Abstract: A mass spectrometry apparatus which includes an ion source which ionizes a sample under atmospheric pressure and outputs the ionized sample, a differential pumping region, provided with apertures, for receiving under vacuum ions in the ionized sample from the ion source and outputting the ions and an ion accelerating and focusing region, having a plurality of ion accelerating electrodes each having applied thereto a voltage, for accelerating and focusing under vacuum the ions from the differential pumping region. The ions from the accelerating and focusing region are introduced under vacuum to a mass spectrometer which detects and analyzes the ions.

Abstract: A mass spectrometer and a mass spectrometry method having a high ion selection efficiency are provided. The mass spectrometer comprises an ion trap, a sample introducing device, an electron gun, a detector, a power supply for applying voltage to the ion trap, a control device for controlling the power supply and the electron gun, a mass analyzing device for performing mass spectrometry based on a detected signal of the detector. Using an auxiliary power supply, direction of an auxiliary electric field generated between end cap electrodes is made to point only toward the detector. In this occasion, by setting the cycle of the auxiliary voltage near the oscillation cycle of interest ion species in the axial direction, the interest ion species are synchronized with the auxiliary electric field to be certainly unstabilized in the detector side.

Abstract: A scanning electron microscope suitable for producing an image of high resolution by detecting secondary electrons and backscattered electrons generated from a specimen at a low accelerating voltage in a separate or synthesis fashion. In the scanning electron microscope electric and magnetic fields for separating trajectories of backscattered electrons and secondary electrons generated from a specimen are established, and a backscattered electron detector for detecting generated backscattered electrons is disposed on the trajectory of the backscattered electrons. According to the microscope, since secondary electrons and backscattered electrons can be detected efficiently in a separate fashion even at a low accelerating voltage of several kilovolts or less and besides the detector does not exert the deflection action on a primary electron beam, backscattered and secondary electron images of high resolution can be obtained.

Abstract: When a charged beam is irradiated on a sample, charge up of electric charge of the same polarity as that of the charged beam is built up on the sample surface. In order to neutralize the charge up electric charge, an apparatus for suppressing electrification of sample in charged beam irradiation apparatus is provided in which electric charge of opposite polarity to that of the charged beam is generated near the sample surface to neutralize the charged beam or charge up electric charge on the sample surface. The electric charge for neutralization is generated by admitting elecrtic charge from a plasma generation unit to the vicinity of the sample surface, ionizing gas generated from the sample surface by causing the charged beam to collide the gas or by irradiating electrons from an electron source on the sample surface.

Abstract: An ion beam having a good converging property and a good quality is provided by satisfying the limitations controlling both angle of dispersion and the width of beam at the same time. The voltage 12d of a repeller electrode 1f in an ion source of electron bombardment type is input to an ion source state monitor 11 and the ion source state monitor 11 output a predicted value 12e of the voltage applied to an extractor electrode 1g to an extractor power source 9. As for the extractor electrode system, the width of a slit in the acceleration electrode 1b is made larger than the width of a slit of the extractor electrode 1g, and the extractor electrode 1g is set in a position apart from the acceleration electrode 1b by the distance nearly equal to the distance between the acceleration electrode 1b and the ion generating region 2a. By doing so, the electric field leaked from the slit of the acceleration electrode 1b to the inside of the ionization chamber 1a expands to the vicinity of the ion generating region.

Abstract: When a charged beam is irradiated on a sample, charge up of electric charge of the same polarity as that of the charged beam is built up on the sample surface. In order to neutralize the charge up electric charge, an apparatus for suppressing electrification of sample in charged beam irradiation apparatus is provided in which electric charge of opposite polarity to that of the charged beam is generated near the sample surface to neutralize the charged beam or charge up electric charge on the sample surface. The electric charge for neutralization is generated by admitting elecrtic charge from a plasma generation unit to the vicinity of the sample surface, ionizing gas generated from the sample surface by causing the charged beam to collide the gas or by irradiating electrons from an electron source on the sample surface.

Abstract: A charged particle generating device such as an ion implanter, a secondary ion mass spectrometer having a good mounting operability, a simple construction, good characteristics such as sensitivity, etc., owing to the fact that there is disposed a focusing electrode composed of the cylindrical electrodes disposed coaxially with each other, at least the inner electrode thereof having a plurality of openings.

Abstract: In a secondary charged particle analyzing apparatus such as a secondary ion mass analyzing apparatus, a scanning type electron mass analyzer, etc., in order to obtain a high resolving power and a high sensitivity, trajectories of secondary charged particles are corrected by means of an accelerating lens formed in a secondary charged particle extracting section disposed within the apparatus.