that utilizes a second electrode separate from the first electrode. The second electrode may be positioned externally to the processing chamber, and the second plasma source may be configured to generate a second plasma within the processing chamber. The processing system may further comprise a showerhead disposed between the relative locations of the first plasma electrode and the second plasma electrode.
    Type: Application
    Filed: December 17, 2013
    Publication date: June 18, 2015
    Applicant: Applied Materials, Inc.
    Inventors: Andrew Nguyen, Kartik Ramaswamy, Srinivas Nemani, Bradley Howard, Yogananada Sarode Vishwanath