Patents by Inventor Yoji ANDO

Yoji ANDO has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20140131314
    Abstract: A plasma processing apparatus includes: a processing chamber in which plasma processing is performed; a gas feeding unit which supplied process gas into the processing chamber; a radio-frequency power source which supplies radio-frequency power that turns the process gas fed into the processing chamber to plasma; and a light detector which detects the light emitted from the plasma generated in the process chamber. The light detector includes a detecting unit which detects, during respective preset exposure times, the light emitted from the plasma that is generated due to pulse-modulated radio-frequency power, and a control unit which performs control such that the amount of the light emitted from the plasma during each of the preset exposure times becomes constant.
    Type: Application
    Filed: February 7, 2013
    Publication date: May 15, 2014
    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Yoji ANDO, Tetsuo ONO, Tatehito USUI