Patents by Inventor Yoji Fujita

Yoji Fujita has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20100099041
    Abstract: [Problem] To provide a positive-type photosensitive resin composition that is produced with novolac resin and has good mechanical properties and high storage stability.
    Type: Application
    Filed: February 5, 2008
    Publication date: April 22, 2010
    Inventors: Yoji Fujita, Shinji Arimoto, Rinsei Ike
  • Publication number: 20090123867
    Abstract: The present invention provides a photosensitive resin composition comprising (a) an alkali-soluble resin, (b) a silicon compound having a secondary aromatic amino group and an alkoxy group, and (c) at least one selected from a photopolymerization initiator, a photo acid generator and a photo base generator. According to the present invention, it is possible to obtain a photosensitive resin composition which remarkably enhances the adhesion property with a substrate after curing without deteriorating storage stability of a solution, and does not cause peeling of a fine pattern even upon development.
    Type: Application
    Filed: April 18, 2006
    Publication date: May 14, 2009
    Applicant: TORAY INDUSTRIES, INC.
    Inventors: Tomoyuki Yuba, Yoji Fujita, Masao Tomikawa
  • Patent number: 7507518
    Abstract: The present invention relates to a positive photosensitive resin precursor composition which exhibits good storage stability after exposure. A photosensitive resin precursor composition comprises (a) a polymer essentially composed of a structural unit expressed by formula (1); (b) at least two photo acid generators; and (c) a compound having an alkoxymethyl group: wherein R1 represents an organic group with a valence of 2 to 8, having at least two carbon atoms; R2 represents an organic group with a valence of 2 to 6, having at least two carbon atoms; R3 represents hydrogen or an organic group having a carbon number in the range of 1 to 20; n represents a number ranging from 10 to 100,000; m represents an integer in the range of 0 to 2; and p and q represent integers in the range of 0 to 4 and satisfy p+q>0.
    Type: Grant
    Filed: July 7, 2004
    Date of Patent: March 24, 2009
    Assignee: Toray Industries, Inc.
    Inventors: Yoji Fujita, Tomoyuki Yuba, Mitsuhito Suwa
  • Patent number: 6887643
    Abstract: A photosensitive resin precursor composition exhibiting an excellent film thickness uniformity contains: a heat resistant resin precursor polymer; a radiation sensitive compound; and a solvent expressed by formula (1): R1 represents an alkyl group having a carbon number in the range of 1 to 3. R2, R3, R4, and R5 each represent hydrogen or an alkyl group having a carbon number in the range of 1 to 3, and l represents an integer in the range of 0 to 3.
    Type: Grant
    Filed: July 22, 2003
    Date of Patent: May 3, 2005
    Assignee: Toray Industries, Inc.
    Inventors: Yoji Fujita, Mitsuhito Suwa, Masao Tomikawa
  • Publication number: 20050014876
    Abstract: The present invention relates to a positive photosensitive resin precursor composition which exhibits good storage stability after exposure. A photosensitive resin precursor composition comprises (a) a polymer essentially composed of a structural unit expressed by formula (1); (b) at least two photo acid generators; and (c) a compound having an alkoxymethyl group: wherein R1 represents an organic group with a valence of 2 to 8, having at least two carbon atoms; R2 represents an organic group with a valence of 2 to 6, having at least two carbon atoms; R3 represents hydrogen or an organic group having a carbon number in the range of 1 to 20; n represents a number ranging from 10 to 100,000; m represents an integer in the range of 0 to 2; and p and q represent integers in the range of 0 to 4 and satisfy p+q>0.
    Type: Application
    Filed: July 7, 2004
    Publication date: January 20, 2005
    Applicant: TORAY INDUSTRIES, INC.
    Inventors: Yoji Fujita, Tomoyuki Yuba, Mitsuhito Suwa
  • Publication number: 20040067395
    Abstract: A fuel processing device for converting a raw fuel fluid including hydrocarbon, alcohols, or ethers into a hydrogen fuel gas including hydrogen by a catalytic reaction, having one or more catalytic reactors each including a space maintaining a catalyst therein, with the catalytic reactor including deoxidizing means formed of a deoxidizing material, is provided.
    Type: Application
    Filed: May 1, 2003
    Publication date: April 8, 2004
    Applicant: Mitsubishi Denki Kabushiki Kaisha
    Inventors: Mitsuaki Nakata, Mitsuie Matsumura, Yoji Fujita, Yoshiaki Odai, Yoshihide Gonjo
  • Publication number: 20040053156
    Abstract: A photosensitive resin precursor composition exhibiting an excellent film thickness uniformity contains: a heat resistant resin precursor polymer; a radiation sensitive compound; and a solvent expressed by formula (1): 1
    Type: Application
    Filed: July 22, 2003
    Publication date: March 18, 2004
    Applicant: Toray Industries, Inc.
    Inventors: Yoji Fujita, Mitsuhito Suwa, Masao Tomikawa
  • Patent number: 6524764
    Abstract: The present invention relates to a positive type photosensitive resin precursor composition which is characterized in that it contains polymer having, as its chief component, structural units represented by the following general formula (1) and, furthermore, in that it satisfies the following conditions (a) and/or (b). The invention provides an alkali-developable photosensitive composition. (a) There is included an ester of a naphthoquinone diazide sulphonic acid and a phenol compound of dipole moment 0.1 to 1.
    Type: Grant
    Filed: January 29, 2001
    Date of Patent: February 25, 2003
    Assignee: Toray Industries, Inc.
    Inventors: Masao Tomikawa, Mitsuhito Suwa, Yoji Fujita
  • Patent number: 4980248
    Abstract: A molten carbonate type fuel cell with a stabilized battery characteristic over a long period of time by replenishing the electrolyte which has been consumed, and maintaining the electrolyte at a consistent composition, the fuel cell carrying, on at least one of the electrolytic layer at its side of the air electrode, the air electrode per se, and the structural members of the air electrode side gas chamber, a lithium-containing composite oxide which brings about chemical reaction, when a ratio of lithium (Li) to potassium (K) in the electrolyte reduces, to produce Li.sub.2 CO.sub.3 due to change in the ratios between lithium and other elements, during a period when the Li/K ratio between lithium and potassium in the electrolyte comprising mainly Li.sub.2 CO.sub.3 and K.sub.2 CO.sub.3 varies from 40/60 to 70/30 at a temperature range of from 600.degree. C. to 700.degree. C. in a gas atmosphere of the air electrode side.
    Type: Grant
    Filed: July 5, 1989
    Date of Patent: December 25, 1990
    Assignee: Mitsubishi Denki Kabushiki Kaisha
    Inventor: Yoji Fujita