Patents by Inventor Yoji Shiraishi

Yoji Shiraishi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240074549
    Abstract: A watchband can comfortably secure an electronic device to a wrist of a user. The watchband can include a base having a contact surface opposite an engagement surface, contact loops on the contact surface for contacting a user, and engagement loops on the engagement surface for engaging hooks. The hooks can be provided on the engagement surface, opposite some of the contact loops. Edge sections of the base can wrap around a central section to define an end of the base. A tab can extend from an end of the base to facilitate attachment, adjustment, and/or removal of the watch band. The tab can further help maintain the assembled parts in place to enhance durability of the watchband.
    Type: Application
    Filed: April 24, 2023
    Publication date: March 7, 2024
    Inventors: Donald L. OLMSTEAD, Ayumi KUSANO, Clement C. TISSANDIER, Eiryo SHIRAISHI, Mengxi ZHAO, Molly J. ANDERSON, Osamu YABE, Seul Bi KIM, Tirshathah A. HUNTER, Yoji HAMADA
  • Patent number: 5801833
    Abstract: In a method of producing master and working pattern plates for etching to form a shadow mask, various etching patterns are needed, for example, a pattern of predetermined holes for passing electron beams, a pattern of register marks necessary for accurate alignment of a pair of obverse and reverse working pattern plates, and a frame pattern for cutting off a portion which is to be a shadow mask from a metal plate by etching process. These individual pattern data required for etching are first prepared and then subjected to logical operation to prepare data representative of a synthetic pattern which is to be finally drawn on a photosensitive plate. Then, all the necessary patterns, including the frame pattern, register mark pattern, hole pattern, etc.
    Type: Grant
    Filed: December 29, 1995
    Date of Patent: September 1, 1998
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Kei Kobayashi, Yoji Shiraishi
  • Patent number: 5500326
    Abstract: In a method of producing master and working pattern plates for etching to form a shadow mask, various etching patterns are needed, for example, a pattern of predetermined holes for passing electron beams, a pattern of register marks necessary for accurate alignment of a pair of obverse and reverse working pattern plates, and a frame pattern for cutting off a portion which is to be a shadow mask from a metal plate by etching process. These individual pattern data required for etching are first prepared and then subjected to logical operation to prepare data representative of a synthetic pattern which is to be finally drawn on a photosensitive plate. Then, all the necessary patterns, including the frame pattern, register mark pattern, hole pattern, etc.
    Type: Grant
    Filed: May 25, 1993
    Date of Patent: March 19, 1996
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Kei Kobayashi, Yoji Shiraishi