Patents by Inventor Yohei Ookawa

Yohei Ookawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Program for correcting charged particle radiation location, device for calculating degree of correction of charged particle radiation location, charged particle radiation system, and method for correcting charged particle radiation location
    Patent number: 9355816
    Abstract: The present invention provides a non-transitory medium storing a program for correcting an irradiation position of a charged particle beam, a correction amount calculation device, a charged particle beam irradiation system, and a method for correcting an irradiation position of a charged particle beam. The medium includes instructions for causing a control unit to perform actions including replacing charging of a resist with surface charges at an interface between the resist and a work piece, and calculating a charge density distribution of the surface charges; calculating a trajectory of a charged particle based on the charge density distribution; calculating an amount of error of the irradiation position of the charged particle beam based on the trajectory and calculating an amount of correction of the irradiation position of the charged particle beam based on the error amount.
    Type: Grant
    Filed: January 22, 2014
    Date of Patent: May 31, 2016
    Assignee: DAI NIPPONI PRINTING CO., LTD.
    Inventors: Yohei Ookawa, Hidenori Ozawa
  • PROGRAM FOR CORRECTING CHARGED PARTICLE RADIATION LOCATION, DEVICE FOR CALCULATING DEGREE OF CORRECTION OF CHARGED PARTICLE RADIATION LOCATION, CHARGED PARTICLE RADIATION SYSTEM, AND METHOD FOR CORRECTING CHARGED PARTICLE RADIATION LOCATION
    Publication number: 20160027611
    Abstract: The present invention provides a non-transitory medium storing a program for correcting an irradiation position of a charged particle beam, a correction amount calculation device, a charged particle beam irradiation system, and a method for correcting an irradiation position of a charged particle beam. The medium includes instructions for causing a control unit to perform actions including replacing charging of a resist with surface charges at an interface between the resist and a work piece, and calculating a charge density distribution of the surface charges; calculating a trajectory of a charged particle based on the charge density distribution; calculating an amount of error of the irradiation position of the charged particle beam based on the trajectory and calculating an amount of correction of the irradiation position of the charged particle beam based on the error amount.
    Type: Application
    Filed: January 22, 2014
    Publication date: January 28, 2016
    Inventors: Yohei Ookawa, Hidenori Ozawa