Patents by Inventor Yogesh Pramod KARADE

Yogesh Pramod KARADE has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • SUBSTRATE HOLDER, LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD, AND METHOD OF MANUFACTURING A SUBSTRATE HOLDER
    Publication number: 20240264533
    Abstract: A substrate holder for a lithographic apparatus has a main body having a thin-film stack provided on a surface thereof. The thin-film stack forms an electronic or electric component such as an electrode, a sensor, a heater, a transistor or a logic device, and has a top isolation layer. A plurality of burls to support a substrate are formed on the thin-film stack or in apertures of the thin-film stack.
    Type: Application
    Filed: April 15, 2024
    Publication date: August 8, 2024
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Raymond Wilhelmus Louis LAFARRE, Sjoerd Nicolaas Lambertus DONDERS, Nicolaas TEN KATE, Nina Vladimirovna DZIOMKINA, Yogesh Pramod KARADE, Elisabeth Corinne RODENBURG
  • SUBSTRATE HOLDER AND METHOD OF MANUFACTURING A SUBSTRATE HOLDER
    Publication number: 20240027915
    Abstract: An object holder for a lithographic apparatus has a main body having a surface. A plurality of burls to support an object are formed on the surface or in apertures of a thin-film stack. At least one of the burls is formed by laser-sintering. At least one of the burls formed by laser-sintering may be a repair of a damaged burl previously formed by laser-sintering or another method.
    Type: Application
    Filed: August 22, 2023
    Publication date: January 25, 2024
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Raymond Wilhelmus Louis LAFARRE, Sjoerd Nicolaas Lambertus Donders, Nicolaas TEN KATE, Nina Vladimirovna DZIOMKINA, Yogesh Pramod KARADE, Elisabeth Corinne RODENBURG
  • SUBSTRATE HOLDER, LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD, AND METHOD OF MANUFACTURING A SUBSTRATE HOLDER
    Publication number: 20230048272
    Abstract: A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for the formation of an electronic component such as a thin film electronic component. The planarization layer may be provided in multiple sub layers. The planarization layer may smooth over roughness caused by removal of material from a blank to form burls on the substrate holder.
    Type: Application
    Filed: September 23, 2022
    Publication date: February 16, 2023
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Raymond Wilhelmus Louis LAFARRE, Nicolaas TEN KATE, Nina Vladimirovna DZIOMKINA, Yogesh Pramod KARADE
  • SUBSTRATE HOLDER AND METHOD OF MANUFACTURING A SUBSTRATE HOLDER
    Publication number: 20220331862
    Abstract: An object holder for a lithographic apparatus has a main body having a surface. A plurality of burls to support an object is formed on the surface or in apertures of a thin-film stack. At least one of the burls is formed by laser-sintering. At least one of the burs formed by laser-sintering may be a repair of a damaged burl previously formed by laser-sintering or another method.
    Type: Application
    Filed: July 1, 2022
    Publication date: October 20, 2022
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Raymond Wilhelmus Louis LAFARRE, Sjoerd Nicolaas Lambertus DONDERS, Nicolaas TEN KATE, Nina Vladimirovna DZIOMKINA, Yogesh Pramod KARADE, Elisabeth Corinne RODENBURG
  • SUBSTRATE HOLDER, LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD, AND METHOD OF MANUFACTURING A SUBSTRATE HOLDER
    Publication number: 20210278772
    Abstract: A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for the formation of an electronic component such as a thin film electronic component. The planarization layer may be provided in multiple sub layers. The planarization layer may smooth over roughness caused by removal of material from a blank to form burls on the substrate holder.
    Type: Application
    Filed: May 6, 2021
    Publication date: September 9, 2021
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Raymond Wilhelmus Louis LAFARRE, Nicolaas TEN KATE, Nina Vladimirovna DZIOMKINA, Yogesh Pramod KARADE
  • SUBSTRATE HOLDER, LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD, AND METHOD OF MANUFACTURING A SUBSTRATE HOLDER
    Publication number: 20210114101
    Abstract: A substrate holder for a lithographic apparatus has a main body having a thin-film stack provided on a surface thereof. The thin-film stack forms an electronic or electric component such as an electrode, a sensor, a heater, a transistor or a logic device, and has a top isolation layer. A plurality of burls to support a substrate are formed on the thin-film stack or in apertures of the thin-film stack.
    Type: Application
    Filed: December 30, 2020
    Publication date: April 22, 2021
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Raymond Wilhelmus Louis LAFARRE, Sjoerd Nicolaas Lambertus DONDERS, Nicolaas TEN KATE, Nina Vladimirovna DZIOMKINA, Yogesh Pramod KARADE, Elisabeth Corinne RODENBURG
  • SUBSTRATE HOLDER AND METHOD OF MANUFACTURING A SUBSTRATE HOLDER
    Publication number: 20210107061
    Abstract: An object holder for a lithographic apparatus has a main body having a surface. A plurality of burls to support an object is formed on the surface or in apertures of a thin-film stack. At least one of the burls is formed by laser-sintering. At least one of the burls formed by laser-sintering may be a repair of a damaged burl previously formed by laser-sintering or another method.
    Type: Application
    Filed: December 23, 2020
    Publication date: April 15, 2021
    Inventors: Raymond Wilhelmus Louis LAFARRE, Sjoerd Nicolaas Lambertus DONDERS, Nicolaas TEN KATE, Nina Vladimirovna DZIOMKINA, Yogesh Pramod KARADE, Elisabeth Corinne RODENBURG
  • SUBSTRATE HOLDER, LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD, AND METHOD OF MANUFACTURING A SUBSTRATE HOLDER
    Publication number: 20190235395
    Abstract: A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for the formation of an electronic component such as a thin film electronic component. The planarization layer may be provided in multiple sub layers. The planarization layer may smooth over roughness caused by removal of material from a blank to form burls on the substrate holder.
    Type: Application
    Filed: April 5, 2019
    Publication date: August 1, 2019
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Raymond Wilhelmus Louis LAFARRE, Nicolaas TEN KATE, Nina Vladimirovna DZIOMKINA, Yogesh Pramod KARADE
  • SUBSTRATE HOLDER, LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD, AND METHOD OF MANUFACTURING A SUBSTRATE HOLDER
    Publication number: 20190224755
    Abstract: A substrate holder for a lithographic apparatus has a main body having a thin-film stack provided on a surface thereof. The thin-film stack forms an electronic or electric component such as an electrode, a sensor, a heater, a transistor or a logic device, and has a top isolation layer. A plurality of burs to support a substrate are formed on the thin-film stack or in apertures of the thin-film stack.
    Type: Application
    Filed: March 29, 2019
    Publication date: July 25, 2019
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Raymond Wilhelmus Louis LAFARRE, Sjoerd Nicolaas Lambertus DONDERS, Nicolaas TEN KATE, Nina Vladimirovna DZIOMKINA, Yogesh Pramod KARADE, Elisabeth Corinne RODENBURG
  • SUBSTRATE HOLDER, LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD, AND METHOD OF MANUFACTURING A SUBSTRATE HOLDER
    Publication number: 20180284625
    Abstract: A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for the formation of an electronic component such as a thin film electronic component. The planarization layer may be provided in multiple sub layers. The planarization layer may smooth over roughness caused by removal of material from a blank to form burls on the substrate holder.
    Type: Application
    Filed: May 31, 2018
    Publication date: October 4, 2018
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Raymond Wilhelmus Louis LAFARRE, Nicolaas TEN KATE, Nina Vladimirovna DZIOMKINA, Yogesh Pramod KARADE
  • SUBSTRATE HOLDER AND METHOD OF MANUFACTURING A SUBSTRATE HOLDER
    Publication number: 20170312826
    Abstract: An object holder for a lithographic apparatus has a main body having a surface. A plurality of burls to support an object is formed on the surface or in apertures of a thin-film stack. At least one of the burls is formed by laser-sintering. At least one of the burls formed by laser-sintering may be a repair of a damaged burl previously formed by laser-sintering or another method.
    Type: Application
    Filed: July 19, 2017
    Publication date: November 2, 2017
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Raymond Wilhelmus Louis LAFARRE, Sjoerd Nicolaas Lambertus DONDERS, Nicolaas TEN KATE, Nina Vladimirovna DZIOMKINA, Yogesh Pramod KARADE, Elisabeth Corinne RODENBURG
  • SUBSTRATE HOLDER, LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD, AND METHOD OF MANUFACTURING A SUBSTRATE HOLDER
    Publication number: 20170235235
    Abstract: A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for the formation of an electronic component such as a thin film electronic component. The planarization layer may be provided in multiple sub layers. The planarization layer may smooth over roughness caused by removal of material from a blank to form burls on the substrate holder.
    Type: Application
    Filed: May 4, 2017
    Publication date: August 17, 2017
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Raymond Wilhelmus Louis LAFARRE, Nicolaas TEN KATE, Nina Vladimirovna DZIOMKINA, Yogesh Pramod KARADE
  • SUBSTRATE HOLDER AND METHOD OF MANUFACTURING A SUBSTRATE HOLDER
    Publication number: 20170036272
    Abstract: An object holder for a lithographic apparatus has a main body having a surface. A plurality of burls to support an object is formed on the surface or in apertures of a thin-film stack. At least one of the burls is formed by laser-sintering. At least one of the burls formed by laser-sintering may be a repair of a damaged burl previously formed by laser-sintering or another method.
    Type: Application
    Filed: October 18, 2016
    Publication date: February 9, 2017
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Raymond Wilhelmus Louis LAFARRE, Sjoerd Nicolaas Lambertus DONDERS, Nicolaas TEN KATE, Nina Vladimirovna DZIOMKINA, Yogesh Pramod KARADE, Elisabeth Corinne RODENBURG
  • SUBSTRATE HOLDER, LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD, AND METHOD OF MANUFACTURING A SUBSTRATE HOLDER
    Publication number: 20160377994
    Abstract: A substrate holder for a lithographic apparatus has a main body having a thin-film stack provided on a surface thereof. The thin-film stack forms an electronic or electric component such as an electrode, a sensor, a heater, a transistor or a logic device, and has a top isolation layer. A plurality of burls to support a substrate are formed on the thin-film stack or in apertures of the thin-film stack.
    Type: Application
    Filed: September 9, 2016
    Publication date: December 29, 2016
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Raymond Wilhelmus Louis LAFARRE, Sjoerd Nicolaas Lambertus DONDERS, Nicolaas TEN KATE, Nina Vladimirovna DZIOMKINA, Yogesh Pramod KARADE, Elisabeth Corinne RODENBURG
  • SUBSTRATE HOLDER, LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD, AND METHOD OF MANUFACTURING A SUBSTRATE HOLDER
    Publication number: 20160349632
    Abstract: A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for the formation of an electronic component such as a thin film electronic component. The planarization layer may be provided in multiple sub layers. The planarization layer may smooth over roughness caused by removal of material from a blank to form burls on the substrate holder.
    Type: Application
    Filed: August 10, 2016
    Publication date: December 1, 2016
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Raymond Wilhelmus Louis LAFARRE, Nicolaas TEN KATE, Nina Vladimirovna DZIOMKINA, Yogesh Pramod KARADE
  • SUBSTRATE HOLDER, LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD, AND METHOD OF MANUFACTURING A SUBSTRATE HOLDER
    Publication number: 20160231655
    Abstract: A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for the formation of a thin film stack forming an electronic component. The planarization layer is of substantially uniform thickness and/or its outer surface has a peak to valley distance of less than 10 ?m. The planarization layer may be formed by applying two solutions of different concentration. A surface treatment may be applied to the burls to repel a solution of the planarization layer material.
    Type: Application
    Filed: April 18, 2016
    Publication date: August 11, 2016
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Raymond Wilhelmus Louis LAFARRE, Nina Vladimirovna DZIOMKINA, Yogesh Pramod KARADE, Elisabeth Corinne RODENBURG, Peter VAN DELFT
  • SUBSTRATE HOLDER, LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD, AND METHOD OF MANUFACTURING A SUBSTRATE HOLDER
    Publication number: 20160170314
    Abstract: A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for the formation of a thin film stack forming an electronic component. The thin film stack comprises an (optional) isolation layer, a metal layer forming an electrode, a sensor, a heater, a transistor or a logic device, and a top isolation layer.
    Type: Application
    Filed: February 3, 2016
    Publication date: June 16, 2016
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Raymond Wilhelmus Louis LAFARRE, Nicolaas TEN KATE, Nina Vladimirovna DZIOMKINA, Yogesh Pramod KARADE, Siegfried Alexander TROMP, Jacobus Josephus LEIJSSEN, Elisabeth Corinne RODENBURG, Maurice Wilhelmus Leonardus Hendricus FEIJTS, Hendrik HUISMAN
  • SUBSTRATE HOLDER, LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD, AND METHOD OF MANUFACTURING A SUBSTRATE HOLDER
    Publication number: 20130094009
    Abstract: A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for the formation of a thin film stack forming an electronic component. The planarization layer is of substantially uniform thickness and/or its outer surface has a peak to valley distance of less than 10 ?m. The planarization layer may be formed by applying two solutions of different concentration. A surface treatment may be applied to the burls to repel a solution of the planarization layer material.
    Type: Application
    Filed: October 9, 2012
    Publication date: April 18, 2013
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Raymond Wilhelmus Louis LAFARRE, Nina Vladimirovna DZIOMKINA, Yogesh Pramod KARADE, Elisabeth Corinne RODENBURG, Peter VAN DELFT
  • SUBSTRATE HOLDER, LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD, AND METHOD OF MANUFACTURING A SUBSTRATE HOLDER
    Publication number: 20120212725
    Abstract: A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for the formation of a thin film stack forming an electronic component. The thin film stack comprises an (optional) isolation layer, a metal layer forming an electrode, a sensor, a heater, a transistor or a logic device, and a top isolation layer.
    Type: Application
    Filed: February 16, 2012
    Publication date: August 23, 2012
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Raymond Wilhelmus Louis LAFARRE, Nicolaas TEN KATE, Nina Vladimirovna DZIOMKlNA, Yogesh Pramod KARADE, Siegfried Alexander TROMP, Jacobus Josephus LEIJSSEN, Elisabeth Corinne RODENBURG, Maurice Wilhelmus Leonardus Hendric FEIJTS, Hendrik HUISMAN
  • SUBSTRATE HOLDER, LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD, AND METHOD OF MANUFACTURING A SUBSTRATE HOLDER
    Publication number: 20120147353
    Abstract: A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for the formation of an electronic component such as a thin film electronic component. The planarization layer may be provided in multiple sub layers. The planarization layer may smooth over roughness caused by removal of material from a blank to form burls on the substrate holder.
    Type: Application
    Filed: December 12, 2011
    Publication date: June 14, 2012
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Raymond Wilhelmus Louis LAFARRE, Nicolaas TEN KATE, Nina Vladimirovna DZIOMKINA, Yogesh Pramod KARADE