Abstract: A radiation generating apparatus includes a radiation generating unit and a diaphragm unit that functions as a projector-collimator configured to simulate a radiation field with a visible-light field. The diaphragm unit includes a light source configured to generate visible light, an optical lens configured to control a state of diffusion of the visible light emitted from the light source, and field-limiting blades. The light source and the optical lens are provided between a radiation emission window and the field-limiting blades. The light source is movable into and retractable from a path of radiation generated by the radiation generating unit.

Abstract: A transmissive-type target includes a target layer, and a transmissive substrate configured to support the target layer. The transmissive substrate has a pair of surfaces facing each other and is formed of polycrystalline diamond. In the transmissive substrate, one of the pair of surfaces includes polycrystalline diamond having a first average crystal grain diameter which is smaller than a second average crystal grain diameter of polycrystalline diamond included on the other surface opposing thereto. The target layer is supported by any one of the pair of surfaces.

Abstract: A radiation generating apparatus 1 comprising a radiation generating unit 2 which emits radiation, and a movable diaphragm unit 3 which is arranged on the radiation generating unit 2, wherein the movable diaphragm unit 3 has restriction blades 18 which adjust a size of a radiation field, a light source 20 which emits visible light, and a reflecting plate 19 which reflects the visible light thereon and transmits the radiation therethrough, and simulatively shows the radiation field in a form of a visible light field by the visible light, wherein the light source 20 can be moved between a first position at which the light source 20 can simulatively show the radiation field by the visible light field, and a second position which is displaced from an irradiation path of the radiation which irradiates the radiation field.

Abstract: Provided are a method of forming a through hole, which can inhibit misalignment between central axes of holes in both surfaces of a substrate, which is free from metal contamination, and which inhibits notching so as to improve the dimensional accuracy, the method including: preparing a silicon substrate; preparing a supporting substrate for supporting the silicon substrate; fixing the silicon substrate and the supporting substrate to form a composite substrate; and carrying out dry etching to the composite substrate from a silicon substrate side of the composite substrate toward a supporting substrate side of the composite substrate to form a through hole in the silicon substrate, in which the supporting substrate in the preparing a supporting substrate has a hole formed at a region corresponding to a region of the through hole to be formed in the silicon substrate, on a surface of the supporting substrate facing the silicon substrate.

Abstract: A transmissive target includes a target layer configured to include target metal and generate X-ray when receiving electrons and a substrate configured to support the target layer and include carbon as a main component. A carbide region including carbide of the target metal and a non-carbide region including the target metal are disposed in a mixed manner on a boundary surface between the substrate and the target layer on a target layer side.

Abstract: A radiation generating apparatus including: a radiation generating unit for emitting radiation through a transmission window; and a movable diaphragm unit including a restricting blade for adjusting a size of a radiation field and a light projecting and collimating device for making simulation display of the radiation field with a visible light field, in which the light projecting and collimating device includes a light source for emitting visible light, and a reflection plate disposed obliquely to a radiation center axis, the reflection plate having a reflection surface for reflecting the visible light and transmitting the radiation; the visible light field is formed of the visible light which is emitted from the light source and is reflected by the reflection plate; and a compensating member having a thickness variation for reducing unevenness of the radiation emitted in the radiation field is disposed on a radiation exit side of the reflection plate.

Abstract: A transmission-type X-ray target includes a flat plate-shaped diamond substrate having a first surface and a second surface facing the first surface and a target layer that is located on the first surface. A residual stress of the first surface is lower than a residual stress of the second surface.

Abstract: A radiation generating apparatus includes a radiation generating unit and a diaphragm unit that functions as a projector-collimator configured to simulate a radiation field with a visible-light field. The diaphragm unit includes a light source configured to generate visible light, an optical lens configured to control a state of diffusion of the visible light emitted from the light source, and field-limiting blades. The light source and the optical lens are provided between a radiation emission window and the field-limiting blades. The light source is movable into and retractable from a path of radiation generated by the radiation generating unit.

Abstract: A method for processing a silicon substrate includes forming a mask layer on the silicon substrate; forming a hole is farmed in the silicon substrate by alternately repeating (i) an etching step in which plasma etching is performed in a thickness direction of the silicon substrate using the mask layer as a mask and (ii) a deposition step in which a protection film is deposited on an inner wall of the hole formed in the etching step; removing the protection film; and a planarizing a side wall of the hole by etching the inner wall of the hole from which the protection film has been removed. The mask layer includes a material that withstands the removal step. In the planarization step, the inner wall of the hole is etched using the mask layer as a mask.

Abstract: A radiation emission target includes a target layer that generates radiation when irradiated with an electron beam and a substrate composed of diamond, the substrate supporting the target layer. The substrate has a Knoop hardness of 60 GPa or more and 150 GPa or less.

Abstract: Provided is a radiation generating apparatus, including: a radiation generating unit for emitting radiation; and a movable diaphragm unit including a light projecting/sighting system for making a simulation display of a radiation field with visible light. The light projecting/sighting system includes: a light source of the visible light; a light guiding plate that is provided across a radiation axis, and causes the visible light from the light source to exit from a front surface of the light guiding plate; and a louver that gives directivity to the visible light exiting from the front surface of the light guiding plate.

Abstract: A separation wall transfer mold adaptive to form separation walls on a substrate, includes a main body. A separation wall concave section has concaves for separation walls and is formed in a surface of the main body for a material of the separation walls to be spewed into the separation wall concave section when the separation wall transfer mold is pressed to a substrate. A spew preventing concave section is formed in the surface of the main body for an excess portion of the material to be spewed in the spew preventing concave section.

Abstract: A separation wall transfer mold adaptive to form separation walls on a substrate, includes a main body. A separation wall concave section has concaves for separation walls and is formed in a surface of the main body for a material of the separation walls to be spewed into the separation wall concave section when the separation wall transfer mold is pressed to a substrate. A spew preventing concave section is formed in the surface of the main body for an excess portion of the material to be spewed in the spew preventing concave section.

Abstract: A separation wall transfer mold adaptive to form separation walls on a substrate, includes a main body. A separation wall concave section has concaves for separation walls and is formed in a surface of the main body for a material of the separation walls to be spewed into the separation wall concave section when the separation wall transfer mold is pressed to a substrate. A spew preventing concave section is formed in the surface of the main body for an excess portion of the material to be spewed in the spew preventing concave section.