Patents by Inventor Yoichiro Mochizuki

Yoichiro Mochizuki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8476149
    Abstract: A silicon wafer produced from a silicon single crystal ingot grown by Czochralski process is subjected to rapid heating/cooling thermal process at a maximum temperature (T1) of 1300° C. or more, but less than 1380° C. in an oxidizing gas atmosphere having an oxygen partial pressure of 20% or more, but less than 100%. The silicon wafer according to the invention has, in a defect-free region (DZ layer) including at least a device active region of the silicon wafer, a high oxygen concentration region having a concentration of oxygen solid solution of 0.7×1018 atoms/cm3 or more and at the same time, the defect-free region contains interstitial silicon in supersaturated state.
    Type: Grant
    Filed: July 30, 2009
    Date of Patent: July 2, 2013
    Assignee: Global Wafers Japan Co., Ltd.
    Inventors: Hiromichi Isogai, Takeshi Senda, Eiji Toyoda, Kumiko Murayama, Koji Izunome, Susumu Maeda, Kazuhiko Kashima, Koji Araki, Tatsuhiko Aoki, Haruo Sudo, Yoichiro Mochizuki, Akihiko Kobayashi, Senlin Fu
  • Publication number: 20100038757
    Abstract: A silicon wafer produced from a silicon single crystal ingot grown by Czochralski process is subjected to rapid heating/cooling thermal process at a maximum temperature (T1) of 1300° C. or more, but less than 1380° C. in an oxidizing gas atmosphere having an oxygen partial pressure of 20% or more, but less than 100%. The silicon wafer according to the invention has, in a defect-free region (DZ layer) including at least a device active region of the silicon wafer, a high oxygen concentration region having a concentration of oxygen solid solution of 0.7×1018 atoms/cm3 or more and at the same time, the defect-free region contains interstitial silicon in supersaturated state.
    Type: Application
    Filed: July 30, 2009
    Publication date: February 18, 2010
    Inventors: Hiromichi Isogai, Takeshi Senda, Eiji Toyoda, Kumiko Murayama, Koji Izunome, Susumu Maeda, Kazuhiko Kashima, Koji Araki, Tatsuhiko Aoki, Haruo Sudo, Yoichiro Mochizuki, Akihiko Kobayashi, Senlin Fu
  • Patent number: 5992711
    Abstract: An integrated submerged entry nozzle for thin slab continuous casting has a plate member 12 corresponding to the lower plate of a slide gate and a nozzle member 11 having a flat molten steel passage section in the part to be submerged into molten steel of at least the tip, the both 11. 12 being integrated together by the use of an organic adhesive. The plate member 12 and the nozzle member 11 are separately formed followed by baking or firing, the both 11, 12 are adhered together by the use of an organic adhesive, the adhesive is dried, the outside is covered with a shell, and refractory mortar is filled in the space. Thereafter, a refractory ring 28 is adhered in such a manner as to cover the inside of the adhesive joint part followed by drying.
    Type: Grant
    Filed: April 22, 1998
    Date of Patent: November 30, 1999
    Assignees: Toshiba Ceramics Co., Ltd., Sumitomo Metal Industries, Ltd.
    Inventors: Yoichiro Mochizuki, Tetsuro Fushimi, Etsuhiro Hasebe, Moriki Hashio, Toshihiko Murakami, Sei Hiraki
  • Patent number: 5961874
    Abstract: In a flat casting nozzle 10 having a taper 13, the position of the terminal end 14 of the taper 13 formed on the long edge side and the position of the terminal end 17 of a taper 16 formed on the short edge side are mutually shifted.
    Type: Grant
    Filed: March 23, 1998
    Date of Patent: October 5, 1999
    Assignees: Toshiba Ceramics Co., Ltd., Sumitomo Metal Industries, Ltd.
    Inventors: Etsuhiro Hasebe, Tetsuro Fushimi, Tatsuya Shimoda, Yoichiro Mochizuki, Tadasu Takigawa, Toshihiko Murakami, Sei Hiraki
  • Patent number: 5683950
    Abstract: Provided is a refractory for casting which contains clinker having a mineral crystal phase consisting essentially of mullite and baddeleyite. The refractory for casting has excellent in a thermal-shock resistance, corrosion resistance and strength. The refractory for casting is manufactured from a raw material containing a refractory composition and an organic binder, wherein the refractory composition comprises(a) 3 to 60 wt % of clinker having a mineral crystal phase consisting essentially of mullite and baddeleyite, and containing 5 to 22 wt % of alumina (Al.sub.2 O.sub.3), 38 to 68 wt % of zirconia (ZrO.sub.2) and 27 to 40 wt % of silica;(b) 5 to 40 wt % of at least one carbon-based material selected from the group consisting of graphite and carbon; and(c) at least one refractory element as a balance, selected from the group consisting of alumina, fused silica, zirconia, silicon carbide, mullite and a metal silicon.
    Type: Grant
    Filed: May 6, 1996
    Date of Patent: November 4, 1997
    Assignee: Toshiba Ceramics Co., Ltd.
    Inventors: Tadasu Takigawa, Etsuhiro Hasebe, Yoichiro Mochizuki