Patents by Inventor Yogesh Pramod KARADE

Yogesh Pramod KARADE has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Substrate holder, lithographic apparatus, device manufacturing method, and method of manufacturing a substrate holder
    Patent number: 11960213
    Abstract: A substrate holder for a lithographic apparatus has a main body having a thin-film stack provided on a surface thereof. The thin-film stack forms an electronic or electric component such as an electrode, a sensor, a heater, a transistor or a logic device, and has a top isolation layer. A plurality of burls to support a substrate are formed on the thin-film stack or in apertures of the thin-film stack.
    Type: Grant
    Filed: April 12, 2023
    Date of Patent: April 16, 2024
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Raymond Wilhelmus Louis Lafarre, Sjoerd Nicolaas Lambertus Donders, Nicolaas Ten Kate, Nina Vladimirovna Dziomkina, Yogesh Pramod Karade, Elisabeth Corinne Rodenburg
  • SUBSTRATE HOLDER AND METHOD OF MANUFACTURING A SUBSTRATE HOLDER
    Publication number: 20240027915
    Abstract: An object holder for a lithographic apparatus has a main body having a surface. A plurality of burls to support an object are formed on the surface or in apertures of a thin-film stack. At least one of the burls is formed by laser-sintering. At least one of the burls formed by laser-sintering may be a repair of a damaged burl previously formed by laser-sintering or another method.
    Type: Application
    Filed: August 22, 2023
    Publication date: January 25, 2024
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Raymond Wilhelmus Louis LAFARRE, Sjoerd Nicolaas Lambertus Donders, Nicolaas TEN KATE, Nina Vladimirovna DZIOMKINA, Yogesh Pramod KARADE, Elisabeth Corinne RODENBURG
  • Substrate holder and method of manufacturing a substrate holder
    Patent number: 11754929
    Abstract: A substrate holder for use in a lithographic apparatus, the substrate holder including: a main body; a plurality of first burls provided on a first side of the main body and having end surfaces to support a substrate, wherein the first burls each include CrN; and a plurality of second burls provided on a second side of the main body.
    Type: Grant
    Filed: July 1, 2022
    Date of Patent: September 12, 2023
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Raymond Wilhelmus Louis Lafarre, Sjoerd Nicolaas Lambertus Donders, Nicolaas Ten Kate, Nina Vladimirovna Dziomkina, Yogesh Pramod Karade, Elisabeth Corinne Rodenburg
  • SUBSTRATE HOLDER, LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD, AND METHOD OF MANUFACTURING A SUBSTRATE HOLDER
    Publication number: 20230251579
    Abstract: A substrate holder for a lithographic apparatus has a main body having a thin-film stack provided on a surface thereof. The thin-film stack forms an electronic or electric component such as an electrode, a sensor, a heater, a transistor or a logic device, and has a top isolation layer. A plurality of burls to support a substrate are formed on the thin-film stack or in apertures of the thin-film stack.
    Type: Application
    Filed: April 12, 2023
    Publication date: August 10, 2023
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Raymond Wilhelmus Louis Lafarre, Sjoerd Nicolaas Lambertus Donders, Nicolaas Ten Kate, Nina Vladimirovna Dziomkina, Yogesh Pramod Karade, Elisabeth Corinne Rodenburg
  • Substrate holder, lithographic apparatus, device manufacturing method, and method of manufacturing a substrate holder
    Patent number: 11628498
    Abstract: A substrate holder for a lithographic apparatus has a main body having a thin-film stack provided on a surface thereof. The thin-film stack forms an electronic or electric component such as an electrode, a sensor, a heater, a transistor or a logic device, and has a top isolation layer. A plurality of burls to support a substrate are formed on the thin-film stack or in apertures of the thin-film stack.
    Type: Grant
    Filed: January 28, 2022
    Date of Patent: April 18, 2023
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Raymond Wilhelmus Louis Lafarre, Sjoerd Nicolaas Lambertus Donders, Nicolaas Ten Kate, Nina Vladimirovna Dziomkina, Yogesh Pramod Karade, Elisabeth Corinne Rodenburg
  • SUBSTRATE HOLDER, LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD, AND METHOD OF MANUFACTURING A SUBSTRATE HOLDER
    Publication number: 20230048272
    Abstract: A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for the formation of an electronic component such as a thin film electronic component. The planarization layer may be provided in multiple sub layers. The planarization layer may smooth over roughness caused by removal of material from a blank to form burls on the substrate holder.
    Type: Application
    Filed: September 23, 2022
    Publication date: February 16, 2023
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Raymond Wilhelmus Louis LAFARRE, Nicolaas TEN KATE, Nina Vladimirovna DZIOMKINA, Yogesh Pramod KARADE
  • SUBSTRATE HOLDER AND METHOD OF MANUFACTURING A SUBSTRATE HOLDER
    Publication number: 20220331862
    Abstract: An object holder for a lithographic apparatus has a main body having a surface. A plurality of burls to support an object is formed on the surface or in apertures of a thin-film stack. At least one of the burls is formed by laser-sintering. At least one of the burs formed by laser-sintering may be a repair of a damaged burl previously formed by laser-sintering or another method.
    Type: Application
    Filed: July 1, 2022
    Publication date: October 20, 2022
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Raymond Wilhelmus Louis LAFARRE, Sjoerd Nicolaas Lambertus DONDERS, Nicolaas TEN KATE, Nina Vladimirovna DZIOMKINA, Yogesh Pramod KARADE, Elisabeth Corinne RODENBURG
  • Substrate holder, lithographic apparatus, device manufacturing method, and method of manufacturing a substrate holder
    Patent number: 11454895
    Abstract: A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for the formation of an electronic component such as a thin film electronic component. The planarization layer may be provided in multiple sub layers. The planarization layer may smooth over roughness caused by removal of material from a blank to form burls on the substrate holder.
    Type: Grant
    Filed: May 6, 2021
    Date of Patent: September 27, 2022
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Raymond Wilhelmus Louis Lafarre, Nicolaas Ten Kate, Nina Vladimirovna Dziomkina, Yogesh Pramod Karade
  • Substrate holder and method of manufacturing a substrate holder
    Patent number: 11376663
    Abstract: An object holder for a lithographic apparatus has a main body having a surface. A plurality of burls to support an object is formed on the surface or in apertures of a thin-film stack. At least one of the burls is formed by laser-sintering. At least one of the burls formed by laser-sintering may be a repair of a damaged burl previously formed by laser-sintering or another method.
    Type: Grant
    Filed: December 23, 2020
    Date of Patent: July 5, 2022
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Raymond Wilhelmus Louis Lafarre, Sjoerd Nicolaas Lambertus Donders, Nicolaas Ten Kate, Nina Vladimirovna Dziomkina, Yogesh Pramod Karade, Elisabeth Corinne Rodenburg
  • SUBSTRATE HOLDER, LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD, AND METHOD OF MANUFACTURING A SUBSTRATE HOLDER
    Publication number: 20220152703
    Abstract: A substrate holder for a lithographic apparatus has a main body having a thin-film stack provided on a surface thereof. The thin-film stack forms an electronic or electric component such as an electrode, a sensor, a heater, a transistor or a logic device, and has a top isolation layer. A plurality of burls to support a substrate are formed on the thin-film stack or in apertures of the thin-film stack.
    Type: Application
    Filed: January 28, 2022
    Publication date: May 19, 2022
    Inventors: Raymond Wilhelmus Louis Lafarre, Sjoerd Nicolaas Lambertus Donders, Nicolaas Ten Kate, Nina Vladimirovna Dziomkina, Yogesh Pramod Karade, Elisabeth Corinne Rodenburg
  • Substrate holder, lithographic apparatus, device manufacturing method, and method of manufacturing a substrate holder
    Patent number: 11235388
    Abstract: A substrate holder for a lithographic apparatus has a main body having a thin-film stack provided on a surface thereof. The thin-film stack forms an electronic or electric component such as an electrode, a sensor, a heater, a transistor or a logic device, and has a top isolation layer. A plurality of burls to support a substrate are formed on the thin-film stack or in apertures of the thin-film stack.
    Type: Grant
    Filed: December 30, 2020
    Date of Patent: February 1, 2022
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Raymond Wilhelmus Louis Lafarre, Sjoerd Nicolaas Lambertus Donders, Nicolaas Ten Kate, Nina Vladimirovna Dziomkina, Yogesh Pramod Karade, Elisabeth Corinne Rodenburg
  • SUBSTRATE HOLDER, LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD, AND METHOD OF MANUFACTURING A SUBSTRATE HOLDER
    Publication number: 20210278772
    Abstract: A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for the formation of an electronic component such as a thin film electronic component. The planarization layer may be provided in multiple sub layers. The planarization layer may smooth over roughness caused by removal of material from a blank to form burls on the substrate holder.
    Type: Application
    Filed: May 6, 2021
    Publication date: September 9, 2021
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Raymond Wilhelmus Louis LAFARRE, Nicolaas TEN KATE, Nina Vladimirovna DZIOMKINA, Yogesh Pramod KARADE
  • Substrate holder, lithographic apparatus, device manufacturing method, and method of manufacturing a substrate holder
    Patent number: 11003094
    Abstract: A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for the formation of an electronic component such as a thin film electronic component. The planarization layer may be provided in multiple sub layers. The planarization layer may smooth over roughness caused by removal of material from a blank to form burls on the substrate holder.
    Type: Grant
    Filed: April 5, 2019
    Date of Patent: May 11, 2021
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Raymond Wilhelmus Louis Lafarre, Nicolaas Ten Kate, Nina Vladimirovna Dziomkina, Yogesh Pramod Karade
  • SUBSTRATE HOLDER, LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD, AND METHOD OF MANUFACTURING A SUBSTRATE HOLDER
    Publication number: 20210114101
    Abstract: A substrate holder for a lithographic apparatus has a main body having a thin-film stack provided on a surface thereof. The thin-film stack forms an electronic or electric component such as an electrode, a sensor, a heater, a transistor or a logic device, and has a top isolation layer. A plurality of burls to support a substrate are formed on the thin-film stack or in apertures of the thin-film stack.
    Type: Application
    Filed: December 30, 2020
    Publication date: April 22, 2021
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Raymond Wilhelmus Louis LAFARRE, Sjoerd Nicolaas Lambertus DONDERS, Nicolaas TEN KATE, Nina Vladimirovna DZIOMKINA, Yogesh Pramod KARADE, Elisabeth Corinne RODENBURG
  • SUBSTRATE HOLDER AND METHOD OF MANUFACTURING A SUBSTRATE HOLDER
    Publication number: 20210107061
    Abstract: An object holder for a lithographic apparatus has a main body having a surface. A plurality of burls to support an object is formed on the surface or in apertures of a thin-film stack. At least one of the burls is formed by laser-sintering. At least one of the burls formed by laser-sintering may be a repair of a damaged burl previously formed by laser-sintering or another method.
    Type: Application
    Filed: December 23, 2020
    Publication date: April 15, 2021
    Inventors: Raymond Wilhelmus Louis LAFARRE, Sjoerd Nicolaas Lambertus DONDERS, Nicolaas TEN KATE, Nina Vladimirovna DZIOMKINA, Yogesh Pramod KARADE, Elisabeth Corinne RODENBURG
  • Substrate holder, lithographic apparatus, device manufacturing method, and method of manufacturing a substrate holder
    Patent number: 10898955
    Abstract: A substrate holder for a lithographic apparatus has a main body having a thin-film stack provided on a surface thereof. The thin-film stack forms an electronic or electric component such as an electrode, a sensor, a heater, a transistor or a logic device, and has a top isolation layer. A plurality of burs to support a substrate are formed on the thin-film stack or in apertures of the thin-film stack.
    Type: Grant
    Filed: March 29, 2019
    Date of Patent: January 26, 2021
    Assignee: ASME NETHERLANDS B.V.
    Inventors: Raymond Wilhelmus Louis Lafarre, Sjoerd Nicolaas Lambertus Donders, Nicolaas Ten Kate, Nina Vladimirovna Dziomkina, Yogesh Pramod Karade, Elisabeth Corinne Rodenburg
  • Substrate holder and method of manufacturing a substrate holder
    Patent number: 10875096
    Abstract: An object holder for a lithographic apparatus has a main body having a surface. A plurality of burls to support an object is formed on the surface or in apertures of a thin-film stack. At least one of the burls is formed by laser-sintering. At least one of the burls formed by laser-sintering may be a repair of a damaged burl previously formed by laser-sintering or another method.
    Type: Grant
    Filed: July 19, 2017
    Date of Patent: December 29, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Raymond Wilhelmus Louis Lafarre, Sjoerd Nicolaas Lambertus Donders, Nicolaas Ten Kate, Nina Vladimirovna Dziomkina, Yogesh Pramod Karade, Elisabeth Corinne Rodenburg
  • SUBSTRATE HOLDER, LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD, AND METHOD OF MANUFACTURING A SUBSTRATE HOLDER
    Publication number: 20190235395
    Abstract: A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for the formation of an electronic component such as a thin film electronic component. The planarization layer may be provided in multiple sub layers. The planarization layer may smooth over roughness caused by removal of material from a blank to form burls on the substrate holder.
    Type: Application
    Filed: April 5, 2019
    Publication date: August 1, 2019
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Raymond Wilhelmus Louis LAFARRE, Nicolaas TEN KATE, Nina Vladimirovna DZIOMKINA, Yogesh Pramod KARADE
  • SUBSTRATE HOLDER, LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD, AND METHOD OF MANUFACTURING A SUBSTRATE HOLDER
    Publication number: 20190224755
    Abstract: A substrate holder for a lithographic apparatus has a main body having a thin-film stack provided on a surface thereof. The thin-film stack forms an electronic or electric component such as an electrode, a sensor, a heater, a transistor or a logic device, and has a top isolation layer. A plurality of burs to support a substrate are formed on the thin-film stack or in apertures of the thin-film stack.
    Type: Application
    Filed: March 29, 2019
    Publication date: July 25, 2019
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Raymond Wilhelmus Louis LAFARRE, Sjoerd Nicolaas Lambertus DONDERS, Nicolaas TEN KATE, Nina Vladimirovna DZIOMKINA, Yogesh Pramod KARADE, Elisabeth Corinne RODENBURG
  • Substrate holder, lithographic apparatus, device manufacturing method, and method of manufacturing a substrate holder
    Patent number: 10254660
    Abstract: A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for the formation of an electronic component such as a thin film electronic component. The planarization layer may be provided in multiple sub layers. The planarization layer may smooth over roughness caused by removal of material from a blank to form burls on the substrate holder.
    Type: Grant
    Filed: May 31, 2018
    Date of Patent: April 9, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Raymond Wilhelmus Louis Lafarre, Nicolaas Ten Kate, Nina Vladimirovna Dziomkina, Yogesh Pramod Karade