Patents by Inventor Yo-Han Choi
Yo-Han Choi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10718759Abstract: Disclosed herein are a transparent immunoassay apparatus and method. The transparent immunoassay apparatus includes a sample pad configured to allow a liquid specimen to be dropped thereonto, a first porous pipe configured to move the dropped specimen in a lateral flow manner, an immunobinding reaction unit configured to generate a detectable signal from binding of a previously applied reactant and the specimen between transparent upper and lower plates of the immunobinding reaction unit, a second porous pipe configured to move the specimen, having passed through the immunobinding reaction unit, in a lateral flow manner, and an absorption pad configured to absorb the specimen transferred from the second porous pipe.Type: GrantFiled: June 5, 2017Date of Patent: July 21, 2020Assignee: ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTEInventors: Yo-Han Choi, Ki-Bong Song
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Publication number: 20180100852Abstract: Disclosed herein are a transparent immunoassay apparatus and method. The transparent immunoassay apparatus includes a sample pad configured to allow a liquid specimen to be dropped thereonto, a first porous pipe configured to move the dropped specimen in a lateral flow manner, an immunobinding reaction unit configured to generate a detectable signal from binding of a previously applied reactant and the specimen between transparent upper and lower plates of the immunobinding reaction unit, a second porous pipe configured to move the specimen, having passed through the immunobinding reaction unit, in a lateral flow manner, and an absorption pad configured to absorb the specimen transferred from the second porous pipe.Type: ApplicationFiled: June 5, 2017Publication date: April 12, 2018Inventors: Yo-Han CHOI, Ki-Bong SONG
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Patent number: 9931307Abstract: Provided is a transdermal delivery system consisting of a backing layer, a drug-containing matrix layer, and a release layer, wherein the drug-containing matrix layer includes (a) donepezil or a pharmaceutically acceptable salt thereof as an active ingredient, (b) a mixture of high molecular weight polyisobutylene having a weight-average molecular weight ranging from 400,000 to 3,000,000 and low molecular weight polyisobutylene having a weight-average molecular weight ranging from 25,000 to 300,000 as an adhesive, and (c) a permeation enhancer in not more than 3% by weight based on the total weight of the drug-containing matrix layer.Type: GrantFiled: January 12, 2015Date of Patent: April 3, 2018Assignee: DAEWOONG PHARMACEUTICAL CO., LTD.Inventors: Yo-Han Choi, Hee-Chul Chang
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Publication number: 20160051486Abstract: Provided is a transdermal delivery system consisting of a backing layer, a drug-containing matrix layer, and a release layer, wherein the drug-containing matrix layer includes (a) donepezil or a pharmaceutically acceptable salt thereof as an active ingredient, (b) a mixture of high molecular weight polyisobutylene having a weight-average molecular weight ranging from 400,000 to 3,000,000 and low molecular weight polyisobutylene having a weight-average molecular weight ranging from 25,000 to 300,000 as an adhesive, and (c) a permeation enhancer in not more than 3% by weight based on the total weight of the drug-containing matrix layer.Type: ApplicationFiled: January 12, 2015Publication date: February 25, 2016Applicant: DAEWOONG PHARMACEUTICAL CO., LTD.Inventors: Yo-Han CHOI, Hee-Chul CHANG
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Patent number: 8056032Abstract: Methods of measuring a mean-to-target (MTT) based on pattern area measurements are provided including providing a design pattern. A plurality of design pattern measurements are measured for calculating an area of the design pattern based on a shape of the design pattern. A series of calculation measurements are calculated by continuously substituting a same variation into the design pattern measurements, and calculating a series of calculation areas corresponding respectively to the calculation measurements to generate a database including the calculation measurements and the calculation areas. An actual pattern is formed using the design pattern and an area of the actual pattern is measured. A calculation area corresponding to the area of the actual pattern is selected from the database and calculation measurements corresponding to the calculation area are selected. A difference between the design pattern measurements and the calculation measurements is calculated and the difference is set as an MTT.Type: GrantFiled: November 24, 2008Date of Patent: November 8, 2011Assignee: Samsung Electronics Co., Ltd.Inventors: Hyung-joo Lee, So-yoon Bae, Yo-han Choi, Jong-won Kim, Dong-hoon Chung
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Publication number: 20100248352Abstract: Provided is a sensor for biological detection. The sensor for biological detection includes: a sensing unit including a light generator, an optical coupler, and an optical detector, the optical coupler dividing light incident from the light generator to project divided lights into a bio chip and a reference unit, respectively, and coupling the lights reflected from the respective bio chip and reference unit as one output light, and the optical detector detecting the output light, and the bio chip is independently separated from the sensing unit to be disposed on paths of lights divided by the optical coupler. The sensing unit has a composition of the Michelson interferometer.Type: ApplicationFiled: May 9, 2008Publication date: September 30, 2010Applicant: ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTEInventors: Hyun-Woo Song, Hyeon-Bong Pyo, Yo-Han Choi
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Patent number: 7803506Abstract: A method of measuring a critical dimension may include forming an object pattern on a substrate and forming a plurality of reference patterns on the substrate, wherein each of the plurality of reference patterns has a different critical dimension. An optical property of each of the plurality of reference patterns may be measured to provide a respective measured optical property for each of the reference patterns, and an optical property of the object pattern may be measured to provide a measured optical property of the object pattern. The measured optical property of the object pattern may be compared with the measured optical properties of the reference patterns, and a critical dimension of the object pattern may be determined as being the same as the critical dimension of the reference pattern having the measured optical property that is closest to the measured optical property of the object pattern. Related devices are also discussed.Type: GrantFiled: June 13, 2007Date of Patent: September 28, 2010Assignee: Samsung Electronics Co., Ltd.Inventors: Kyoung-Yoon Bang, Hae-Young Jeong, Yong-Hoon Kim, Yo-Han Choi, Hyung-Joo Lee
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Publication number: 20100157300Abstract: Provided is a liquid sample analysis chip reading system. The reading system includes an analysis chip, a light emitting part, a plurality of light wave-guides, and a light receiving part. The analysis chip includes a plurality of detecting parts. The light emitting part includes three light sources emitting light having wavelengths (or colors) different from each other. The plurality of light wave-guides irradiate the light emitted from the light emitting part onto the plurality of corresponding detecting parts, respectively. The light receiving part includes a plurality of light receiving devices for receiving the light having a specific color reflected from each of the plurality of corresponding detecting parts of the analysis chip. The three light sources are discontinuously controlled to emit light onto the plurality of light wave-guides.Type: ApplicationFiled: July 15, 2009Publication date: June 24, 2010Applicant: Electronics and Telecommunications Research InstituteInventors: Dae-Sik Lee, Yo-Han Choi, Hyun-Woo Song, Moon-Youn Jung, Seon-Hee Park, Gun-Yong Sung
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Publication number: 20100159614Abstract: Provided is a biochip and an apparatus for detecting a biomaterial. The biochip includes a metal thin film on the surface of a substrate, restraining autofluorescence of the substrate, and a spacer on the metal thin film, having capture molecules immobilized on the surface of the spacer and specifically bound to target molecules. The spacer has a thickness controlled to enhance the strength of a fluorescence signal emitted from a fluorophore labeled with the target molecules and immobilized on the spacer by the specific binding between the capture molecule and the target molecule.Type: ApplicationFiled: June 15, 2009Publication date: June 24, 2010Applicant: Electronics and Telecommunications Research InstituteInventors: Hyun-Woo SONG, Yo-Han CHOI, Hyeon-Bong PYO
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Publication number: 20100029902Abstract: Provided are coated nanoparticles and a method for coating nanoparticles. The coated nanoparticles are coated with proteins to prevent aggregation of the coated nanoparticles. The method for coating nanoparticles may include mixing an excessive amount of proteins with the nanoparticles. Alternatively, the method for coating nanoparticles may include coating with first proteins, treating with ultrasonic waves, and coating with second proteins.Type: ApplicationFiled: November 26, 2008Publication date: February 4, 2010Applicant: Electronics and Telecommunications Research InstituteInventors: Yo-Han CHOI, Sanghee Kim
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Publication number: 20090150849Abstract: Methods of measuring a mean-to-target (MTT) based on pattern area measurements are provided including providing a design pattern. A plurality of design pattern measurements are measured for calculating an area of the design pattern based on a shape of the design pattern. A series of calculation measurements are calculated by continuously substituting a same variation into the design pattern measurements, and calculating a series of calculation areas corresponding respectively to the calculation measurements to generate a database including the calculation measurements and the calculation areas. An actual pattern is formed using the design pattern and an area of the actual pattern is measured. A calculation area corresponding to the area of the actual pattern is selected from the database and calculation measurements corresponding to the calculation area are selected. A difference between the design pattern measurements and the calculation measurements is calculated and the difference is set as an MTT.Type: ApplicationFiled: November 24, 2008Publication date: June 11, 2009Inventors: Hyung-joo Lee, So-yoon Bae, Yo-han Choi, Jong-won Kim, Dong-hoon Chung
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Patent number: 7525089Abstract: A method and apparatus for measuring a critical dimension (CD) are provided. Image data of a measurement pattern are generated. The measurement pattern may include a first surface and a second surface facing each other. The image data may include a first side and a second side corresponding to the first surface and the second surface of the measurement pattern, respectively. The image data may be edited to increase an overlap length of the first and second sides. A measurement window crossing the first and second sides in the edited image data is set. A distance between the first and second sides in the measurement window is measured.Type: GrantFiled: May 16, 2006Date of Patent: April 28, 2009Assignee: Samsung Electronics Co., LtdInventors: Yo-Han Choi, Hee-Bom Kim
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Patent number: 7514082Abstract: Disclosed are a novel virus suppressing factor (VSF) protein having antiviral activity against a variety of viruses and a hybridoma secreting such a VSF protein. In addition, the present invention discloses a pharmaceutical composition comprising the VSF protein for prevention or treatment of viral infections in humans and animals, and a method of preventing or treating viral infections using such a pharmaceutical composition. The VSF protein has strong antiviral activity against a variety of viruses.Type: GrantFiled: January 30, 2003Date of Patent: April 7, 2009Assignee: Immunemed, Inc.Inventors: Yoon-Won Kim, Young-Jin Kim, Yo-Han Choi, Jee-Yin Ahn, Soo-Dong Woo, Song-Woo Sin, Min-Kee Cho, Young-Hwan Byun, Jeung-Yul Kang
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Publication number: 20070292778Abstract: A method of measuring a critical dimension may include forming an object pattern on a substrate and forming a plurality of reference patterns on the substrate, wherein each of the plurality of reference patterns has a different critical dimension. An optical property of each of the plurality of reference patterns may be measured to provide a respective measured optical property for each of the reference patterns, and an optical property of the object pattern may be measured to provide a measured optical property of the object pattern. The measured optical property of the object pattern may be compared with the measured optical properties of the reference patterns, and a critical dimension of the object pattern may be determined as being the same as the critical dimension of the reference pattern having the measured optical property that is closest to the measured optical property of the object pattern. Related devices are also discussed.Type: ApplicationFiled: June 13, 2007Publication date: December 20, 2007Inventors: Kyoung-Yoon Bang, Hae-Young Jeong, Yong-Hoon Kim, Yo-Han Choi, Hyung-Joo Lee
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Publication number: 20070125948Abstract: A method and apparatus for measuring a critical dimension (CD) are provided. Image data of a measurement pattern are generated. The measurement pattern may include a first surface and a second surface facing each other. The image data may include a first side and a second side corresponding to the first surface and the second surface of the measurement pattern, respectively. The image data may be edited to increase an overlap length of the first and second sides. A measurement window crossing the first and second sides in the edited image data is set. A distance between the first and second sides in the measurement window is measured.Type: ApplicationFiled: May 16, 2006Publication date: June 7, 2007Inventors: Yo-Han Choi, Hee-Bom Kim
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Publication number: 20060148263Abstract: A dry etching apparatus may include a dry etching chamber and a door chamber. The apparatus may further include a load lock chamber configured to connect the dry etching chamber and the door chamber in a vacuum state. A gas injector and an ionizer may be configured inside the door chamber or the load lock chamber. A gas supplying source may be disposed out of the chambers to supply a determined gas to the gas injector and the ionizer. A method of fabricating a phase shift mask using the dry etching apparatus may include removing particles attached to the surface of a mask in the door chamber or the load lock chamber during an etch process by the gas injector and the ionizer configured inside the door chamber or the load lock chamber of the etching apparatus.Type: ApplicationFiled: January 4, 2006Publication date: July 6, 2006Inventors: Yo-han Choi, Il-yong Jang, Jeong-yun Lee
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Patent number: 6974651Abstract: A method of making a photomask ensures that the mask pattern is precisely formed. A mask blank is provided in which an opaque film and a mask film are disposed on a transparent substrate. The mask film and the opaque film are successively etched to form an opaque pattern and a mask pattern. Next, a dimension of the opaque pattern is measured. If the measured dimension of the opaque pattern is smaller than a reference value, the opaque pattern is etched using the mask pattern as an etching mask to attain the desired dimension of the opaque pattern. The mask pattern is then removed.Type: GrantFiled: May 16, 2003Date of Patent: December 13, 2005Assignee: Samsung Electronics Co., Ltd.Inventor: Yo-Han Choi
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Publication number: 20050080236Abstract: Disclosed are a novel virus suppressing factor (VSF) protein having antiviral activity against a variety of viruses and a hybridoma secreting such a VSF protein. In addition, the present invention discloses a pharmaceutical composition comprising the VSF protein for prevention or treatment of viral infections in humans and animals, and a method of preventing or treating viral infections using such a pharmaceutical composition. The VSF protein has strong antiviral activity against a variety of viruses.Type: ApplicationFiled: January 30, 2003Publication date: April 14, 2005Inventors: Yoon-Won Kim, Young-Jin Kim, Yo-Han Choi, Jee-Yin Ahn, Soo-Dong Woo, Song-Woo Sin, Min-Kee Cho, Young-Hwan Byun, Jeung-Yul Kang
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Photomask, method for manufacturing the same and method for detecting/repairing defects in photomask
Patent number: 6821688Abstract: A photomask includes a mask substrate formed of a transparent nonconductor, a plurality of opaque conductive patterns formed on the mask substrate and separated from one another, and one or more conductive lines for connecting one of the conductive patterns with at least one adjacent conductive patterns. Electric charges, which accumulate in conductive patterns when using a focused ion beam (FIB) system, are dispersed through the conductive lines. The contrast of images of photomask patterns is increased by dispersion of electric charges, thereby improving the images of photomask patterns.Type: GrantFiled: June 4, 2002Date of Patent: November 23, 2004Assignee: Samsung Electronics Co., Ltd.Inventor: Yo-han Choi -
Publication number: 20040038136Abstract: A method of making a photomask ensures that the mask pattern is precisely formed. A mask blank is provided in which an opaque film and a mask film are disposed on a transparent substrate. The mask film and the opaque film are successively etched to form an opaque pattern and a mask pattern. Next, a dimension of the opaque pattern is measured. If the measured dimension of the opaque pattern is smaller than a reference value, the opaque pattern is etched using the mask pattern as an etching mask to attain the desired dimension of the opaque pattern. The mask pattern is then removed.Type: ApplicationFiled: May 16, 2003Publication date: February 26, 2004Inventor: Yo-Han Choi