Patents by Inventor Yoichi Namba

Yoichi Namba has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6303268
    Abstract: A resist resin comprising a copolymer in which a (meth)acrylic structure having a side chain group decomposable with an acid and a polyorganosilsesquioxane structure represented by formula (1) are present in one molecule or a mixture of polymers in which these structures are each present in different molecules as well as a method of forming a pattern using the resist resin: wherein a reference character or numeral represents the same meaning as recited in the specification. The resist resin of the present invention has high sensitivity to a radiation having a short wavelength of 220 nm or less and is capable of forming a fine pattern of 0.15 &mgr;m or less.
    Type: Grant
    Filed: February 14, 2000
    Date of Patent: October 16, 2001
    Assignee: Showa Denko K.K.
    Inventors: Yoichi Namba, Hiroshi Takahashi
  • Patent number: 5303331
    Abstract: A compound type expert system comprising a first fuzzy expert system and a second expert system connected to the first expert system through a calculation control system. The first expert system executes fuzzy rule-based inference according to a first rule set that can describe ambiguity of language information and outputs a definite value. The second expert system executes rule-based inference according to a second rule set that can describe only information without ambiguity of language. The calculation control system is arranged between the first and second expert systems so as to activate the second expert system in response to the definite value output from the first expert system.
    Type: Grant
    Filed: March 19, 1991
    Date of Patent: April 12, 1994
    Assignee: Ricoh Company, Ltd.
    Inventor: Yoichi Namba
  • Patent number: 5030699
    Abstract: Disclosed is a ladder silicone oligomer composition which comprises [A] 100 weight parts of a ladder silicone oligomer containing 1 to 10 weight % of hydroxyl groups and 1 to 10 weight % of ethoxy groups, [B] 1 to 200 weight parts of at least one silicon-containing compound selected from (a) silicone oligomers and polymers having a number average molecular weight of 500 to 100,000, which are obtained by reacting a compound of the following formula (I): ##STR1## wherein R.sub.1 is lower alkyl or phenyl, and R.sub.2 is lower alkyl, with a compound of the following formula (II): ##STR2## wherein R.sub.3 is lower alkyl, or phenyl, and R.sub.4 is lower alkyl, the molar ratio of the compound (I) to the compound (II) being from 1/0.3 to 1/9, and (b) ethyl silicates having a silica content of 28.8 to 45 weight % and hydrolysis products thereof, and [C] an organic solvent. The ladder silicone oligomer composition is useful as a coating material and an adhesive.
    Type: Grant
    Filed: June 6, 1989
    Date of Patent: July 9, 1991
    Assignee: Showa Denko K.K.
    Inventors: Takahiko Motoyama, Yoshio Miyata, Fumio Matsui, Yoichi Namba, Noritoshi Kamoi, Yukari Ohwaki