Abstract: The present invention provides a pattern forming method that enables the formation of a pattern excellent in resolution and evenness and a method for producing an electronic device. The pattern forming method according to the present invention includes a resist film-forming step of forming a resist film using an actinic ray-sensitive or radiation-sensitive resin composition that undergoes an increase in the degree of solubility in an organic solvent due to action of exposure, acid, base, or heating, an exposure step of exposing the resist film, and a developing step of developing the exposed resist film with a developer including an organic solvent. The organic solvent includes an ester-based solvent having 6 or less carbon atoms and a hydrocarbon-based solvent.

Abstract: An object of the present invention is to provide an actinic ray-sensitive or radiation-sensitive resin composition that provides a pattern having little variation in the line width even if the time from the end of exposure treatment to the start of development treatment (waiting time before development) varies. Another object of the present invention is to provide a resist film, a pattern forming method, and a method for producing an electronic device that are related to the actinic ray-sensitive or radiation-sensitive resin composition. The actinic ray-sensitive or radiation-sensitive resin composition according to the present invention satisfies a predetermined requirement X or Y.

Abstract: A first object of the present invention is to provide a pattern forming method in which even if the time from the end of exposure treatment to the start of development treatment (waiting time before development) varies, a variation in the line width of a pattern to be formed is small. A second object of the present invention is to provide a method for producing an electronic device, the method relating to the pattern forming method. A third object of the present invention is to provide an actinic ray-sensitive or radiation-sensitive resin composition and a resist film that are suitable for the pattern formation. The pattern forming method according to the present invention includes a step of forming a resist film using an actinic ray-sensitive or radiation-sensitive resin composition, a step of exposing the resist film, and a step of developing the exposed resist film with a developer including an organic solvent. The composition satisfies a requirement A1 or a requirement A2 below.

Abstract: Provided is a lithographic printing plate precursor having an aluminum support and an image-recording layer formed on the aluminum support, in which the image-recording layer contains resin particles A that have an ethylenically unsaturated group and a compound B that has an ethylenically unsaturated group other than the resin particles A and has an ethylenically unsaturated bond valence of 1.5 mmol/g or more. Also provided are a method for preparing lithographic printing plate or a lithographic printing method using the lithographic printing plate precursor.

Abstract: A curable composition includes a salt compound having a) an organic anion in which, in Hansen solubility parameter, ?d is 16 or more, ?p is 16 or more and 32 or less, and ?H is 60% or less of ?p and b) a counter cation. A lithographic printing plate precursor having an image-recording layer containing the curable composition, a method for producing a lithographic printing plate using the lithographic printing plate precursor, and a compound that is used in the image-recording layer in the lithographic printing plate precursor are also set out.

Abstract: Provided is a lithographic printing plate precursor having an aluminum support, an image-recording layer, and a water-soluble overcoat layer in this order, in which the image-recording layer contains an infrared-absorbing polymethine colorant having HOMO of ?5.2 eV or less, a polymerization initiator, a polymerizable compound, and a polymer, and the polymer has a constitutional unit formed of an aromatic vinyl compound and a constitutional unit formed of an acrylonitrile compound. Also provided are a method for preparing a lithographic printing plate using the lithographic printing plate precursor.

Abstract: A lithographic printing plate precursor including an image recording layer on a hydrophilic support, in which the image recording layer includes a polymerization initiator, an infrared absorbent, a polymerizable compound, and an acid color former, and the infrared absorbent includes a compound represented by Formula 1, as well as a method of preparing a lithographic printing plate by use of the lithographic printing plate precursor.

Abstract: Provided are a planographic printing plate precursor including a support, and an image recording layer in this order, in which the image recording layer contains polymer particles containing an addition polymerization type resin, and the addition polymerization type resin contains a polymerizable group and a hydrophilic structure; a method of producing a planographic printing plate using the planographic printing plate precursor; a planographic printing method using the planographic printing plate precursor; and a curable composition containing the polymer particles.

Abstract: A lithographic printing plate precursor including an image recording layer on a hydrophilic support, in which the image recording layer includes a polymerization initiator, an infrared absorbent, a polymerizable compound, and an acid color former, and the infrared absorbent includes a compound represented by Formula 1, as well as a method of preparing a lithographic printing plate by use of the lithographic printing plate precursor. In Formula 1, at least one of Ar1 or Ar2 has a group represented by the following Formula 2. —X??Formula 2 X represents a halogen atom, —C(?O)—X2—R11, —C(?O)—NR12R13, —O—C(?O)—R14, —CN, —SO2N15R16, or a perfluoroalkyl group, X2 represents a single bond or an oxygen atom, R11 and R14 each independently represent an alkyl group or an aryl group, and R12, R13, R15 and R16 each independently represent a hydrogen atom, an alkyl group, or an aryl group.

Abstract: Provided are a curable composition including a sail compound having a) an organic anion in which, in Hansen, solubility parameter, ?d is 16 or more, ?p is 16 or more and 32 or less, and ?H is 60% or less of ?p and b) a counter cation, a lithographic printing plate precursor having an image-recording layer containing the curable composition, a method for producing a lithographic printing plate using the lithographic printing plate precursor, and a compound that is used in the image-recording layer in the lithographic printing plate precursor.

Abstract: A curable composition includes an infrared absorber having at least one element in Group XIII of the periodic table on a mother nucleus structure and having a chain-like polymethine structure, in which two or more hetero atoms are bonded to carbon atoms at non-meso positions. Also, a lithographic printing plate precursor in which the curable composition is used, and a method for producing a lithographic printing plate in which the lithographic printing plate precursor is used are provided.

Abstract: A non-aqueous secondary battery containing: a positive electrode containing a transition metal oxide as an active material thereof; a negative electrode; and a non-aqueous liquid electrolyte containing an electrolyte, an organic solvent, and less than 0.1 mol/L of an organometallic compound containing a transition element or a rare-earth element as a central metal thereof.

Abstract: An object of the present invention is to provide a nail cosmetic material having excellent adhesiveness and peelability, and a nail art kit containing the nail cosmetic material. The nail cosmetic material of the present invention including: diacetone acrylamide as a component 1; and at least one compound selected from the group consisting of isobornyl methacrylate, hydroxyethyl acrylamide, methacrylamide, dimethyl acrylamide, diethyl acrylamide, acryloyl morpholine, and butoxy diethylene glycol methacrylate, as a component 2.

Abstract: An object of the present invention is to provide a nail cosmetic material having excellent adhesiveness of a cured product and coatability and also having excellent peelability, and a nail art kit containing the nail cosmetic material. The nail cosmetic material of the present invention including: hydroxyethyl acrylamide as a component 1; and at least one compound selected from the group consisting of dimethyl acrylamide, diethyl acrylamide, acryloyl morpholine, and butoxy diethylene glycol methacrylate, as a component 2.

Abstract: The present invention provides an electrolytic solution for a non-aqueous secondary battery, the electrolytic solution including: an organic metal compound; an electrolyte; and an organic solvent, in which the organic metal compound includes a central metal and a multidentate ligand, and the ligand includes an oxygen atom bonded to the central metal, and a nitrogen atom or a sulfur atom bonded to the central metal.

Abstract: The present invention provides a pressure sensitive adhesive composition capable of forming a pressure sensitive adhesive sheet which has excellent adhesiveness and a low relative permittivity and causes less change in the relative permittivity according to environmental temperatures, a pressure sensitive adhesive sheet, a pressure sensitive adhesive film, a laminate for a touch panel including the pressure sensitive adhesive sheet, and a capacitive touch panel.

Abstract: A laminate for a touch panel includes a resin substrate which has a thermal expansion factor of 2 ppm/° C. to 200 ppm/° C.; a conductive portion which is arranged on the resin substrate, and has a mesh pattern formed of a plurality of metal thin wires; and an adhesive layer which is arranged to cover a surface of the resin substrate on the conductive portion side and the conductive portion, in which thermal stress obtained by a predetermined expression is less than or equal to 1,800 Pa, and peeling strength of the adhesive layer with respect to the resin substrate under an environment of a temperature of 85° C. and humidity of 85% is greater than or equal to 0.40 N/25 mm.

Abstract: A nonaqueous electrolyte solution including a nonaqueous solvent; an electrolyte; and a combustion inhibitor, in which the combustion inhibitor contains a phosphazene compound, and specific conditions are defined by boiling points of a combustion inhibitor, a boiling point of a solvent, and the like.

Abstract: The present invention provides an electrolytic solution for a non-aqueous secondary cell and an additive for an electrolytic solution. The electrolytic solution includes, in an organic solvent: an electrolyte; and an organic boron compound having at least one nitrogen-boron bond or an organic aluminum compound having at least one nitrogen-aluminum bond. The additive includes an organic boron compound having at least one nitrogen-boron bond or an organic aluminum compound having at least one nitrogen-aluminum bond.

Abstract: The present invention provides an electrolytic solution for a non-aqueous secondary battery, the electrolytic solution including: an organic metal compound; an electrolyte; and an organic solvent, in which the organic metal compound includes a central metal and a multidentate ligand, and the ligand includes an oxygen atom bonded to the central metal, and a nitrogen atom or a sulfur atom bonded to the central metal.