Patents by Inventor Yohko KOMATSU

Yohko KOMATSU has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Template and pattern formation method
    Patent number: 10118317
    Abstract: According to one embodiment, a template includes a template pattern and a liquid repellent pattern. The template pattern is formed on a substrate. The liquid repellent pattern has liquid repellency to a resist and are disposed on a periphery of a region for arrangement of the template pattern.
    Type: Grant
    Filed: August 31, 2015
    Date of Patent: November 6, 2018
    Assignee: Toshiba Memory Corporation
    Inventors: Yoshihisa Kawamura, Masayuki Hatano, Yohko Komatsu, Hiroyuki Kashiwagi
  • Stencil mask, stencil mask manufacturing method, and imprinting method
    Patent number: 10022748
    Abstract: According to one embodiment, a stencil mask includes a first opening and a second opening, the first opening is provided corresponding to a mark region in a template, the second opening is provided adjacent to the first opening, and the diameter of a circle circumscribing the second opening is smaller than the diameter of a circle circumscribing the first opening.
    Type: Grant
    Filed: July 8, 2015
    Date of Patent: July 17, 2018
    Assignee: Toshiba Memory Corporation
    Inventors: Masato Suzuki, Akiko Mimotogi, Yohko Komatsu, Ryoichi Suzuki, Kazuya Fukuhara
  • TEMPLATE AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
    Publication number: 20180119288
    Abstract: According to one embodiment, a template forming method is provided. In the template forming method, a template pattern is formed on a first surface of a substrate. A high liquid repellent property portion is formed in a region different from the template pattern on a side of the first surface of the substrate. The high liquid repellent property portion has a higher contacting angle with respect to a resist than a portion without the high liquid repellent property portion formed therein.
    Type: Application
    Filed: December 21, 2017
    Publication date: May 3, 2018
    Applicant: Toshiba Memory Corporation
    Inventors: Masatoshi Tsuji, Masayuki Hatano, Yohko Komatsu, Tetsuro Nakasugi
  • Template forming method, template, and template base material
    Patent number: 9885118
    Abstract: According to one embodiment, a template forming method is provided. In the template forming method, a template pattern is formed on a first surface of a substrate. A high liquid repellent property portion is formed in a region different from the template pattern on a side of the first surface of the substrate. The high liquid repellent property portion has a higher contacting angle with respect to a resist than a portion without the high liquid repellent property portion formed therein.
    Type: Grant
    Filed: September 3, 2015
    Date of Patent: February 6, 2018
    Assignee: Toshiba Memory Corporation
    Inventors: Masatoshi Tsuji, Masayuki Hatano, Yohko Komatsu, Tetsuro Nakasugi
  • TEMPLATE AND PATTERN FORMATION METHOD
    Publication number: 20160346962
    Abstract: According to one embodiment, a template includes a template pattern and a liquid repellent pattern. The template pattern is formed on a substrate. The liquid repellent pattern has liquid repellency to a resist and are disposed on a periphery of a region for arrangement of the template pattern.
    Type: Application
    Filed: August 31, 2015
    Publication date: December 1, 2016
    Inventors: Yoshihisa KAWAMURA, Masayuki Hatano, Yohko Komatsu, Hiroyuki Kashiwagi
  • TEMPLATE FORMING METHOD, TEMPLATE, AND TEMPLATE BASE MATERIAL
    Publication number: 20160247673
    Abstract: According to one embodiment, a template forming method is provided. In the template forming method, a template pattern is formed on a first surface of a substrate. A high liquid repellent property portion is formed in a region different from the template pattern on a side of the first surface of the substrate. The high liquid repellent property portion has a higher contacting angle with respect to a resist than a portion without the high liquid repellent property portion formed therein.
    Type: Application
    Filed: September 3, 2015
    Publication date: August 25, 2016
    Inventors: Masatoshi TSUJI, Masayuki HATANO, Yohko KOMATSU, Tetsuro NAKASUGI
  • STENCIL MASK, STENCIL MASK MANUFACTURING METHOD, AND IMPRINTING METHOD
    Publication number: 20160076132
    Abstract: According to one embodiment, a stencil mask includes a first opening and a second opening, the first opening is provided corresponding to a mark region in a template, the second opening is provided adjacent to the first opening, and the diameter of a circle circumscribing the second opening is smaller than the diameter of a circle circumscribing the first opening.
    Type: Application
    Filed: July 8, 2015
    Publication date: March 17, 2016
    Inventors: Masato SUZUKI, Akiko Mimotogi, Yohko Komatsu, Ryoichi Suzuki, Kazuya Fukuhara
  • IMPRINTING METHOD AND IMPRINTING APPARATUS
    Publication number: 20160067965
    Abstract: According to one embodiment, an imprinting method is provided to form a pattern by ejecting an imprint agent onto a workpiece from a plurality of nozzles of an ink-jet head according to a drop recipe, and putting a template and the workplace having the imprinted agent ejected thereon closer to have a predetermined distance therebetween. In the imprinting method, a first drop recipe is generated at first. Next, a drop position in the first drop recipe is changed to another position in the vicinity of the drop position.
    Type: Application
    Filed: March 4, 2015
    Publication date: March 10, 2016
    Inventors: Shizuo KINOSHITA, Yohko KOMATSU
  • TEMPLATE, TEMPLATE FORMING METHOD, AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD
    Publication number: 20160056036
    Abstract: According to one embodiment, a template is provided which comprises a template pattern having protrusion pattern feature and recess pattern feature. High contact-angle portion whose contact angle is higher than side surface of the template pattern is placed in the template. The high contact-angle portion is placed in at least either top surface of the protrusion pattern feature or bottom surface of the recess pattern feature from among surfaces of the template pattern.
    Type: Application
    Filed: February 27, 2015
    Publication date: February 25, 2016
    Inventors: Hiroshi TOKUE, Masayuki HATANO, Yohko KOMATSU, Hiroyuki KASHIWAGI, Masatoshi TSUJI